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1. 发明申请

WO2008051328A1 COMPOSITION COMPRISING NEOPENTASILANE AND METHOD OF PREPARING SAME 审中-公开
标题翻译：包含NEOPENTASILANE的组合物及其制备方法
公开(公告)号：WO2008051328A1
公开(公告)日：2008-05-02
申请号：PCT/US2007/019165
申请日：2007-08-29
申请人： DOW CORNING CORPORATION , CANNADY, John, Patrick , ZHOU, Xiaobing
发明人： CANNADY, John, Patrick , ZHOU, Xiaobing
IPC分类号： C08G77/00 , C07F7/02
CPC分类号： C01B33/04
摘要： A composition comprising at lest 93% (w/w) neopentasilane; and a method of preparing a composition comprising neopentasilane, the method comprising treating a tetrakis- (trihalosilyl)silane with diisobutylaluminum hydride.
摘要翻译：包含至少93％（w / w）的新戊硅烷的组合物; 以及制备包含新戊硅烷的组合物的方法，该方法包括用氢化二异丁基铝处理四（三卤代甲硅烷基）硅烷。

2. 发明申请

WO2012050761A3 PROCESS FOR PREPARING AN ACRYLOYLOXYSILANE 审中-公开
公开(公告)号：WO2012050761A3
公开(公告)日：2012-04-19
申请号：PCT/US2011/052331
申请日：2011-09-20
申请人： DOW CORNING CORPORATION , HUPFIELD, Peter , ZHOU, Xiaobing
发明人： HUPFIELD, Peter , ZHOU, Xiaobing
IPC分类号： C07F7/08
摘要： A process for preparing an acryloyloxysilane, the process comprising reacting a metal salt of a carboxylic acid having the formula [CR 2 2 =CR 1 COO - ] a M a+ (I), with a haloorganoalkoxysilane having the formula XR 3 Si(OR 4 ) n R 5 3_n (II) in the presence of mineral spirits and a phase transfer catalyst at a temperature of from 50 to 160 °C to form a mixture comprising an acryloyloxysilane and a metal halide having the formula M a+ X - a (III), wherein R 1 is H or C 1 -C 6 hydrocarbyl, each R 2 is independently R 1 or [COO - ] a M a+ , M a+ is an alkali metal cation or alkaline earth metal cation, a is 1 or 2, X is halo, R 3 is C 1 -C 6 hydrocarbylene, each R 4 is independently C 1 -C 10 Q hydrocarbyl, each R 5 is independently R 1 and n is an integer from 1 to 3.

3. 发明申请

WO2011053551A1 POLYSILANE - POLYSILAZANE COPOLYMERS AND METHODS FOR THEIR PREPARATION AND USE 审中-公开
标题翻译：多晶硅 - 聚硅氧烷共聚物及其制备和使用方法
公开(公告)号：WO2011053551A1
公开(公告)日：2011-05-05
申请号：PCT/US2010/053946
申请日：2010-10-25
申请人： DOW CORNING CORPORATION , CHEN, Wei , MOYER, Eric, Scott , NGUYEN, Binh, Thanh , WANG, Sheng , WANOUS, Mark, A. , ZHOU, Xiaobing
发明人： CHEN, Wei , MOYER, Eric, Scott , NGUYEN, Binh, Thanh , WANG, Sheng , WANOUS, Mark, A. , ZHOU, Xiaobing
IPC分类号： C08G77/62 , C09D183/16
CPC分类号： C08G77/62 , C09D183/16 , Y10T428/31663
摘要： A polysilane - polysilazane copolymer contains a polysilane unit of formula (I), and a polysilazane unit of formula (II), where each R 1 and each R 2 are each independently selected from H, Si, and N atoms, R 3 is selected from H, Si, or C atoms, a ≥1, b ≥ 1, and a quantity (a + b) ≥ 2. The polysilane - polysilazane copolymer may be formulated in a composition with a solvent. The polysilane - polysilazane copolymer may be used in PMD and STI applications for trench filling, where the trenches have widths of 100 nm or less and aspect ratios of at least (6). The polysilane - polysilazane copolymer can be prepared by amination of a perchloro polysilane having (2) or more silicon atoms per molecule with a primary amine.
摘要翻译：聚硅烷 - 聚硅氮烷共聚物含有式（I）的聚硅烷单元和式（II）的聚硅氮烷单元，其中每个R 1和R 2各自独立地选自H，Si和N原子，R 3选自H， Si或C原子，a = 1，b = 1，数量（a + b）= 2。聚硅烷 - 聚硅氮烷共聚物可以用溶剂配制成组合物。聚硅烷 - 聚硅氮烷共聚物可用于PMD和STI应用于沟槽填充，其中沟槽具有100nm或更小的宽度和至少（6）的纵横比。聚硅烷 - 聚硅氮烷共聚物可以通过每分子具有（2）个或更多个硅原子的胺与一次胺胺化而制备。

