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    • 2. 发明申请
    • CONDENSATION POLYMER CONTAINING THE RESIDUE OF A BENZODIOXYLMETHINE COMPOUND AND SHAPED ARTICLES PRODUCED THEREFROM
    • 含有苯并二甲基甲基胺化合物残余物的凝聚聚合物及其制得的成型制品
    • WO8905832A3
    • 1989-07-27
    • PCT/US8804554
    • 1988-12-20
    • EASTMAN KODAK CO
    • WEAVER MAX ALLENPRUETT WAYNE PAYTONHILBERT SAMUEL DAVID
    • C08F299/04C08F283/01C08G63/54C08G63/685C08G63/688C08G64/00C08G64/04C08G63/62C08G63/68
    • C08G63/6858C08G63/54C08G64/045
    • Composition useful for molding into articles such as food containers, beverage bottles, cured structural plastics and the like comprising molding grade linear or unsaturated polyester or polycarbonate having reacted therewith or copolymerized therein the residue of one or more benzodioxylmethine compounds having formula (I), wherein R1 is cyano, carboxy, alkenyloxycarbonyl or an unsubstituted or substituted alkoxycarbonyl, cycloalkoxycarbonyl or aryloxycarbonyl radical; R2 is one of the groups specified for R1 or an unsubstituted or substituted aryl, carbamoyl, alkanoyl, cycloalkanoyl, aroyl, alkylsulfonyl, cycloalkylsulfonyl, arylsulfonyl or heterocyclic aryl radical; R3 is hydrogen or an unsubstitued or substituted alkyl, cycloalkyl or aryl radical; R4 is hydrogen, alkyl, alkoxy, or halogen; n is 1 or 2; and X is an unsubstituted or substituted methylene or ethylene radical; provided the benzodioxolylmethine compound bears at least one substituent that is reactive with one of the monomers from which the condensation polymer is derived, said benzodioxylmethine residue absorbing radiation in the range of about 250 nm to 390 nm and being nonextractable from said polymer and stable under polymer processing conditions. The benzodioxylmethine residues are present in the polymer as an integral part of the polymer chain and absorb ultraviolet radiation in the range of about 250 to about 390 nm. The residues are non extractable from the polymer and stable at the conditions at which the polymers are manufactured and processed.
    • 适用于模制成诸如食品容器,饮料瓶,固化结构塑料等的制品的组合物,其包含与其反应或在其中共聚一种或多种具有式(I)的一种或多种苯并二氧杂次甲基化合物的残余物的模塑级直链或不饱和聚酯或聚碳酸酯,其中 R1为氰基,羧基,烯氧基羰基或未取代或取代的烷氧基羰基,环烷氧基羰基或芳氧基羰基; R2为R1或未取代或取代的芳基,氨基甲酰基,烷酰基,环烷酰基,芳酰基,烷基磺酰基,环烷基磺酰基,芳基磺酰基或杂环芳基指定的基团之一; R3是氢或未取代或取代的烷基,环烷基或芳基; R4是氢,烷基,烷氧基或卤素; n是1或2; X是未取代或取代的亚甲基或亚乙基; 条件是苯并间二氧杂环戊烯基甲炔化合物带有至少一个可与缩合聚合物衍生自其中的单体反应的取代基,所述苯并二氧杂次甲基胺残基吸收约250nm至390nm范围内的辐射并且不能从所述聚合物中得到并在聚合物下稳定 加工条件。 苯并二氧甲基甲炔残基作为聚合物链的组成部分存在于聚合物中并吸收约250至约390nm范围内的紫外辐射。 残留物不能从聚合物中萃取出来,并且在制造和加工聚合物的条件下稳定。