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1. 发明申请

WO2007147782A2 OXIME SULFONATES AND THE USE THEROF AS LATENT ACIDS 审中-公开
标题翻译： OXIME硫酸盐及其作为酸性物质的用途
公开(公告)号：WO2007147782A2
公开(公告)日：2007-12-27
申请号：PCT/EP2007/055936
申请日：2007-06-15
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , YAMATO, Hitoshi , ASAKURA, Toshikage , NISHIMAE, Yuichi , IWAI, Takeshi , IRIE, Makiko , NAKAYAMA, Kazuhiko
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , NISHIMAE, Yuichi , IWAI, Takeshi , IRIE, Makiko , NAKAYAMA, Kazuhiko
IPC分类号： G03F7/039 , G03F7/027 , C07C309/00 , G03C1/73
CPC分类号： G03F7/0045 , C07C309/00 , C07C2603/18 , C08F20/36 , G03F7/0046 , G03F7/0397
摘要： Compounds of the formula (I), (Il) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R' 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optinally substituted by a group of formula (IV); Ar' 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar 1 ' comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.
摘要翻译：式（I），（II）或（III）的化合物，其中R 1是例如C 1 -C 18烷基磺酰基， C 1 -C 10卤代烷基磺酰基，樟脑磺酰基，苯基-C 1 -C 3烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽基磺酰基，菲基磺酰基或杂芳基磺酰基，R 1'是例如亚苯基二磺酰基，R 2是例如CN，C 1 -C 10 （IV）取代的卤代烷基或C 1 -C 10 - 卤代烷基; Ar 1是例如被式（IV）基团取代的苯基; Ar'1是例如任选被式（IV）的基团取代的亚苯基; 彼此独立的A 1，A 2，A 3和A 3是例如氢，卤素，CN或C 1〜 SUB> -C _{18 烷基; D 2是例如直接键合O，（CO）O，（CO）S，SO 2，OSO 2或C < SUB> 1 -C _{18 亚烷基; 或A 3和D 2一起形成C 3〜C 30环烯基; 或者它们所连接的烯属不饱和双键的碳一起形成C 3 -C 3亚烷基， 30 环烷基; D 3和D 4，例如彼此独立地是直接键，O，S，C 1 -C 18， / SUB>亚烷基或C 3 -C 30亚环烷基，条件是基团R 2，Ar 1中的至少一个，或者是式（Ⅳ）所示的基团。适合作为光潜酸供体，并用于制备用于化学放大光致抗蚀剂的相应聚合物。}}

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