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    • 2. 发明申请
    • METHOD FOR MANUFACTURING A CROSSBAR CIRCUIT DEVICE
    • 制造交叉路电路装置的方法
    • WO2006131838A3
    • 2007-02-22
    • PCT/IB2006051660
    • 2006-05-24
    • KONINKL PHILIPS ELECTRONICS NVMEIJER PETER B L
    • MEIJER PETER B L
    • H01L27/10
    • B82Y10/00H01L27/10
    • Method for manufacturing a crossbar circuit on a substrate (1), the crossbar circuit comprising a first grid of first wires (10) and a second grid of second wires (17), the first wires extending in a first direction, the second wires extending in a second direction, the first direction and the second direction being arranged relative to each other to form a single two-dimensional wire grid, each first wire being separated from each second wire by an intermediate layer (14) located at a location where the first and second wires overlap; the method comprising: depositing an unprintable layer (2) on the substrate, imprinting a two-dimensional grid mask (5) into the unprintable layer by a mould (3); directionally depositing a first material (8) in the first direction on the grid mask; and directionally depositing a second material (15) in the second direction on the grid mask, the grid mask acting as a shadow mask during the directional deposition of the first and second material.
    • 用于在基板(1)上制造横向电路的方法,所述横向电路包括第一电线(10)的第一格栅和第二电线(17)的第二格栅,所述第一布线沿第一方向延伸,所述第二布线延伸 在第二方向上,第一方向和第二方向相对于彼此布置以形成单个二维线栅格,每个第一线通过位于所述第二方向的位置处的中间层(14)与每个第二线分离, 第一和第二线重叠; 所述方法包括:在所述基板上沉积不可打印层(2),通过模具(3)将二维栅格掩模(5)印刷到所述不可打印层中; 在栅格掩模上沿第一方向定向地沉积第一材料(8); 并且在所述栅格掩模上沿着所述第二方向定向地沉积第二材料(15),所述栅格掩模在所述第一和第二材料的定向沉积期间用作荫罩。