4. 发明申请

WO2003044844A1 COMPOSITIONS AND METHODS FOR FORMING DIELECTRIC LAYERS USING A COLLOID 审中-公开
标题翻译：使用胶体形成介电层的组合物和方法
公开(公告)号：WO2003044844A1
公开(公告)日：2003-05-30
申请号：PCT/US2002/033141
申请日：2002-10-16
申请人： DOW CORNING CORPORATION , HWANG, Byung , KWAN, Kermit , LI, Zhongtao , MOYER, Eric , WANG, Sheng , WYMAN, David , ZHOU, Xiaobing
发明人： HWANG, Byung , KWAN, Kermit , LI, Zhongtao , MOYER, Eric , WANG, Sheng , WYMAN, David , ZHOU, Xiaobing
IPC分类号： H01L21/316
CPC分类号： H01L21/316 , H01L21/02164 , H01L21/02282 , H01L21/02337 , H01L21/76224
摘要： A colloid composition can be used to form a thin film on a substrate. The colloid can be colloidal silica. The thin film can be a dielectric layer. The substrate can be a semiconductor substrate having gaps thereon.
摘要翻译：可以使用胶体组合物在基材上形成薄膜。胶体可以是胶体二氧化硅。薄膜可以是介电层。衬底可以是其上具有间隙的半导体衬底。

5. 发明申请

WO2011119990A1 PREPARATION OF LIGNOCELLULOSIC PRODUCTS 审中-公开
标题翻译：细菌产品的制备
公开(公告)号：WO2011119990A1
公开(公告)日：2011-09-29
申请号：PCT/US2011/030042
申请日：2011-03-25
申请人： DOW CORNING CORPORATION , ZHOU, Xiaobing , CHORVATH, Igor
发明人： ZHOU, Xiaobing , CHORVATH, Igor
IPC分类号： C08G18/61 , C08G18/76 , C08L97/02
CPC分类号： C08G18/7664 , C08G18/302 , C08G18/61 , C08G18/6492 , C08K5/07 , C08K5/205 , C08L61/06 , C08L61/12 , C08L61/24 , C08L61/28 , C08L83/04 , C08L91/06 , C08L97/02 , Y10T428/249921 , C08L75/04
摘要： A method of preparing a polymeric methylene diphenyl diisocyanate- polydialkylsiloxane resin by mixing at a temperature between 25°C and 100°C: (i) a polymeric methylene diphenyl diisocyanate with (ii) a polydialkylsiloxane selected from hydroxyalkyl dialkyl terminated polydialkylsiloxane having a viscosity of from 5 to 500 000 cSt at 25°C or (hydroxyalkoxy)alkyl dialkyl terminated polydialkylsiloxane having a viscosity of from 5 to 500 000 cSt at 25°C in an amount such that from 1 to 99 % by weight of the total weight of (i) and (ii) is component (ii), optionally in the presence of a solvent; and subsequently extracting the solvent, if present.
摘要翻译：通过在25℃至100℃的温度下混合制备聚合亚甲基二苯基二异氰酸酯 - 聚二烷基硅氧烷树脂的方法：（i）聚合亚甲基二苯基二异氰酸酯与（ii）选自羟烷基二烷基封端的聚二烷基硅氧烷的聚二烷基硅氧烷，在25℃下为5至500,000cSt或在25℃下具有5至500 000cSt粘度的（羟基烷氧基）烷基二烷基封端的聚二烷基硅氧烷，其量使得（I）的总重量的1-99重量％ i）和（ii）是组分（ii），任选地在溶剂存在下; 并随后萃取溶剂（如果存在）。

