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1. 发明申请

WO1989002157A1 TARGET POSITIONING FOR MINIMUM DEBRIS 审中-公开
标题翻译：目标定位最低限度
公开(公告)号：WO1989002157A1
公开(公告)日：1989-03-09
申请号：PCT/US1988002881
申请日：1988-08-23
申请人： HAMPSHIRE INSTRUMENTS, INC.
发明人： HAMPSHIRE INSTRUMENTS, INC. , FRANKEL, Robert, D. , DRUMHELLER, Jerry
IPC分类号： H01J35/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70916 , G21B1/19 , Y02E30/16
摘要： An improved target (18, 44, 56, 66, 76 or 102) for use in a laser pulse (12 or 104) induced plasma X-ray lithography system (10 or 100) has a plurality of small holes (74 or 90) fabricated through a base (68 or 84) against which the laser beam (121 or 104) is focused. A film (70 or 86) covers each hole (74 or 90) and a thin layer of metal target material (72 or 88) is placed on the film (70 or 86). The thickness of the metal material (72 or 88) is selected to be sufficient to allow the complete ablation of the material during the existence of the laser beam (12 or 104) inducing the X-ray emitting plasma (20). In this manner, a minimal amount of debris (30) will be generated. The angle of the plane of the target (18, 44, 76 or 102) relative to the mask (24 or 110) plane and the angle of incidence of the laser beam (12 or 104) relative to the normal line to the target (18, 44, 76 or 102) are selected so that both the X-ray mask (24 or 110) and the laser beam (12 or 104) optical elements (113) are positioned in an area where few, if any, molten droplets of debris (30) are emitted.
摘要翻译：用于激光脉冲（12或104）感应等离子体X射线光刻系统（10或100）的改进目标（18,44,56,66,76或102）具有多个小孔（74或90）通过激光束（121或104）聚焦的基座（68或84）制造。薄膜（70或86）覆盖每个孔（74或90），薄膜（70或86）上放置一层金属靶材料（72或88）。选择金属材料（72或88）的厚度足以允许在存在激光束（12或104）的情况下完全消融材料，诱导X射线发射等离子体（20）。以这种方式，将产生最小量的碎屑（30）。靶（18,44,76或102）相对于掩模（24或110）平面的角度和激光束（12或104）相对于目标的法线的入射角（ 18，44，76或102），使得X射线掩模（24或110）和激光束（12或104）光学元件（113）都位于几个（如果有的话）熔融液滴的碎片（30）被排出。

2. 发明申请

WO1991018400A1 MASK TRAY FOR AND METHOD OF LOADING MASK IN LITHOGRAPHY SYSTEM 审中-公开
标题翻译：屏蔽系统中的掩模盘和加载掩模的方法
公开(公告)号：WO1991018400A1
公开(公告)日：1991-11-28
申请号：PCT/US1991003565
申请日：1991-05-20
申请人： HAMPSHIRE INSTRUMENTS, INC.
发明人： HAMPSHIRE INSTRUMENTS, INC. , BAKER, David, G.
IPC分类号： G21K05/00
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/707 , H01L21/682
摘要： A pin chuck (68) holds a wafer (40) during translation in an X-ray lithography machine (10). The chuck (68) is designed to be the same size as the wafer (40) and includes a plurality of extensions (106) having tops along a common plane. The space between the extensions is evacuated to hold and level the wafer (40). In order to load or remove a wafer (40) from the chuck (68), three extendable posts (114, 116 and 118) are provided which can be exended to permit a robot arm (92) to position a prealigned wafer (40) thereon for being lowered to the chuck (68) or to remove a wafer (40) therefrom lifted upward from the chuck (68). The three posts (114, 116 and 118) are triangularly positioned within a space sufficiently large to hold the wafer (40) and at the same time sufficiently close enough together to permit the fingers (96 and 98) of the robot arm (92) to fit therearound.

