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    • 5. 发明申请
    • APPARATUS FOR FORMING METAL THIN FILM AND METHOD FOR FORMING METAL THIN FILM USING SAME
    • 用于形成金属薄膜的装置和使用其形成金属薄膜的方法
    • WO2009145442A3
    • 2010-01-21
    • PCT/KR2009001627
    • 2009-03-31
    • INKTEC CO LTDCHUNG KWANG CHOONCHO HYUN NAMMOON DAE GYUKANG MIN KISUH WON KYUYOO JI HOON
    • CHUNG KWANG CHOONCHO HYUN NAMMOON DAE GYUKANG MIN KISUH WON KYUYOO JI HOON
    • C23C26/00
    • C23C26/00C23C24/08
    • The present invention relates to an apparatus for forming a metal thin film by quickly sintering a metal-containing composition formed on a substrate or the like through indirect heating by microwaves, and a method for forming a metal thin film using the same. The apparatus for forming a metal thin film according to the present invention includes: a shield case; at least one microwave generating unit arranged in the shield case to output microwaves; and at least one microwave absorbing plate spaced apart from the microwave generating unit to indirectly heat a substrate coated with the metal-containing composition by microwaves, wherein the microwave absorbing plate includes a main body, and a transparent conductive film coating the main body. Also, the method for forming a metal thin film according to the present invention includes: a step of coating a substrate with a metal-containing composition; a step of permitting the substrate to get closer to or to come in close contact with a microwave absorbing plate on which a transparent conductive film is provided; and a heat treatment step of sintering the metal-containing composition through indirect heating by microwaves to form a metal thin film or pattern.
    • 金属薄膜的制造方法技术领域本发明涉及通过利用微波间接加热将形成在基板等上的含金属组合物快速烧结而形成金属薄膜的装置以及使用其形成金属薄膜的方法。 根据本发明的用于形成金属薄膜的装置包括:屏蔽壳; 至少一个微波产生单元布置在屏蔽壳中以输出微波; 以及至少一个微波吸收板,其与所述微波发生单元间隔开以通过微波间接加热涂覆有所述含金属组合物的基板,其中所述微波吸收板包括主体,以及涂覆所述主体的透明导电膜。 此外,根据本发明的金属薄膜的形成方法包括:用含金属组合物涂布基材的步骤; 允许基板更靠近或与设置有透明导电膜的微波吸收板紧密接触的步骤; 以及通过微波间接加热烧结含金属组合物以形成金属薄膜或图案的热处理步骤。