6. 发明申请

WO2010047869A1 CVD PRECURSORS 审中-公开
标题翻译： CVD前辈
公开(公告)号：WO2010047869A1
公开(公告)日：2010-04-29
申请号：PCT/US2009/053364
申请日：2009-08-11
申请人： DOW CORNING CORPORATION , ZHOU, Xiaobing
发明人： ZHOU, Xiaobing
IPC分类号： C23C16/42 , H01L21/205
CPC分类号： H01L21/02271 , B05D1/62 , C23C16/30 , C23C16/345 , C23C16/36 , C23C16/401 , C23C16/45553 , H01L21/02126 , H01L21/02167 , H01L21/02219 , H01L21/02274 , H01L21/3148 , H01L21/31633 , H01L21/3185
摘要： A method of producing silicon containing thin films by the thermal polymerization of a reactive gas mixture bisaminosilacyclobutane and source gas selected from a nitrogen providing gas, an oxygen providing gas and mixtures thereof. The films deposited may be silicon nitride, silicon carbonitride, silicon dioxide or carbon doped silicon dioxide. These films are useful as dielectrics, passivation coatings, barrier coatings, spacers, liners and/or stressors in semiconductor devices.
摘要翻译：通过反应性气体混合物双氨基硅烷环丁烷和选自氮气提供气体，氧气提供气体及其混合物的源气体的热聚合制备含硅薄膜的方法。沉积的膜可以是氮化硅，碳氮化硅，二氧化硅或碳掺杂的二氧化硅。这些膜可用作半导体器件中的电介质，钝化涂层，阻挡涂层，间隔物，衬垫和/或应力源。

7. 发明申请

WO2012125432A1 POLYSILANESILOXANE COPOLYMERS AND METHOD OF CONVERTING TO SILICON DIOXIDE 审中-公开
标题翻译：聚硅氧烷共聚物和转化为二氧化硅的方法
公开(公告)号：WO2012125432A1
公开(公告)日：2012-09-20
申请号：PCT/US2012/028390
申请日：2012-03-09
申请人： DOW CORNING CORPORATION , ZHOU, Xiaobing
发明人： ZHOU, Xiaobing
IPC分类号： C08G77/48 , C09D183/14
CPC分类号： C09D1/00 , C08G77/48 , C08G77/52 , C09D183/14 , H01L21/02164 , H01L21/02282
摘要： Inorganic polysilanesiloxane (PSSX) copolymers and method of making and applying the same to the surface of a substrate is provided. These PSSX copolymers are beneficial in forming a dense silicon dioxide layer on a substrate under mild oxidative conditions. The PSSX copolymers comprise Si x O y (OH) z units, wherein y and z are defined by the relationship (2y + z)
摘要翻译：提供了无机聚硅烷（PSSX）共聚物及其制备及其应用于基材表面的方法。这些PSSX共聚物在温和氧化条件下在底物上形成致密二氧化硅层是有利的。 PSSX共聚物包含六个（OH）z单元，其中y和z由关系式（2y + z）<（2x + 2）定义，x是4或5.更具体地说，PSSX共聚物不含Si- C共价键。

8. 发明申请

WO2012122342A1 POLYSILANESILOXANE RESINS FOR USE IN AN ANTIREFLECTIVE COATING 审中-公开
标题翻译：用于抗反射涂层的聚硅氧烷树脂
公开(公告)号：WO2012122342A1
公开(公告)日：2012-09-13
申请号：PCT/US2012/028208
申请日：2012-03-08
申请人： DOW CORNING CORPORATION , ZHOU, Xiaobing , MOYER, Eric S.
发明人： ZHOU, Xiaobing , MOYER, Eric S.
IPC分类号： C09D183/04 , C08G77/48
CPC分类号： C09D5/006 , C08G77/48 , C09D183/14
摘要： Polysilanesiloxane copolymers or resins and method of making are provided. The present disclosure further provides a method of applying the polysilanesiloxane copolymers onto a substrate to form a polysilanesiloxane film for use in photolithography (193 nm). The polysilanesiloxane films meet the basic performance criteria expected or desired for use in an antireflection coating (ARC) application,
摘要翻译：提供聚硅氧烷共聚物或树脂及其制备方法。本公开进一步提供了一种将聚硅烷硅氧烷共聚物施加到基材上以形成用于光刻（193nm）的聚硅烷硅氧烷膜的方法。聚硅烷硅氧烷膜符合预防或期望用于抗反射涂层（ARC）应用的基本性能标准，

