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1. 发明申请

WO2007078154A1 PROCESS FOR PREPARING CRYSTALLINE FORM A OF LANSOPRAZOLE 审中-公开
标题翻译：制备兰索唑晶型的方法
公开(公告)号：WO2007078154A1
公开(公告)日：2007-07-12
申请号：PCT/KR2007/000048
申请日：2007-01-04
申请人： DAEWOONG PHARMACEUTICAL CO., LTD. , DAEWOONG CHEMICAL CO., LTD. , MOON, Seong Cheol , SONG, In Woong , KANG, Doo Sung , OH, Seong Soo , LEE, Sung Jae
发明人： MOON, Seong Cheol , SONG, In Woong , KANG, Doo Sung , OH, Seong Soo , LEE, Sung Jae
IPC分类号： C07D401/12
CPC分类号： C07D401/12
摘要： The present invention relates to a process for preparing Crystalline Form A of Lansoprazole. Specifically, the present invention relates to a process for preparing highly pure Crystalline Form A of Lansoprazole in a large scale without any additional conversion step, even by using ethanol in which Crystalline Form B is easily formed.
摘要翻译：本发明涉及一种制备兰索拉唑晶型A的方法。具体地说，本发明涉及一种大规模制备高纯度兰索拉唑晶型A的方法，没有任何额外的转化步骤，甚至通过使用其中容易形成晶型B的乙醇。

2. 发明申请

WO2007078039A1 PURIFICATION PROCESS FOR CHENODEOXYCHOLIC ACID 审中-公开
标题翻译：正辛氧基乙酸的净化工艺
公开(公告)号：WO2007078039A1
公开(公告)日：2007-07-12
申请号：PCT/KR2006/002998
申请日：2006-07-31
申请人： DAEWOONG PHARMACEUTICAL CO., LTD. , KIM, Tae Yi , KIM, Young Soo , LIM, Young Mook , KIM, Wol Young , YOON, Yeon Jung , JIN, Yong Suk , LEE, Byung Goo , CHOI, Soo Jin , LEE, Sung Jae
发明人： KIM, Tae Yi , KIM, Young Soo , LIM, Young Mook , KIM, Wol Young , YOON, Yeon Jung , JIN, Yong Suk , LEE, Byung Goo , CHOI, Soo Jin , LEE, Sung Jae
IPC分类号： C07H21/00
CPC分类号： C07J9/005
摘要： The present invention relates to a process for purifying chenodeoxycholic acid (3α,7α-dihydroxy-5 β -cholic acid). In particular, the present invention relates to a process for purifying chenodeoxycholic acid from low grade of chenodeoxycholic acid mixture in swine bile solid, with high yield and purity.
摘要翻译：本发明涉及一种纯化鹅脱氧胆酸（3α，7α-二羟基-5β-胆酸）的方法。具体地说，本发明涉及一种从猪胆汁固体中的低品位鹅脱氧胆酸混合物中纯化鹅脱氧胆酸的方法，该方法具有高收率和高纯度。

3. 发明申请

WO2007069814A1 PURIFICATION PROCESS FOR CHENODEOXYCHOLIC ACID 审中-公开
标题翻译：纯化羟基酸的纯化方法
公开(公告)号：WO2007069814A1
公开(公告)日：2007-06-21
申请号：PCT/KR2006/002972
申请日：2006-07-28
申请人： DAEWOONG PHARMACEUTICAL CO., LTD. , KIM, Tae Yi , KIM, Young Soo , LIM, Young Mook , KIM, Wol Young , YOON, Yeon Jung , JIN, Yong Suk , LEE, Byung Goo , CHOI, Soo Jin , LEE, Sung Jae
发明人： KIM, Tae Yi , KIM, Young Soo , LIM, Young Mook , KIM, Wol Young , YOON, Yeon Jung , JIN, Yong Suk , LEE, Byung Goo , CHOI, Soo Jin , LEE, Sung Jae
IPC分类号： C07J9/00
CPC分类号： C07J9/005
摘要： The present invention relates to a process for purifying chenodeoxycholic acid (3α,7α-dihydroxy-5β-cholic acid). In particular, the present invention relates to a process for purifying chenodeoxycholic acid from low grade of chenodeoxycholic acid mixture in swine bile solid, with high yield and purity.
摘要翻译：本发明涉及纯化鹅脱氧胆酸（3a，7a-二羟基-5β-胆酸）的方法。特别地，本发明涉及从猪胆固醇中的低等级鹅脱氧胆酸混合物纯化鹅脱氧胆酸的方法，其产率高，纯度高。