3. 发明申请

WO1989006430A1 GAP SENSING/ADJUSTMENT APPARATUS AND METHOD FOR A LITHOGRAPHY MACHINE 审中-公开
标题翻译： GAP感应/调整装置和方法机器
公开(公告)号：WO1989006430A1
公开(公告)日：1989-07-13
申请号：PCT/US1988004674
申请日：1988-12-28
申请人： HAMPSHIRE INSTRUMENTS, INC.
发明人： HAMPSHIRE INSTRUMENTS, INC. , FRANKEL, Robert, D. , MARTIN, Marc, J. , BAKER, David, G. , DUFT, Thomas, L.
IPC分类号： G21K05/00
CPC分类号： G03F9/7023 , B82Y10/00 , G03F7/70033 , G21B1/23
摘要： A step and repeat mechanism (16), used with an X-ray lithography system (10) for moving a wafer (40) to be exposed from position to position beneath the source of X-rays (34), includes means (46 and 48) for moving the wafer (40) to be exposed with six degrees of freedom. In addition, the mechanism (16) includes three motors (58-1, 58-2 and 58-3) for moving the wafer (40) in small increments in the Z direction. Sensors (74, 92, 94 and 96) are included for determining the plane of the mask (38) and the plane of each of the various sections (86) of wafer (40) to be exposed so that appropriate tip and tilt adjustments by the three fine Z motors (58-1, 58-2 and 58-3) can be made to cause the average plane of each section (86) of the wafer (40) to be parallel to the plane of the mask (38). Included in the mechanism (16) is a substage plate (50) which is adjusted by the three triangularly positioned fine Z motors (58-1, 58-2 and 58-3).

4. 发明申请

WO1989002154A1 MASS LIMITED TARGET 审中-公开
标题翻译： MASS有限公司目标
公开(公告)号：WO1989002154A1
公开(公告)日：1989-03-09
申请号：PCT/US1988002882
申请日：1988-08-23
申请人： HAMPSHIRE INSTRUMENTS, INC.
发明人： HAMPSHIRE INSTRUMENTS, INC. , FRANKEL, Robert, D. , DRUMHELLER, Jerry
IPC分类号： G21K05/10
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70916 , G21B1/19 , Y02E30/16
摘要： An improved target (76) for use in an X-ray lithography system has a plurality of small holes (90) fabricated through a base (84) against which the laser beam is focused. A film (86) covers each hole (90) and a thin layer of metal target material (88) is placed on the film (86). The thickness of the metal material (88) is selected to be sufficient to allow the complete ablation of the material during the existence of the laser beam inducing the X-ray emitting plasma. In this manner, a minimal amount of debris will be generated. The angle of the plane of the target (76) relative to the mask plane and the angle of incidence of the laser beam relative to the normal line to the target (76) are selected so that both the X-ray mask and the laser beam optical elements are positioned in an area where few, if any, molten droplets of debris are emitted.
摘要翻译：用于X射线光刻系统的改进的目标（76）具有通过基底（84）制造的多个小孔（90），激光束聚焦在该基座上。膜（86）覆盖每个孔（90），并且薄膜（86）上放置有薄金属靶材料（88）。金属材料（88）的厚度被选择为足以允许在激光束存在期间完全消融材料以引起X射线发射等离子体。以这种方式，将产生最小量的碎屑。选择靶（76）相对于掩模平面的平面与激光束相对于与靶（76）的法线的入射角度的角度，使得X射线掩模和激光束光学元件位于少量（如果有的话）碎屑的熔融液滴发射的区域中。

