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1. 发明申请

WO2007074029A1 FOKUS- DETEKTOR- ANORDNUNG ZUR ERZEUGUNG VON PHASENKONTRAST-RÖNTGENAUFNAHMEN UND VERFAHREN HIERZU 审中-公开
标题翻译：聚焦检测安排来生成相位对比X射线及其方法
公开(公告)号：WO2007074029A1
公开(公告)日：2007-07-05
申请号：PCT/EP2006/069355
申请日：2006-12-06
申请人： SIEMENS AKTIENGESELLSCHAFT , PAUL SCHERRER INSTITUT , DAVID, Christian , PFEIFFER, Franz , BAUMANN, Joachim , ENGELHARDT, Martin , FREUDENBERGER, Jörg , HEMPEL, Eckhard , HOHEISEL, Martin , MERTELMEIER, Thomas , POPESCU, Stefan , SCHUSTER, Manfred
发明人： DAVID, Christian , PFEIFFER, Franz , BAUMANN, Joachim , ENGELHARDT, Martin , FREUDENBERGER, Jörg , HEMPEL, Eckhard , HOHEISEL, Martin , MERTELMEIER, Thomas , POPESCU, Stefan , SCHUSTER, Manfred
IPC分类号： A61B6/00 , G01N23/04 , H01J35/08 , A61B6/03
CPC分类号： A61B6/00 , A61B6/032 , A61B6/06 , A61B6/4014 , A61B6/4021 , A61B6/4028 , A61B6/4092 , A61B6/4233 , A61B6/4266 , A61B6/4441 , A61B6/484 , G01N23/046 , G01N2223/419 , G21K1/025 , G21K2207/005 , H01J35/10 , H01J35/14 , H01J2235/086
摘要： Die Erfindung betrifft eine Fokus-Detektor-Anordnung einer Röntgenapparatur (1) zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen von einem Untersuchungsobjekt (7, P), wobei ein Bündel kohärenter Röntgenstrahlen (Si) durch eine Anode (12) erzeugt wird, welche streifenförmig angeordnete Bereiche (13) mit unterschiedlicher Strahlungsemission aufweist, die parallel zu den Gitterlinien des Phasengitters (G1) der Fokus-Detektor-Anordnung verlaufen. Außerdem betrifft die Erfindung auch ein Verfahren zur Erzeugung projektiver oder tomographischer Röntgen-Phasenkontrastaufnahmen von einem Untersuchungsobjekt mit Hilfe einer solchen Fokus-Detektor-Anordnung, wobei ein Bündel kohärenter Strahlung durch eine Anode (12) erzeugt wird, welche streifenförmig angeordnete Bereiche (13) mit unterschiedlicher Strahlungsemission aufweist, die parallel zu den Gitterlinien des Phasengitters (G1) verlaufen.
摘要翻译：本发明涉及的X射线设备（1）的聚焦检测器装置，用于产生投影或检查对象（图7，P）的断层相差图像，生成其中由阳极（12），布置有带形区域相干射线束（Si）的其平行于该相的光栅线延伸光栅所述聚焦检测装置的（G1）不同的辐射发射（13）。此外，本发明还涉及一种方法，用于产生检查对象的投射或断层摄影X射线相位对比图像与这样的聚焦检测装置的辅助下，其中产生由阳极相干辐射束（12），该带状排列的部分（13）配有具有到相位光栅（G 1）的光栅线平行不同的辐射发射。

