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    • 4. 发明申请
    • METHODS FOR FORMING PATTERNED STRUCTURES
    • 形成图案化结构的方法
    • WO2008022097A3
    • 2008-07-03
    • PCT/US2007075856
    • 2007-08-14
    • API NANOFABRICATION AND RES CODENG XUEDONGWANG JIAN JIMCHEN LEINIKOLOV ANGUEL NO'BRIEN NADALIU XIAOMING
    • DENG XUEDONGWANG JIAN JIMCHEN LEINIKOLOV ANGUEL NO'BRIEN NADALIU XIAOMING
    • H01L21/3205H01L21/4763
    • G02B5/1857
    • In general, in a first aspect, the invention features a method that includes forming a first layer comprising a first material over a surface of a second layer, wherein forming the first layer includes sequentially forming a plurality of monolayers of the second material over the surface of the second layer, the second layer comprises a plurality of rows of a second material extending along a first direction and spaced from one another in a second direction orthogonal to the first direction, and the first layer conforms to the surface of the second layer. The method further includes removing portions of the first layer to produce a plurality of rows of the first material extending along the first direction and spaced from one another in the second direction and removing portions of a third layer comprising a third material, where the portions correspond to intervals between the second plurality of rows so that removing the portions forms a plurality of rows of the third material extending along the first direction and spaced apart from one another. The first and second materials are different.
    • 通常,在第一方面,本发明的特征在于一种方法,该方法包括在第二层的表面上方形成包含第一材料的第一层,其中形成第一层包括在表面上顺序地形成多个单层的第二材料 第二层包括沿第一方向延伸且在与第一方向正交的第二方向上彼此间隔开的多行第二材料,并且第一层符合第二层的表面。 该方法进一步包括去除第一层的多个部分以产生沿着第一方向延伸且在第二方向上彼此间隔开的多行第一材料并且去除包括第三材料的第三层的部分,其中这些部分对应于 到第二多个行之间的间隔,使得去除这些部分形成沿着第一方向延伸并且彼此间隔开的多行第三材料。 第一种和第二种材料是不同的。