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    • 3. 发明申请
    • RADIATION TRACKING APPARATUS
    • 辐射跟踪设备
    • WO2012172366A1
    • 2012-12-20
    • PCT/GB2012/051386
    • 2012-06-15
    • DATALASE LIMITEDCRIDLAND, JohnWYRES, ChrisHOLLOWAY, LeePHILLIPS, Tristan
    • CRIDLAND, JohnWYRES, ChrisHOLLOWAY, LeePHILLIPS, Tristan
    • B41J2/475B41J2/47B41J2/45B41J2/46G06K15/12
    • B41J2/4753B41J2/451B41J2/46B41J2/47G06K15/12G06K15/1219
    • A substrate marking apparatus (10) is suitable for irradiating a substrate (5) that moves relative thereto and it comprises; a radiation source (1); a beam steering unit (2); a monitoring means (3); and a processing means (4), The radiation source (1) is operable to output a beam of radiation (11) and the beam steering unit (2) is operable to receive this radiation (11) and transmit it to an output point (21). The output point (21) is operable to move between at least a start position and a stop position. The monitoring means (3) is operable to monitor the position and speed of the substrate (5) which it is desired to irradiate and to transmit this information to the processing means (4). In turn, the processing means (4) is operable to receive this information from the monitoring (means 3) and transmit instructions to: the radiation source (1) so as to control the emission of radiation therefrom; and the beam steering unit (2) so as to control the movement of the output point (21). The apparatus therefore includes a means to steer the radiation emitted by the radiation source (1) such that any image dot distortions resulting from relative motion of the substrate (5) and the radiation source (1) are minimised or eliminated. Such an arrangement therefore results in an image quality that is independent of the relative speed of the substrate (5)and the radiation source (1).
    • 基板标记装置(10)适于照射相对于其移动的基板(5),其包括: 辐射源(1); 光束转向单元(2); 监视装置(3); 和处理装置(4),辐射源(1)可操作以输出辐射束(11),并且光束控制单元(2)可操作以接收该辐射(11)并将其发射到输出点 21)。 输出点(21)可操作以在至少起始位置和停止位置之间移动。 监视装置(3)可操作以监视其期望照射的基板(5)的位置和速度,并将该信息发送到处理装置(4)。 反过来,处理装置(4)可操作以从监视(装置3)接收该信息,并将指令发送到:辐射源(1),以便控制辐射源的发射; 和光束转向单元(2),以便控制输出点(21)的移动。 因此,该装置包括用于控制由辐射源(1)发射的辐射的装置,使得由衬底(5)和辐射源(1)的相对运动导致的任何图像点失真被最小化或消除。 因此,这种布置导致独立于基板(5)和辐射源(1)的相对速度的图像质量。