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1. 发明申请

WO2009008673A2 SUBSTRATE HEATING APPARATUS 审中-公开
标题翻译：基板加热装置
公开(公告)号：WO2009008673A2
公开(公告)日：2009-01-15
申请号：PCT/KR2008/004060
申请日：2008-07-10
申请人： JUSUNG ENGINEERING CO., LTD. , PARK, Won Seok , KIM, Ki Duck , LEE, Yong Hyun , CHOI, Seung Dae
发明人： PARK, Won Seok , KIM, Ki Duck , LEE, Yong Hyun , CHOI, Seung Dae
IPC分类号： H01L21/324
CPC分类号： H01L21/67115
摘要： A substrate heating apparatus is provided. The substrate heating apparatus includes a chamber, a substrate supporting unit configured to support at least one substrate where a thin film is formed on the top surface thereof, and at least one heating unit disposed in a region adjacent to the rear surface of the substrate. The heating unit includes a plurality of reflecting units arranged under the substrate, at least one lamp heating unit disposed inside the plurality of reflecting units, and a short- wavelength blocking layer disposed on the lamp heating unit. By providing the lamp heating unit under the substrate where the thin film or pattern is formed on the top surface, and supplying heat energy to the rear surface of the substrate, it is possible to prevent the degradation in efficiency of the thin film, such as degradation of the thin film formed on the top surface of the substrate due to the heat source or the peeling of the thin film due to the temperature deviation between the substrate and the thin film. Furthermore, the heat energy is widely spread out at the central region of the rear surface of the substrate, and the heat energy is focused at the edge region of the substrate, thereby heating the large-sized substrate uniformly.
摘要翻译：提供了一种基板加热装置。该基板加热设备包括腔室，基板支撑单元和至少一个加热单元，基板支撑单元被构造为支撑至少一个基板，其中，在基板的顶表面上形成有薄膜，并且至少一个加热单元设置在与基板的后表面相邻的区域中。加热单元包括布置在基板下方的多个反射单元，布置在多个反射单元内的至少一个灯加热单元以及布置在灯加热单元上的短波长阻挡层。通过将灯加热单元设置在顶表面上形成有薄膜或图案的基板下，并且将热能供应到基板的背表面，可以防止薄膜的效率降低，例如由于热源或由于衬底和薄膜之间的温度偏差导致的薄膜剥离而在衬底的顶表面上形成的薄膜退化。此外，热能广泛散布在基板后表面的中央区域，并且热能集中在基板的边缘区域，从而均匀地加热大尺寸基板。

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