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1. 发明申请

WO2015124216A1 GRATING MIRROR 审中-公开
标题翻译：雕刻镜
公开(公告)号：WO2015124216A1
公开(公告)日：2015-08-27
申请号：PCT/EP2014/053547
申请日：2014-02-24
申请人： UNIVERSITÄT STUTTGART INSTITUT FÜR STRAHLWERKZEUGE
发明人： RUMPEL, Martin , ABDOU-AHMED, Marwan
IPC分类号： G02B5/08 , G02B5/09 , H01S3/04
CPC分类号： G02B5/1861 , H01S3/0057 , H01S3/0812 , H01S3/109
摘要： Grating mirror is provided, said grating mirror comprises a substrate having a first and a second surface on opposite sides thereof,a reflector arranged on the first surface of said substrate and comprising a stack of reflector layers with high refractive index layers and low refractive index layers stacked in alternating arrangement, a grating arranged on a side of said reflector opposite to said substrate,said grating comprising a stack of grating layers with at least one high refractive index grating layer and at least one low refractive index grating layer stacked in alternating arrangement, said stack of grating layers having grooves etched from a top surface into said stack of grating layers with an etching depth between 40nm or more and 300nm or less in order to obtain a waveguide grating structure.
摘要翻译：提供了光栅镜，所述光栅镜包括在其相对侧上具有第一和第二表面的基板，布置在所述基板的第一表面上并包括具有高折射率层和低折射率层的反射器层的叠层堆叠在交替布置中，布置在所述反射器与所述基板相对的一侧上的光栅，所述光栅包括具有交替布置堆叠的至少一个高折射率光栅层和至少一个低折射率光栅层的光栅层堆叠，所述堆叠的光栅层具有从顶表面蚀刻到所述光栅层堆叠中的凹槽，蚀刻深度在40nm或更大至300nm或更小之间，以便获得波导光栅结构。

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