2. 发明申请

WO2006131235A1 INTERFEROMETER FOR QUANTATIVE PHASE CONTRAST IMAGING AND TOMOGRAPHY WITH AN INCOHERENT POLYCHROMATIC X-RAY SOURCE 审中-公开
标题翻译：用于定量相位对比成像的干涉仪和具有不吸收的多色X射线源的TOMOGRAPHY
公开(公告)号：WO2006131235A1
公开(公告)日：2006-12-14
申请号：PCT/EP2006/005119
申请日：2006-05-30
申请人： PAUL SCHERRER INSTITUT , DAVID, Christian , PFEIFFER, Franz , WEITKAMP, Timm
发明人： DAVID, Christian , PFEIFFER, Franz , WEITKAMP, Timm
IPC分类号： A61B6/00 , G01N23/04
CPC分类号： G01N23/04 , A61B6/06 , A61B6/4092 , A61B6/4233 , A61B6/4291 , A61B6/484 , A61B6/502 , G21K2207/005
摘要： An x-ray interferometer arrangement is disclosed comprising only one phase grating (Gl) and one amplitude grating (G2). This interferometer can be used to obtain phase contrast images with a standard x-ray tube. Additionall, the new type of interferometer may use a source consisting of an array of individual sub-sources. Each of the sub-sources is individually coherent but mutually incoherent to the other sub-sources. The array of sub-sources may be generated by placing an array of slits, i.e. an additional amplitude grating (GO) close to the source. Such an arrangement makes it possible to use this type of interferometer with a source that provides no spatial or temporal coherence. The setup can therefore be used with larger sources placed at shorter distance of the detector resulting in higher flux densities and thus shorter exposure times. This is of special importance for tomography which requires to acquire images of an object under many (hundreds) viewing angles.
摘要翻译：公开了仅包括一个相位光栅（G1）和一个幅度光栅（G2）的X射线干涉仪装置。该干涉仪可用于获得具有标准X射线管的相位图像。另外，新型干涉仪可以使用由单个子源阵列组成的源。每个子源是单独一致的，但与其他子源相互不相干。可以通过将狭缝阵列即附近幅度光栅（GO）放置在源极附近来产生子源阵列。这种布置使得可以将这种类型的干涉仪用于不提供空间或时间相干性的源。因此，该设置可以用于放置在较短距离检测器处的较大的源，从而产生更高的通量密度，从而缩短曝光时间。这对于需要在许多（数百个）视角下获取对象的图像的层析成像是特别重要的。

3. 发明申请

WO2008006470A1 X-RAY INTERFEROMETER FOR PHASE CONTRAST IMAGING 审中-公开
标题翻译：用于相位对比成像的X射线干涉仪
公开(公告)号：WO2008006470A1
公开(公告)日：2008-01-17
申请号：PCT/EP2007/005728
申请日：2007-06-28
申请人： PAUL SCHERRER INSTITUT , DAVID, Christian , PFEIFFER, Franz
发明人： DAVID, Christian , PFEIFFER, Franz
IPC分类号： G01N23/00
CPC分类号： G01N23/04 , A61B6/4291 , A61B6/484 , G01N23/20075 , G01N2223/064 , G01N2223/1016 , G01N2223/6123 , G21K2207/005
摘要： The present invention relates to an interferometer for x-rays, in particular hard x-rays, for obtaining quantitative x-ray images from an object, comprising: a) an x-ray source, preferably a standard polly chromatic x-ray source, b) a diffractive beam splitter grating other than a Bragg crystal, preferably in transmission geometry, c) a position-sensitive detector with spatially modulated detection sensitivity having a number of individual pixels; d) means for recording the images of the detector in a phase- stepping approach; and e) means for evaluating the intensities for each pixel in a series of images in order to identify the characteristic of the object for each individual pixel as an absorption dominated pixel and/or an differential phase contrast dominated pixel and/or an x-ray scattering dominated pixel.
摘要翻译：本发明涉及一种用于从物体获得定量X射线图像的用于x射线的干涉仪，特别是硬X射线，其包括：a）x射线源，优选标准的极性色彩x射线源， b）除了布拉格晶体之外的衍射分束器光栅，优选地在透射几何形状中，c）具有多个单独像素的具有空间调制检测灵敏度的位置敏感检测器; d）用于以相位步进方式记录检测器的图像的装置; 以及e）用于评估一系列图像中的每个像素的强度的装置，以便识别作为吸收主导像素和/或差分相位对比度主导像素和/或x射线的每个单独像素的对象的特征散射主导像素。

