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    • 6. 发明申请
    • SALT-TOLERANT FRICTION-REDUCING COMPOSITION FOR TREATMENT OF A SUBTERRANEAN FORMATION
    • 用于治疗下层形成的耐盐摩擦减少组合物
    • WO2015112401A1
    • 2015-07-30
    • PCT/US2015/011423
    • 2015-01-14
    • HALLIBURTON ENERGY SERVICES, INC.
    • REDDY, Baireddy RaghavaLIANG, FengYE, Xiangnan
    • C09K8/12C09K8/035
    • C09K8/588C09K8/035C09K2208/28
    • Various embodiments disclosed related to a composition for treating a subterranean formation, and methods and systems including the same. In various embodiments, the present invention provides a method of treating a subterranean formation that can include obtaining or providing an aqueous composition including a friction-reducing water-soluble polymer including about Z 1 mol% of an ethylene repeating unit including a -C(O)NHR 1 group and including about N 1 mol% of an ethylene repeating unit comprising a -C(O)R 2 group. At each occurrence R 1 can independently be a substituted or unsubstituted C 5 -C 50 hydrocarbyl. At each occurrence R 2 can independently be selected from the group consisting of -NH 2 and -OR 3 , wherein at each occurrence R 3 is independently selected from the group consisting of -R 1 , -H, and a counterion. The repeating units can be in block, alternate, or random configuration. The variable Z 1 can be about 0.001% to about 50%, N 1 can be about 50% to about 99.999%, and Z 1 + N 1 can be about 100%. The method also includes placing the composition in a subterranean formation downhole.
    • 所公开的与用于处理地下地层的组合物有关的各种实施方案以及包括其的方法和系统。 在各种实施方案中,本发明提供了一种处理地下地层的方法,其可以包括获得或提供包含减摩水溶性聚合物的水性组合物,该水溶性聚合物包括约Z1摩尔%的包含-C(O) 并且包括约N1mol%的包含-C(O)R 2基团的乙烯重复单元。 在每次出现时,R 1可以独立地为取代或未取代的C 5 -C 50烃基。 在每次出现时,R 2可以独立地选自-NH 2和-OR 3,其中在每次出现时,R 3独立地选自-R 1,-H和抗衡离子。 重复单元可以是块,交替或随机配置。 变量Z1可以为约0.001%至约50%,N1可以为约50%至约99.999%,Z1 + N1可以为约100%。 该方法还包括将组合物置于井下的地层中。