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    • 6. 发明申请
    • PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    • 用于制造包含层的工艺和材料及其制品
    • WO2012087977A1
    • 2012-06-28
    • PCT/US2011/065929
    • 2011-12-19
    • E. I. DU PONT DE NEMOURS AND COMPANYRADU, Nora, SabinaFENNIMORE, Adam
    • RADU, Nora, SabinaFENNIMORE, Adam
    • H01L51/00H01L51/56
    • H01L51/0004H01L51/0003H01L51/0007H01L51/0018H01L51/0035H01L51/0059H01L51/5048H01L51/56
    • There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. The priming material has Formula (I). In Formula (I): Ar 1 through Ar 4 are the same or different and are aryl groups; L is a spiro group, an adamantyl group, bicyclic cyclohexyl, deuterated analogs thereof, or substituted derivatives thereof; R1 is^he same or different at each occurrence and is D, F, alkyl, aryl, alkoxyl, silyl, or a crosslinkable group, where adjacent R 1 groups can be joined together to form an aromatic ring; R 2 is the same or different at each occurrence and is H, D, or halogen; a is the same or different at each occurrence and is an integer from 0-4; and n is an integer greater than 0.
    • 提供了一种用于在第一层上形成包含的第二层的方法,包括以下步骤:形成具有第一表面能的第一层; 用起动材料处理第一层以形成起动层; 以辐射模式曝光引发层,导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层,从而产生具有起泡层图案的第一层,其中底漆层的图案具有高于第一表面能的第二表面能; 以及通过在第一层上的起动层的图案上的液体沉积形成第二层。 起动材料具有式(I)。 在式(I)中:Ar 1至Ar 4相同或不同,为芳基; L是螺基,金刚烷基,双环环己基,氘代类似物或其取代衍生物; R 1在每次出现时相同或不同,为D,F,烷基,芳基,烷氧基,甲硅烷基或可交联基团,其中相邻的R 1基团可以连接在一起形成芳香环; R2在每次出现时相同或不同,为H,D或卤素; a在每次出现时相同或不同,为0-4以上的整数; 并且n是大于0的整数。