会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • MULTI-STACK OPTICAL DATA STORAGE MEDIUM AND USE OF SUCH MEDIUM
    • 多层光学数据存储介质和这种介质的使用
    • WO2004042717A1
    • 2004-05-21
    • PCT/IB2003/004682
    • 2003-10-22
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.VAN SCHIJNDEL, MarkMARTENS, Hubert C., F.TIEKE, BennoZHOU, Guofu
    • VAN SCHIJNDEL, MarkMARTENS, Hubert C., F.TIEKE, BennoZHOU, Guofu
    • G11B7/24
    • G11B7/258G11B7/24038G11B7/246G11B7/2585
    • The present invention relates to a multi-stack optical data storage medium (10). The medium comprises a first substrate (1a) with present on a side thereof a first recording stack (13) named L 0 , a second substrate (1b) with present on a side thereof a second recording stack (12) named L 1 comprising a recordable type L 1 recording layer (4) having a thickness t RL1 and a complex refractive index n λ - i*k λ at a wavelength λ. A second reflective layer (6) is present adjacent the L 1 recording layer (4) at a side most remote from a radiation beam (20) entrance face (11) of the medium. The second recording stack L 1 (12) is present at a position closer to the entrance face (11) than the L 0 recording stack (13). A radiation beam transparent spacer layer (9) is sandwiched between the recording stacks (12, 13). In order to achieve compatibility with the DVD-9 ROM standard as far as reflection levels are concerned, the second reflective layer (6) mainly comprises the metal Cu and has a thickness t MLn selected from the range of 8 - 20 nm and the thickness t RL1 and k λ of the recordable L 1 recording layer (4) fulfils the formula t RL1 *k λ ≤ 8 nm.
    • 本发明涉及一种多层光学数据存储介质(10)。 介质包括第一基板(1a),其一侧上具有名为L0的第一记录堆叠(13),第二基板(1b),其一侧上具有名称为L1的第二记录堆叠(12),其包括可记录型 L1记录层(4),其具有厚度tRL1和复数折射率nλ-i * klambda。 第二反射层(6)在距离介质的辐射束(20)入射面(11)最远的一侧邻近L1记录层(4)存在。 第二记录堆叠L1(12)存在于比L0记录堆叠(13)更靠近入口面(11)的位置。 辐射束透明间隔层(9)夹在记录叠层(12,13)之间。 为了实现与DVD-9 ROM标准的兼容性,就反射水平而言,第二反射层(6)主要包括金属Cu,并且具有选自8-20nm范围内的厚度tMLn和厚度tRL1 和可记录的L1记录层(4)的klambda满足公式tRL1 * klambda <= 8nm。
    • 6. 发明申请
    • METROLOGY METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD
    • 计量方法和装置,以及装置制造方法
    • WO2013026598A1
    • 2013-02-28
    • PCT/EP2012/062555
    • 2012-06-28
    • ASML NETHERLANDS B.V.WARNAAR, PatrickVAN SCHIJNDEL, MarkKUBIS, Michael
    • WARNAAR, PatrickVAN SCHIJNDEL, MarkKUBIS, Michael
    • G03F7/00
    • G03F7/70633G03F1/44G03F7/70683
    • A target structure including one or more periodic structures is formed on a substrate by a lithographic process. A image of the target structure is detected while illuminating the target structure with a beam of radiation, the image being formed using a first part of non-zero order diffracted radiation while excluding zero order diffracted radiation. Intensity values extracted from at least one region of interest within the image are used to determine a property of the periodic structure, for example asymmetry or overlay. To locate the ROI, a processing unit recognizes locations of a plurality of boundary features in the image of the target structure. The number of boundary features in each direction is at least twice a number of boundaries of periodic structures within the target structure. The accuracy of locating the ROI is greater than by recognizing only the boundaries of the periodic structure(s). The boundary features can be created by providing interruptions in a boundary region of the periodic structure. Regions of interest can be located in X and Y directions simultaneously, and with diffraction in X and Y directions simultaneously.
    • 通过光刻工艺在衬底上形成包括一个或多个周期结构的靶结构。 在用辐射束照射目标结构的同时检测目标结构的图像,该图像使用非零次衍射辐射的第一部分形成,同时排除零级衍射辐射。 使用从图像内的至少一个感兴趣区域提取的强度值来确定周期性结构的属性,例如不对称或覆盖。 为了定位ROI,处理单元识别目标结构的图像中的多个边界特征的位置。 每个方向上边界特征的数量至少是目标结构内周期性结构边界数量的两倍。 定位ROI的准确性大于仅识别周期性结构的边界。 可以通过在周期性结构的边界区域中提供中断来创建边界特征。 感兴趣区域可以同时位于X和Y方向,同时在X和Y方向衍射。