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    • 3. 发明申请
    • A POLISHED COATED GLAZING AND A METHOD OF MANUFACTURING THE SAME
    • 抛光涂层玻璃及其制造方法
    • WO2015150820A1
    • 2015-10-08
    • PCT/GB2015/051036
    • 2015-04-02
    • PILKINGTON GROUP LIMITED
    • BAMBER, David LawrenceHURST, Simon James
    • C03C17/00B32B17/10C03C17/23C03C17/34C03C17/36
    • C03C17/002B32B17/10036B32B17/10211B32B17/1099C03C17/23C03C17/3417C03C17/366C03C17/3681C03C2217/213C03C2217/77C03C2217/94C03C2218/328
    • The invention concerns a polished coated glazing, comprising a coating on a substrate. The coating comprises a first coating layer and a silica overcoat layer, the silica overcoat forming an exposed surface, wherein the silica overcoat layer is polished such that Sa is less than 15 nm. A method of manufacturing said glazing comprises the steps of providing a substrate, depositing a low emissivity coating, depositing a silica overcoat layer to form an exposed surface of the glazing and polishing the silica overcoat layer so as to reduce roughness Sa to less than 15 nm. Another embodiment of the invention is a polished coated glazing, comprising a coating on a substrate, such that the coating forms an exposed surface of the glazing, wherein the coating comprises a polished silica layer, having an arithmetical mean surface roughness, Sa, of less than 15 nm. Further embodiments include a laminated glazing and an insulating glazing unit. To achieve a desired level of planarization of an exposed surface of a glazing requires less polishing time with a silica layer forming the exposed surface according to the invention, than a non-silica layer.
    • 本发明涉及一种抛光涂层玻璃,其包括在基底上的涂层。 涂层包括第一涂层和二氧化硅外涂层,二氧化硅外涂层形成暴露表面,其中抛光二氧化硅外涂层使得Sa小于15nm。 制造所述玻璃窗的方法包括以下步骤:提供基底,沉积低发射率涂层,沉积二氧化硅外涂层以形成玻璃窗的暴露表面并抛光二氧化硅外涂层,以便将粗糙度Sa降低至小于15nm 。 本发明的另一个实施方案是抛光涂层玻璃,其包括在基材上的涂层,使得涂层形成玻璃窗的暴露表面,其中涂层包括抛光二氧化硅层,具有算术平均表面粗糙度Sa 超过15nm。 另外的实施例包括层压玻璃和绝缘玻璃窗单元。 为了实现窗玻璃的暴露表面的所需水平的平坦化,与形成根据本发明的暴露表面的二氧化硅层相比,非二氧化硅层需要更少的抛光时间。