5. 发明申请

WO1991018333A1 PARTIALLY CONSTRAINED MINIMUM ENERGY STATE CONTROLLER 审中-公开
标题翻译：部分约束最小能源状态控制器
公开(公告)号：WO1991018333A1
公开(公告)日：1991-11-28
申请号：PCT/US1991003566
申请日：1991-05-20
申请人： HAMPSHIRE INSTRUMENTS, INC.
发明人： HAMPSHIRE INSTRUMENTS, INC. , JUDELL, Neil, H.
IPC分类号： G05B13/04
CPC分类号： B82Y10/00 , B23Q15/22 , G03F7/70033 , G03F7/70716
摘要： A lithographic system (10), having a stepper (16) on a block of granite (12) attached to the ground using isolation legs (32), includes a servo control system (34, 38, 40) for providing signals to a motor (18) associated with the stepper (16) to control its movement. The control system (34, 38, 40) includes means (38, 40) to calculate a filter formula used to generate the control signals, which formula is calculated in response to the initial velocity of the stepper (16) and a certain time between discrete movements, so that a minimum amount of energy is utilized. The filter formula requires that the difference in the velocity of the base (12) and the stepper (16) is zero at the time the stepper (16) reaches the final position. Where time is short, both the base (12) and the stepper (16) initially move with the same velocity and end with the same velocity, and an array processor (40) calculates the time varying filter formula.

6. 发明申请

WO1991018259A1 X-RAY LITHOGRAPHY ALIGNMENT SYSTEM 审中-公开
标题翻译： X射线光刻对准系统
公开(公告)号：WO1991018259A1
公开(公告)日：1991-11-28
申请号：PCT/US1991003563
申请日：1991-05-20
申请人： HAMPSHIRE INSTRUMENTS, INC.
发明人： HAMPSHIRE INSTRUMENTS, INC. , BONI, Robert , FRANKEL, Robert, D.
IPC分类号： G01B11/27
CPC分类号： B82Y10/00 , G03F7/70033 , G03F9/7088
摘要： An alignment system (86) for an X-ray lighography system (10) has an objective lens (110) positioned over an alignment mark (98) placed on a conventional X-ray mask membrane (37). Four orthogonally mounted light sources (126, 128, 130, and 132) provides light at a wavelength adapted to pass through the membrane (37) material. A similar alignment mark (104) is positioned on the wafer (40) and as it approaches the position of the stationary mask mark (98), the light means (126, 128, 130, and 132) illuminates both marks (98 and 104). Because of the membrane (37) and wafer (40) separation, a portion of the imaged light is deflected along a longer path (114, 116, 118, and 120) and both images are focused on different portions of a charged coupled device (112). By illuminating the four light sources (126, 128, 130, and 132) one at a time, an improved image of the edges (134, 136, 138, and 140) of the marks (98 and 104) is obtained. The images are detected and processed to find when the centers of the two marks (98 and 104) are in alignment.
摘要翻译：用于X射线成像系统（10）的对准系统（86）具有位于放置在常规X射线掩模膜（37）上的对准标记（98）上方的物镜（110）。四个正交安装的光源（126,128,130和132）提供适于穿过膜（37）材料的波长的光。类似的对准标记（104）定位在晶片（40）上，并且当其接近固定掩模标记（98）的位置时，光装置（126,128,130和132）照亮标记（98和104））。由于膜（37）和晶片（40）分离，成像光的一部分沿着较长路径（114,116,118和120）偏转，并且两个图像聚焦在带电耦合器件的不同部分上 112）。通过一次一个地照射四个光源（126,128,130和132），获得标记（98和104）的边缘（134,136,138和140）的改进图像。检测和处理图像以查找两个标记（98和104）的中心何时对齐。