4. 发明申请

WO2004072737A2 METHOD FOR GENERATING A CIRCULAR PERIODIC STRUCTURE ON A BASIC SUPPORT MATERIAL 审中-公开
标题翻译：在基本支持材料上生成圆周期结构的方法
公开(公告)号：WO2004072737A2
公开(公告)日：2004-08-26
申请号：PCT/EP2003/010233
申请日：2003-09-15
申请人： PAUL SCHERRER INSTITUT , DAVID, Christian , SOLAK, Harun
发明人： DAVID, Christian , SOLAK, Harun
IPC分类号： G03F7/20
CPC分类号： G03F7/70283 , G03F7/70341 , G03F7/7035 , G03F7/70408 , G03F7/70466
摘要： The aim of the invention is to provide a method allowing generation of periodic curved structures in a basic support material such as the basic layer for the magnetic bit cells of a magnetic storage device. This aim is achieved according to the invention by a method for generating a periodic circular structure for a support (12) for a magnetic storage device, comprising: a) generating a number of masks with each mask having at least one transmission diffraction gratings (4, 6, 8, 20 to 34, 38, 42, 46)) each having a different periodic concentric circular and/or spiral-like periodic pattern and/or a periodic radial spoke pattern; b) positioning of one or more of said diffraction masks (4, 6, 8, 20 to 34, 38, 42, 46) simultaneously or successively in a certain distance of a basic support material (12) to be patterned; c) applying light beams through each of the diffraction masks (4, 6, 8, 20 to 34, 38, 42, 46) for exposuring the basic support material to said light beam; d) interfering the different light beams diffracted by the gratings on each mask in order to generate coincident light intensity pattern on the surface of the basic support material (12); and e) optionally repeating the exposure procedure a number of times with different masks to obtain a desired pattern of a periodic circular structure with possible partitioning in the circumferential direction.
摘要翻译：本发明的目的是提供一种允许在诸如用于磁存储装置的磁位单元的基本层的基本支撑材料中产生周期性弯曲结构的方法。根据本发明，通过用于产生用于磁存储装置的支撑件（12）的周期性圆形结构的方法来实现该目的，该方法包括：a）产生多个掩模，每个掩模具有至少一个透射衍射光栅（4 ，6,8,20至34,38,42,46）），每个具有不同的周期性同心圆形和/或螺旋状周期性图案和/或周期性径向辐条图案; b）一个或多个所述衍射掩模（4,6,8,20〜34,38,42,46）在待图案化的基本支撑材料（12）的一定距离内同时或连续地定位; c）通过每个衍射掩模（4,6,8,20至34,38,42,46）施加光束以将基本支撑材料暴露于所述光束; d）在每个掩模上干扰由光栅衍射的不同光束，以便在基本支撑材料（12）的表面上产生一致的光强度图案; 和e）可选地用不同的掩模重复曝光程序多次以获得周期性圆形结构的期望图案，并且可能在圆周方向上划分。

5. 发明申请

WO2012000694A1 A METHOD FOR X-RAY PHASE CONTRAST AND DARK-FIELD IMAGING USING AN ARRANGEMENT OF GRATINGS IN PLANAR GEOMETRY 审中-公开
标题翻译：使用平面几何中的灰度方案进行X射线相位对比和暗场成像的方法
公开(公告)号：WO2012000694A1
公开(公告)日：2012-01-05
申请号：PCT/EP2011/055168
申请日：2011-04-04
申请人： Paul Scherrer Institut , DAVID, Christian , STAMPANONI, Marco
发明人： DAVID, Christian , STAMPANONI, Marco
IPC分类号： G01N23/04 , G21K1/02 , A61B6/00
CPC分类号： G01N23/04 , A61B6/4035 , A61B6/4291 , A61B6/484 , A61B6/502 , G21K1/025 , G21K1/06 , G21K2201/067 , G21K2207/005
摘要： An X-ray set-up can be suitable to record absorption, phase contrast, and dark field images of an object. The arrangement improves the visibility of low absorbing specimens and reduces the required radiation dose. The arrangement includes: a) an X-ray source; b) a set of at least two gratings; c) a position - sensitive detector with spatially modulated detection sensitivity; d) means for recording the images of the detector; e) means for evaluating the intensities for each pixel to identify the characteristic of the object for each individual pixel as an absorption and/or a differential phase contrast and/or an x-ray scattering dominated pixel; f) wherein the series of images is collected by continuously or stepwise rotating from 0 to n or 2n either the sample or the arrangement relative to the sample g) wherein the gratings are manufactured according to a novel planar geometry where the X-rays pass through the gratings parallel to the substrate, h) whereby the grating structures extend along the x-ray path which determines the phase shift and attenuation that these grating structures cause to the x-rays, being no longer given by the thickness of the structures, but by the length of the grating structures.
摘要翻译： X射线设置可以适用于记录物体的吸收，相位对比度和暗场图像。该装置提高了低吸收标本的可视性，并降低了所需的辐射剂量。该装置包括：a）X射线源; b）一组至少两个光栅; c）具有空间调制检测灵敏度的位置敏感检测器; d）用于记录检测器的图像的装置; e）用于评估每个像素的强度以识别作为吸收和/或差分相位对比和/或x射线散射主导像素的每个像素的对象的特征的装置; f）其中通过从样品或装置相对于样品g）从0到n或2n连续地或逐步地旋转来收集一系列图像，其中根据X射线穿过的新平面几何形状制造光栅栅格平行于衬底，h）由此光栅结构沿X射线路径延伸，这确定了这些光栅结构对X射线的相移和衰减，不再由结构的厚度给出，而是通过光栅结构的长度。