4. 发明申请

WO2008018749A1 RESIN COMPOSITION FOR FORMING FINE PATTERNS, METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE COMPOSITION AND SEMICONDUCTOR DEVICE FABRICATED BY THE METHOD 审中-公开
标题翻译：用于形成精细图案的树脂组合物，使用由该方法制成的组合物和半导体器件制造半导体器件的方法
公开(公告)号：WO2008018749A1
公开(公告)日：2008-02-14
申请号：PCT/KR2007/003809
申请日：2007-08-08
申请人： CHEIL INDUSTRIES INC. , KIM, Hee Jae , KIM, Sang Kyun , UH, Dong Seon , WOO, Chang Soo , YUN, Sang Geun , LEE, Sung Jae , YOO, Yong Sik , KIM, Tae Ho
发明人： KIM, Hee Jae , KIM, Sang Kyun , UH, Dong Seon , WOO, Chang Soo , YUN, Sang Geun , LEE, Sung Jae , YOO, Yong Sik , KIM, Tae Ho
IPC分类号： G03F7/004
CPC分类号： G03F7/40 , H01L21/0273
摘要： Disclosed herein is a resin composition for forming fine patterns that enables reduction in width of an engraved portion in a photoresist pattern during lithography in semiconductor device fabrication. Further, disclosed herein is a method for fabricating a semiconductor device by using the composition. The resin composition comprises a) a polymer having aromatic hydroxyl groups in which all or a part of the hydroxyl groups are substituted with a water-soluble group; and b) water or an aqueous mixture of water-miscible solvent wherein the composition is applied to a photoresist pattern to form a coating film and the water-soluble group is removed by an acid catalyst supplied from the photoresist pattern, to selectively leave insoluble regions in the coating film.
摘要翻译：本文公开了一种用于在半导体器件制造中的光刻期间形成精细图案的树脂组合物，其能够减少光致抗蚀剂图案中的雕刻部分的宽度。此外，本文公开了通过使用该组合物来制造半导体器件的方法。树脂组合物包含a）具有芳族羟基的聚合物，其中全部或一部分羟基被水溶性基团取代; 和b）水或水混溶性溶剂的水性混合物，其中将组合物施加到光致抗蚀剂图案上以形成涂膜，并且通过由光致抗蚀剂图案提供的酸催化剂除去水溶性基团，以选择性地留下不溶性区域在涂膜中。