7. 发明申请

WO1991018401A1 MASK TRAY FOR AND METHOD OF LOADING MASK IN LITHOGRAPHY SYSTEM 审中-公开
标题翻译：屏蔽系统中的掩模盘和加载掩模的方法
公开(公告)号：WO1991018401A1
公开(公告)日：1991-11-28
申请号：PCT/US1991003564
申请日：1991-05-20
申请人： HAMPSHIRE INSTRUMENTS, INC.
发明人： HAMPSHIRE INSTRUMENTS, INC. , WHITCOMB, Preston, X.
IPC分类号： G21K05/08
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/707 , G03F7/70741 , H01L21/682
摘要： A mask tray (132), used to hold and guide an X-ray mask (38) to the exposure column (36) of an X-ray lithography system (10), includes first and second holding means (148, 150) which engage vertical mask channels (140, 142) in the mask support (136) to hold the mask (38) on the tray (132). The tray (132) is shaped as a wafer and is moved and loaded on the exposure column (36) using the same translation mechanism (16) used to transport wafers being processed. After the mask (38) is aligned with the exposure column (36), the translation mechanism (16) is moved in the Z direction. At the same time vacuum means (39) are engaged to hold the mask (38) on the column (36) and the holding means (148, 150) are released slightly, thereby permitting the mask (38) to jump the last few microns to the column (36). During the jump, the mask (38) is guided by the holding means (148, 150) remaining near the channels (140, 142). Special translation mechanism (16) movements are needed to remove the tray (132).
摘要翻译：用于将X射线掩模（38）保持并引导到X射线光刻系统（10）的曝光柱（36）的掩模托盘（132）包括第一和第二保持装置（148,150）接合在掩模支撑件（136）中的垂直掩模通道（140,142）以将掩模（38）保持在托盘（132）上。托盘（132）成形为晶片，并使用用于输送正在处理的晶片的相同的平移机构（16）移动并装载在曝光柱（36）上。在掩模（38）与曝光柱（36）对准之后，平移机构（16）沿Z方向移动。同时，真空装置（39）接合以将掩模（38）保持在柱（36）上，并且保持装置（148,150）被稍微释放，从而允许掩模（38）跳过最后几微米到列（36）。在跳跃期间，掩模（38）由保持在通道（140,142）附近的保持装置（148,150）引导。需要特殊的平移机构（16）移动托盘（132）。

8. 发明申请

WO1989006376A1 POSITIONING SUBASSEMBLY FOR A LITHOGRAPHY MACHINE 审中-公开
标题翻译：定位分层机
公开(公告)号：WO1989006376A1
公开(公告)日：1989-07-13
申请号：PCT/US1988004673
申请日：1988-12-28
申请人： HAMPSHIRE INSTRUMENTS, INC.
发明人： HAMPSHIRE INSTRUMENTS, INC. , MARTIN, Marc, J. , BAKER, David, G. , DUFT, Thomas, L.
IPC分类号： G03B27/42
CPC分类号： G03F7/70691 , B82Y10/00 , G03F7/70033
摘要： A step and repeat mechanism (16), used with an X-ray lithography system (10) for moving a wafer (40) to be exposed from position to position beneath the source of X-rays (34), includes stages (46, and 48) for moving the wafer (40) to be exposed with six degrees of freedom. In addition, the mechanism (16) includes three motors (58-1, 58-2 and 58-3) for moving the wafer (40) in small increments in the Z direction. Sensors (74, 92, 94 and 96) are included for determining the plane of the mask (38) and the plane of each of the various sections (86) of wafer (40) to be exposed so that appropriate tip and tilt adjustments by the three fine Z motors (58-1, 58-2 and 58-3) can be made to cause the average plane of each section (86) of the wafer (40) to be parallel to the plane of the mask (38). Included in the mechanism (16) is a substage plate (50) which is adjusted by the three triangularly positioned fine Z motors (58-1, 58-2 and 58-3).
摘要翻译：与X射线光刻系统（10）一起使用的步骤和重复机构（16），用于移动待从X射线源（34）的下方的位置暴露的晶片（40）和48），用于以六个自由度移动待暴露的晶片（40）。此外，机构（16）包括用于在Z方向上以小增量移动晶片（40）的三个马达（58-1,58-2和58-3）。包括传感器（74,92,94和96），用于确定掩模（38）的平面和要暴露的晶片（40）的各个部分（86）中的每一个的平面，以便适当的尖端和倾斜调整由可以使三个细Z电动机（58-1,58-2和58-3）使得晶片（40）的每个部分（86）的平均平面平行于掩模（38）的平面，。机构（16）包括由三个三角定位的精细Z马达（58-1,58-2和58-3）调节的分段板（50）。

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