会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明申请
    • SPIROPIPERIDINE DERIVATIVES AS NK3 ANTAGONISTS
    • 作为NK3拮抗剂的螺吡啶衍生物
    • WO2008081012A1
    • 2008-07-10
    • PCT/EP2008/050005
    • 2008-01-02
    • F. HOFFMANN-LA ROCHE AGCAROON, Joanie MarieDILLON, Michael PatrickHAN, BoNETTEKOVEN, MatthiasRATNI, HasaneVIFIAN, Walter
    • CAROON, Joanie MarieDILLON, Michael PatrickHAN, BoNETTEKOVEN, MatthiasRATNI, HasaneVIFIAN, Walter
    • C07D498/10A61K31/537A61P25/00
    • C07D498/10
    • The present invention relates to a compound of formula (I) wherein R 1 is hydrogen or lower alkyl; R 2 is lower alkyl, lower hydroxyalkyl or -(CHR 5 ) x -A; R 5 is hydrogen, lower alkyl or lower hydroxyalkyl, or is heteroaryl optionally substituted by lower alkyl; A is cycloalkyl, aryl, heterocyclyl or heteroaryl, which rings are optionally substituted one or more R 6 , wherein R 6 is lower alkyl, lower alkoxy, lower alkylsulfonyl, cyano, halogen, lower alkyl substituted by halogen or lower alkoxy substituted by halogen, or is aryl, heterocyclyl or heteroaryl optionally substituted by lower alkyl or is cycloalkyl optionally substituted by lower alkyl; x is 0, 1, 2 or 3; or R 1 , R 2 may form together with the N-atom heterocyclyl or heteroaryl, which rings are optionally substituted by one or more substituents selected from the group consisting of lower alkyl, lower alkoxy, lower alkylsulfonyl, halogen, cycloalkyl, benzyl or aryl; R 3 is hydrogen or halogen; R 4 is hydrogen or lower alkyl; R 7 is hydrogen, halogen or lower alkyl; m is 1 or 2; when m is 2, R 3 may be the same or not; n is 1 or 2; o is 1 or 2; when o is 2, R 7 may be the same or not; or to a pharmaceutically suitable acid addition salt thereof. It has been found that the present compounds are high potential NK-3 receptor antagonists for the treatment of depression, pain, psychosis, Parkinson's disease, schizophrenia, anxiety and attention deficit hyperactivity disorder (ADHD).
    • 本发明涉及其中R 1为氢或低级烷基的式(I)化合物; R 2是低级烷基,低级羟基烷基或 - (CHR 5 O)x -A; R 5为氢,低级烷基或低级羟烷基,或为任选被低级烷基取代的杂芳基; A是环烷基,芳基,杂环基或杂芳基,该环任选被一个或多个R 6取代,其中R 6是低级烷基,低级烷氧基,低级烷基磺酰基,氰基, 卤素,被卤素取代的低级烷基或被卤素取代的低级烷氧基,或被任选被低级烷基取代的芳基,杂环基或杂芳基或任选被低级烷基取代的环烷基; x为0,1,2或3; 或R 1,R 2可以与N-原子杂环基或杂芳基一起形成,该环任选被一个或多个选自以下的取代基取代:低级烷基 低级烷氧基,低级烷基磺酰基,卤素,环烷基,苄基或芳基; R 3是氢或卤素; R 4是氢或低级烷基; R 7是氢,卤素或低级烷基; m为1或2; 当m为2时,R 3可以相同或不相同; n为1或2; o是1或2; 当o为2时,R 7可以相同或不相同; 或其药学上适合的酸加成盐。 已经发现,本发明化合物是用于治疗抑郁症,疼痛,精神病,帕金森病,精神分裂症,焦虑和注意缺陷多动障碍(ADHD)的高潜力NK-3受体拮抗剂。