5. 发明申请

WO2012165770A1 WASTE DISPOSAL SYSTEM FOR MELTING ASBESTOS WASTE BY USING NORMAL WASTE AS FUEL 审中-公开
标题翻译：通过使用正常废物作为燃料来消化ASBESTOS废物的废物处理系统
公开(公告)号：WO2012165770A1
公开(公告)日：2012-12-06
申请号：PCT/KR2012/003627
申请日：2012-05-09
申请人： HALLA ENGINEERING & INDUSTRIAL DEVELOPEMENT CO., LTD. , PARK, Se Young , NAM, Kee Young , LEE, Sung Jae , MIN, Jee Eun , KIM, Kyung Hyuk
发明人： PARK, Se Young , NAM, Kee Young , LEE, Sung Jae , MIN, Jee Eun , KIM, Kyung Hyuk
IPC分类号： F23G7/00 , F23G5/02 , F23G5/027 , F23G5/033
CPC分类号： F23G5/02 , F23G5/027 , F23G5/033 , F23G7/00 , F23G2201/303 , F23G2201/304 , F23G2202/20 , F23G2206/201 , F23G2900/50001 , F23G2900/50206 , F23L2900/07005 , Y02E20/344 , Y02E20/363
摘要： A waste disposal system and method for disposing of asbestos containing waste (hereinafter, referred to as "ACW") are provided. The waste disposal system includes a pyrolysis furnace configured to pyrolyze incoming municipal solid waste and discharge pyrolyzed gas and pyrolyzed solids; a melting furnace configured to melt the pyrolyzed solids and discharge melting exhaust gas and slag; and an asbestos preprocessing device configured to crush incoming ACW, mix an additive to the ACW, pelletize the crushed ACW and discharge the pelletized ACW at a pressure lower than atmospheric pressure, wherein the melting furnace melts the pelletized ACW along with the pyrolyzed solids and discharges the melting exhaust gas and the slag.
摘要翻译：提供废弃处置系统和处置含石棉废物的方法（以下称为“ACW”）。废物处理系统包括热解炉，其被配置为热解进入的城市固体废物并排出热解气体和热解固体; 熔化炉，其被配置为熔化热解的固体并排出熔化的废气和炉渣; 以及石棉预处理装置，其构造成粉碎进入的ACW，将添加剂混合到ACW中，对压碎的ACW造粒，并在低于大气压的压力下排出造粒的ACW，其中熔化炉与热解的固体一起熔化造粒的ACW，熔化废气和炉渣。

6. 发明申请

WO2009044960A1 GAP-FILLING COMPOSITION WITH EXCELLENT SHELF LIFE BY END-CAPPING 审中-公开
标题翻译： GAP填充组合物通过末端封装具有优异的寿命
公开(公告)号：WO2009044960A1
公开(公告)日：2009-04-09
申请号：PCT/KR2007/007063
申请日：2007-12-31
申请人： CHEIL INDUSTRIES INC. , WOO, Chang Soo , KIM, Hee Jae , LEE, Sung Jae , YUN, Sang Geun , KIM, Tae Ho
发明人： WOO, Chang Soo , KIM, Hee Jae , LEE, Sung Jae , YUN, Sang Geun , KIM, Tae Ho
IPC分类号： C08L83/00
CPC分类号： C08L83/04 , C08G77/045 , C08G77/12 , C08G77/70
摘要： A composition with improved shelf life for filling small gaps in a semiconductor device is provided. The composition comprises an end-capped silicone polymer. The molecular weight of the end-capped silicone polymer is not varied during storage. In addition, the dissolution rate (DR) of the composition in an alkaline developing solution is maintained at a desired level during storage. That is, the composition is highly stable during storage. Therefore, the composition is suitable for use in a node separation process for the fabrication of a semi-conductor capacitor.
摘要翻译：提供了一种用于填充半导体器件中的小间隙的具有改进的保质期的组合物。组合物包含封端的硅氧烷聚合物。封端硅氧烷聚合物的分子量在储存期间不变化。此外，组合物在碱性显影液中的溶解速率（DR）在储存期间保持在期望的水平。也就是说，组合物在储存期间高度稳定。因此，该组合物适用于制造半导体电容器的节点分离过程。

