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1. 发明申请

WO2017082695A3 METAL-CARBIDE-OXIDE THIN FILM COMPRISING CARBON, OXIDE, AND METAL, AND METHOD FOR MANUFACTURING SAME 审中-公开
标题翻译：包含碳，氧化物和金属的金属 - 氧化物 - 氧化物薄膜及其制造方法
公开(公告)号：WO2017082695A3
公开(公告)日：2017-06-29
申请号：PCT/KR2016013037
申请日：2016-11-11
申请人： UNIV SUNGKYUNKWAN RES & BUS
发明人： JUNG DONG GEUN , BAN WON JIN , KWON SUNG YOOL
IPC分类号： H01L21/02 , C07F5/06 , H01L21/205 , H01L21/31
CPC分类号： C07F5/06 , H01L21/02 , H01L21/205 , H01L21/31
摘要： The present invention relates to a thin film comprising: carbon; oxygen; and a metal selected from a group consisting of aluminum, titanium, hafnium, tantalum, zirconium, and tungsten and, more particularly, to a metal-carbide-oxide thin film comprising, on the basis of the total atomic percentage: 5 to 85% of carbon, 5 to 60% of oxygen, and 5 to 40% of a metal. The metal-carbide-oxide thin film of the present invention is formed by being deposited through a single injection process of a reactant precursor, such that the thickness of a thin film may be reduced. Thus, it is possible to simplify processes and reduce manufacturing costs, and thus improve productivity. In addition, a method for manufacturing the metal-carbide-oxide thin film of the present invention may control the content ratio of each component in the thin film by changing deposition conditions, and thus may control the physical properties, such as strength, etch resistance, and conductivity, etc., of the manufactured thin film. Thus, it is advantageous to manufacture a thin film having properties suitable for the intended use.
摘要翻译：本发明涉及一种薄膜，其包含：碳; 氧; 以及从由铝，钛，铪，钽，锆和钨组成的组中选择的金属，并且更具体地涉及一种金属 - 碳化物 - 氧化物薄膜，其基于总原子百分比含有5-85％的碳，5至60％的氧和5至40％的金属。本发明的金属 - 碳化物 - 氧化物薄膜通过经由反应物前体的单次注入工艺沉积而形成，使得薄膜的厚度可以减小。因此，可以简化工艺并降低制造成本，从而提高生产率。此外，用于制造本发明的金属 - 氧化物薄膜的方法可以通过改变沉积条件来控制薄膜中每种组分的含量比，并且因此可以控制物理性质，例如强度，抗蚀刻性以及制造的薄膜的导电率等。因此，制造具有适合于预期用途的特性的薄膜是有利的。

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