9. 发明申请

WO2015184201A1 MONOAMINOSILANE COMPOUNDS 审中-公开
标题翻译：单甲氧基化合物
公开(公告)号：WO2015184201A1
公开(公告)日：2015-12-03
申请号：PCT/US2015/033074
申请日：2015-05-29
申请人： DOW CORNING CORPORATION
发明人： REKKEN, Brian David , ZHOU, Xiaobing
IPC分类号： C07F7/02 , C07F7/08 , C07F7/10
CPC分类号： C07F7/10 , C07F7/12 , C07F7/126
摘要： Disclosed is a compound of formula (I): (R 1 R 2 N)Si n H 2n+1 (I), wherein subscript n is an integer from 3 to 9; and each R 1 and R 2 independently is (C 1 -C 6 )alkyl, (C 3 -C 6 )cycloalkyl, (C 2 -C 6 )alkenyl, (C 2 -C 6 )alkynyl, or phenyl; or R 1 is H and R 2 is (C 1 -C 6 )alkyl, (C3-C6)cycloalkyl, (C2-C6)alkenyl, (C2-C6)alkynyl, or phenyl; or R 1 and R 2 are bonded together to be -R 1a _R 2a _ wherein -R 1a -R 2a - is (C 2 -C 5 )alkylene. Also disclosed are a method of making, intermediates useful therein, method of using, and composition comprising the compound of formula (I).
摘要翻译：公开了式（I）的化合物：（R1R2N）SinH2n + 1（I），其中下标n为3至9的整数; 并且每个R 1和R 2独立地为（C 1 -C 6）烷基，（C 3 -C 6）环烷基，（C 2 -C 6）烯基，（C 2 -C 6）炔基或苯基; 或R 1为H且R 2为（C 1 -C 6）烷基，（C 3 -C 6）环烷基，（C 2 -C 6）烯基，（C 2 -C 6）炔基或苯基; 或者R 1和R 2结合在一起为-R1aR2a，其中-R1a-R2a-为（C2-C5）亚烷基。还公开了制备其中有用的中间体，使用方法和包含式（I）化合物的组合物的方法。

10. 发明申请

WO2013109684A1 SILICON-RICH ANTIREFLECTIVE COATING MATERIALS AND METHOD OF MAKING SAME 审中-公开
标题翻译：有机硅的抗反射涂层材料及其制备方法
公开(公告)号：WO2013109684A1
公开(公告)日：2013-07-25
申请号：PCT/US2013/021829
申请日：2013-01-17
申请人： DOW CORNING CORPORATION
发明人： TZOU, Ming-Shin , ZHOU, Xiaobing
IPC分类号： C09D183/14 , C08G77/48 , G03F7/075 , H01L21/312
CPC分类号： C09D183/14 , C08G77/48 , G03F7/0752 , G03F7/091 , H01L21/02118 , H01L21/02126 , H01L21/02282 , H01L21/02318 , H01L21/0276 , Y10T428/31663
摘要： An antireflective coating (ARC) formulation for use in photolithography is provided that comprises silicon-rich polysilanesiloxane resins dispersed in a solvent, as well as a substrate having a surface coated with the ARC formulation and a method of applying the ARC formulation to said surface to form an ARC layer. The polysilanesiloxane resins comprise a first component defined by structural units of (R') 2 SiO 2 ; a second component defined by structural units of (R")SiO 3 and a third component defined by structural units of (R"') q+2 Si 2 O 4-q . In these polysilanesiloxane resins, the R', R", and R'" are independently selected to be hydrocarbon or hydrogen (H) groups; and the subscript q is 1 or 2. Alternatively, the R', R", and R'" are independently selected as methyl (Me) or hydrogen (H) groups. Typically, the first component is present in a molar ratio x, the second component is present in molar ratio y, and the third component is present in a molar ratio z, such that (x + y + z) = 1, x
摘要翻译：提供了一种用于光刻的抗反射涂层（ARC）制剂，其包括分散在溶剂中的富含硅的聚硅烷硅氧烷树脂，以及具有涂覆有ARC制剂的表面的基材以及将ARC制剂施用于所述表面至形成ARC层。聚硅烷基硅氧烷树脂包括由（R'）2 SiO 2的结构单元限定的第一组分; 由（R“）SiO 3的结构单元和由（R”'）q + 2Si 2 O 4-q的结构单元限定的第三组分限定的第二组分。在这些聚硅烷基硅氧烷树脂中，R'，R“和R”“独立选择为烃或氢（H）基团; 并且下标q为1或2.或者，R'，R“和R”“独立地选自甲基（Me）或氢（H）基团。通常，第一组分以摩尔比x存在，第二组分以摩尔比y存在，第三组分以摩尔比z存在，使得（x + y + z）= 1，x

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