7. 发明申请

WO2005069510A1 AAA SERVER STRUCTURE WITH THREADS 审中-公开
标题翻译：服务器结构与螺纹
公开(公告)号：WO2005069510A1
公开(公告)日：2005-07-28
申请号：PCT/KR2005/000142
申请日：2005-01-14
申请人： UTStarcom Korea Limited , LEE, Sung Jae
发明人： LEE, Sung Jae
IPC分类号： H04B7/155
CPC分类号： H04L63/08 , G06F9/526 , H04L63/0892 , H04L67/1002
摘要： The present invention generally relates to an Authentication, Authorization, and Accounting (AAA) server structure, and more particularly to an AAA server structure that utilizes threads. The AAA server of the present invention comprises: a Subscriber (SUBS) creation thread which, upon receiving a data call connection request message from an intelligent network server via the PSDN, constitutes a data call connection response message with information stored in the temporary database and then transmits the data call connection response message to the PDSN and simultaneously removes the information of the temporary database by locking and unlocking a Mutual exclusion object (Mutex); and a SUBS main thread, which determines through the SUBS creation thread whether the request message is for a subscriber of the intelligent network, and if it is for the subscriber of the intelligent network, locks the Mutex to synchronize a source to the temporary database that has doubly linked list structure using an array, and then transmits a message requesting an information on the subscriber of the intelligent network after storing the information for constituting the data call connection response message and unlocking the Mutex. In order to establish a data call for a subscriber of the intelligent network in a CDMA I X system, the AAA sever is responsible for cooperating with a Service Control Point (SCP) server and a Packet Data Serving Node (PDSN). The AAA server of the present invention utilizes threads to constitute a dual process structure, which may increase the processing speed and throughput by dividing the data call-establishing process, which is conventionally one process, into two processes.
摘要翻译：本发明一般涉及认证，授权和计费（AAA）服务器结构，更具体地涉及利用线程的AAA服务器结构。本发明的AAA服务器包括：订户（SUBS）创建线程，经由PSDN从智能网络服务器接收到数据呼叫连接请求消息，构成具有存储在临时数据库中的信息的数据呼叫连接响应消息，以及然后将数据呼叫连接响应消息发送到PDSN，并通过锁定和解锁互斥对象（Mutex）同时删除临时数据库的信息; 以及SUBS主线程，其通过SUBS创建线程确定请求消息是针对智能网络的订户，以及如果是针对智能网络的订户，则锁定Mutex以将源同步到临时数据库，使用阵列具有双重链表，然后在存储用于构成数据呼叫连接响应消息的信息并解锁该互斥体之后，发送请求智能网的用户信息的消息。为了在CDMA I X系统中为智能网的用户建立数据呼叫，AAA服务器负责与服务控制点（SCP）服务器和分组数据服务节点（PDSN）的协作。本发明的AAA服务器利用线程构成双进程结构，通过将传统上一个进程的数据呼叫建立进程划分为两个进程，可以提高处理速度和吞吐量。

8. 发明申请

WO2010027128A1 COMPOUND FOR FILLING SMALL GAPS IN SEMICONDUCTOR DEVICE, COMPOSITION COMPRISING THE COMPOUND AND PROCESS FOR FABRICATING SEMICONDUCTOR CAPACITOR 审中-公开
标题翻译：用于在半导体器件中填充小GAPS的化合物，包含该化合物的组合物和用于制造半导体电容器的方法
公开(公告)号：WO2010027128A1
公开(公告)日：2010-03-11
申请号：PCT/KR2008/007839
申请日：2008-12-31
申请人： CHEIL INDUSTRIES INC. , LEE, Sung Jae , KIM, Hee Jae , KIM, Tae Ho , YUN, Sang Geun , WOO, Chang Soo
发明人： LEE, Sung Jae , KIM, Hee Jae , KIM, Tae Ho , YUN, Sang Geun , WOO, Chang Soo
IPC分类号： C08G77/04
CPC分类号： C08G77/04 , Y10T428/31663
摘要： Provided is a compound suitable for use in a node separation process for the fabrication of a semiconductor capacitor. The molecular weight of the polymer remains substantially unchanged during storage. In addition, the polymer is dissolved at a desired rate in an alkaline developing solution and is highly stable without any significant change in dissolution rate (DR) during storage. Also provided is a composition comprising the compound. The composition is highly stable during storage. Therefore, the composition is suitable for filling small gaps in a semiconductor device.
摘要翻译：提供一种适用于制造半导体电容器的节点分离工艺中的化合物。储存期间聚合物的分子量保持基本不变。此外，聚合物以碱性显影液中所需的速率溶解，并且高度稳定，而在储存期间溶解速率（DR）没有明显变化。还提供了包含该化合物的组合物。该组合物在储存期间高度稳定。因此，该组合物适于填充半导体器件中的小间隙。

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