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    • 4. 发明申请
    • IRRADIATION TREATMENT OF GLASS
    • 玻璃的辐照处理
    • WO2010138793A3
    • 2011-03-03
    • PCT/US2010036529
    • 2010-05-28
    • KICZENSKI TIMOTHY JCORNING INC
    • KICZENSKI TIMOTHY J
    • C03B20/00C03B23/02
    • C03C23/0005C03B25/08
    • Processes for making glass include the step of providing a glass substrate including a structure with a fast relaxing species and a slow relaxing species. The glass substrate is provided at a bulk temperature (Tb) lower than a strain point (Tc) of the glass substrate. The process further includes the step of exposing the glass substrate to an irradiation capable of exciting part of the glass structure without increasing the bulk temperature (Tb) to above the strain point (Tc). The glass substrate is exposed to the irradiation in a manner that allows relaxation of the fast relaxing species without significant relaxation of the slow relaxing species.
    • 制造玻璃的方法包括提供包括具有快速松弛物质和缓慢松弛物质的结构的玻璃基底的步骤。 玻璃基板设置在比玻璃基板的应变点(Tc)低的体积温度(Tb)。 该方法还包括将玻璃基板暴露于能够激发玻璃结构部分的照射而不将体温(Tb)增加到应变点(Tc)以上的步骤。 玻璃基板以允许松弛快速松弛物质的方式暴露于辐照,而没有缓慢松弛物质的显着松弛。