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    • 1. 发明申请
    • AMINOCHLOROHYDRIDODISILANES
    • WO2017200908A1
    • 2017-11-23
    • PCT/US2017/032619
    • 2017-05-15
    • DOW CORNING CORPORATION
    • CHANG, NoelHWANG, Byung, K.REKKEN, Brian, DavidZHOU, Xiaobing
    • C07F7/10C23C16/24
    • Disclosed is a Silicon Precursor Compound for deposition, the Silicon Precursor Compound comprising a compound which is a disilane and which comprises at least one chloro group, at least one dialkylamino group and at least one hydrido group; a composition for film forming, the composition comprising the Silicon Precursor Compound and at least one of an inert gas, molecular hydrogen, a carbon precursor, nitrogen precursor, and oxygen precursor; a process of synthesizing the Silicon Precursor Compound; a method of forming a silicon-containing film on a substrate using the Silicon Precursor Compound; the silicon-containing film formed thereby; and a method of forming the Silicon Precursor Compound.
    • 公开了用于沉积的硅前体化合物,所述硅前体化合物包含为乙硅烷且包含至少一个氯基,至少一个二烷基氨基和至少一个氢基的化合物; 用于成膜的组合物,所述组合物包含硅前体化合物和惰性气体,分子氢,碳前体,氮前体和氧前体中的至少一种; 合成硅前体化合物的过程; 使用硅前体化合物在衬底上形成含硅膜的方法; 由此形成的含硅膜; 和形成硅前体化合物的方法。