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    • 10. 发明申请
    • METHOD OF FABRICATING MICROSCALE OPTICAL STRUCTURES
    • 微波光学结构的制作方法
    • WO2009136910A1
    • 2009-11-12
    • PCT/US2008/062772
    • 2008-05-06
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.YEO, Jong-SoukLANIG, Charlotte, R.
    • YEO, Jong-SoukLANIG, Charlotte, R.
    • G02B6/13
    • G02B6/13G02B5/04
    • A method (100) for manufacturing a microscale optical structure (405) from a wafer (1110), including: preparing (105) the wafer (1110) with coatings (1120) of desired optical properties by depositing the coatings (1120) on an optically finished surface (1125) of the wafer (1110); mounting (110) the wafer (1110) on a supporting base (1115) having a releasable medium, with the optically finished surface (1125) adjacent the supporting base (1115) to protect the optically finished surface (1125); forming (115) additional surfaces of the optical structure (405) at a desired angle (415) and depth (420) using a grinding blade (210) having a cutting face (410) at the angle (415), the grinding blade (210) being configured to rotate about an axis (275); and polishing (120) the additional surfaces of the optical structure (405) by introducing a polishing material onto the wafer (1110) and using a polishing means to smooth the additional surfaces.
    • 一种用于从晶片(1110)制造微尺度光学结构(405)的方法(100),包括:通过将涂层(1120)沉积在所述晶片(1120)上来制备(105)具有所需光学性质的涂层(1120) 晶片(1110)的光学加工表面(1125); 将晶片(1110)安装(110)在具有可释放介质的支撑基座(1115)上,光学加工表面(1125)邻近支撑基座(1115)以保护光学加工表面(1125)。 使用具有角度(415)的切割面(410)的研磨刀片(210),所述研磨刀片(415)将所述光学结构(405)的附加表面以期望的角度(415)和深度(420) 210)被配置为围绕轴线(275)旋转; 以及通过将抛光材料引入所述晶片(1110)上并使用抛光装置平滑所述附加表面来抛光(120)所述光学结构(405)的附加表面。