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    • 1. 发明申请
    • ATTACHMENT OF A HIGH-Z FOCAL TRACK LAYER TO A CARBON-CARBON COMPOSITE SUBSTRATE SERVING AS A ROTARY ANODE TARGET
    • 将高Z焦点轨道层连接到作为旋转阳极目标的碳 - 碳复合基材的附着
    • WO2010070574A1
    • 2010-06-24
    • PCT/IB2009/055740
    • 2009-12-14
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.DRORY, Michael, D.
    • DRORY, Michael, D.
    • H01J35/10
    • H01J35/108H01J2235/081H01J2235/084H01J2235/085H01J2235/088
    • The present invention refers to hybrid anode disk structures for use in X- ray tubes of the rotary anode type and is concerned more particularly with a novel light weight anode disk structure (RA) which comprises an adhesion promoting protective silicon carbide (SiC) interlayer (SCI) deposited onto a rotary X-ray tube's anode target (AT), wherein the latter may e.g. be made of a carbon-carbon composite substrate (SUB'). Moreover, a manufacturing method for robustly attaching a coating layer (CL) consisting of a high-Z material (e.g. a layer made of a tungsten-rhenium alloy) on the surface of said anode target is provided, whereupon according to said method it may be foreseen to apply a refractory metal overcoating layer (RML), such as given e.g. by a tantalum (Ta), hafnium (Hf), vanadium (V) or rhenium (Re) layer, to the silicon carbide interlayer (SCI) prior to the deposition of the tungsten-rhenium alloy. The invention thus leverages the tendency for cracking of the silicon carbide coated carbon composite substrate (SUB') during thermal cycling and enhances adhesion of the silicon carbide/refractory metal interlayers to the carbon-carbon composite substrate (SUB') and focal track coating layer (CL) by an interlocking mechanism. Key aspects of the proposed invention are: a) controlled formation of coating cracks (SC) in the silicon carbide layer (SCI) and b) conformal filling of SiC crack openings with a refractory metal.
    • 本发明涉及用于旋转阳极型的X射线管的混合阳极盘结构,更具体地涉及一种新颖的轻质阳极盘结构(RA),其包括粘附促进保护性碳化硅(SiC)中间层( SCI)沉积到旋转X射线管的阳极靶(AT)上,其中后者可以例如 由碳 - 碳复合基板(SUB')制成。 此外,提供了一种用于将由高Z材料(例如由钨 - 铼合金制成的层)组成的涂层(CL)坚固地附着在所述阳极靶的表面上的制造方法,因此根据所述方法, 预期应用难熔金属外涂层(RML),例如给出例如 通过钽(Ta),铪(Hf),钒(V)或铼(Re)层到沉积钨 - 铼合金之前的碳化硅中间层(SCI)。 因此,本发明利用了在热循环期间碳化硅涂覆的碳复合基板(SUB')的开裂趋势,并且增强了碳化硅/难熔金属夹层对碳 - 碳复合基板(SUB')和聚焦轨道涂层 (CL)通过互锁机构。 提出的发明的关键方面是:a)在碳化硅层(SCI)中控制形成涂层裂纹(SC),以及b)使SiC裂纹开口与耐火金属的共形填充。