6. 发明申请

WO2004071298A1 APPARATUS AND METHOD TO OBTAIN PHASE CONTRAST X-RAY IMAGES 审中-公开
标题翻译：装置和获取相位对比X射线图像的方法
公开(公告)号：WO2004071298A1
公开(公告)日：2004-08-26
申请号：PCT/EP2003/010234
申请日：2003-09-15
申请人： PAUL SCHERRER INSTITUT , DAVID, Christian
发明人： DAVID, Christian
IPC分类号： A61B6/00
CPC分类号： A61B6/484 , A61B6/00 , A61B6/4092 , A61B6/4291 , A61B6/502 , G01N23/04 , G21K2207/005
摘要： An apparatus (2) for generating a phase contrast x-ray image (4) comprising in an optical path (6) as seen in the direction of the light flow: a) an incoherent x-ray source (8); b) a first beam splitter grating (12) for splitting the light beams (14) of said x-ray source (8); c) a second beam recombiner grating (20) for recombining the splitted beams (16, 18) in a recombination distance from the second beam recombiner grating (20); d) an optional third analyzer grating (22) in order to offer an adsorption lines grating matching the interference lines downstream of said second beam recombiner grating (20) in an analyzer plane (a); e) an image detector (30) disposed downstream of the analyzer plane (a); and f) a means for introducing a sample (24) into said optical path (6) upstream or downstream of the second beam recombiner grating (20).
摘要翻译：一种用于产生在沿光流方向观察的光路（6）中的相位对比度X射线图像（4）的装置（2）：a）非相干x射线源（8）; b）用于分割所述x射线源（8）的光束（14）的第一分束器光栅（12）。 c）第二光束重组光栅（20），用于将所述分裂光束（16,18）与所述第二光束重组光栅（20）重新组合; d）可选的第三分析器光栅（22），以便在分析器平面（a）中提供与所述第二光束复合光栅（20）下游的干涉线匹配的吸附线光栅; e）设置在分析器平面（a）下游的图像检测器（30）; 以及f）用于在第二光束重组光栅（20）的上游或下游将样品（24）引入所述光路（6）的装置。

7. 发明申请

WO2021037549A1 FABRICATION OF BLAZED DIFFRACTIVE OPTICS BY THROUGH-MASK OXIDATION 审中-公开
公开(公告)号：WO2021037549A1
公开(公告)日：2021-03-04
申请号：PCT/EP2020/072463
申请日：2020-08-11
申请人： PAUL SCHERRER INSTITUT
发明人： DAVID, Christian , GUZENKO, Vitaliy
IPC分类号： G03F7/00 , G03F7/075 , G03F7/40 , G03F7/20 , B33Y10/00 , B33Y70/00 , B33Y80/00
摘要： The present invention discloses a method to manufacture a low-angle blazed grating on a semiconductor substrate, such as a silicon substrate, said method comprising the steps of: a) the semiconductor substrate is spin-coated with a layer of resist, such as for example hydrogen or poly-silsesquioxane,with a thickness typically between 100 nm and 1000 nm, preferably a few hundreds of nanometers; b) a gray-scale irradiation lithography exposure step is applied to resist spin-coated on silicon substrate to generate a dose modulated pattern into the resist layer wherein the dose is varying locally in response to the density of the absorbed energy from the irradiation lithography exposure step; c) developing the coated and irradiated substrate in a suitable solution, such as for example TMAH or NaOH, thereby enabling a blazed profile comprising structures of thickness-dependent diffusion barriers, such as silicon dioxide SiO2, with a height in the range from 0 nm to 1000nm to emerge; d) performing a thermal oxidation step in an oxygen atmosphere at elevated temperature with the developed substrate thereby converting the upper layer of the silicon substrate into silicon dioxide to the depth depending on the thickness of the pattern in the resist layer above; and e) removing silicon dioxide in a hydrofluoric acid fluid thereby creating a low-angle low-roughness blazed grating structure on silicon substrate.

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