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    • 1. 发明申请
    • METHOD FOR PRODUCING A SOLAR CELL WITH A SELECTIVE EMITTER
    • 一种用于生产太阳能电池具有选择性发射极
    • WO2012022349A3
    • 2013-07-18
    • PCT/DE2011075181
    • 2011-08-02
    • CENTROTHERM PHOTOVOLTAICS AGOLKOWSKA-OETZEL JOLANTAISENBERG JOERGTEPPE ANDREASGEIGER MATTHIAS
    • OLKOWSKA-OETZEL JOLANTAISENBERG JOERGTEPPE ANDREASGEIGER MATTHIAS
    • H01L31/18
    • H01L31/068H01L31/1804Y02E10/547Y02P70/521
    • Method for producing a solar cell with a selective emitter comprising the steps of forming (10, 12, 14) a dopant-containing glass layer (55) on at least one part of a surface of a solar cell substrate (50), forming (16) a weakly doped emitter (58) in regions of the solar cell substrate (50) that are covered by the glass layer (55) by indiffusing (16) dopant from the glass layer (55) into the solar cell substrate (50), locally indiffusing (18) additional dopant from the glass layer (55) into the solar cell substrate (50) by locally heating (18) regions of the solar cell substrate (50) that are located below the glass layer (55) for the purpose of locally forming (18) heavily doped emitter regions (60), wherein, as dopant-containing glass layer (55), such a glass layer (55) is formed (10, 12, 14) on the at least one part of the surface of the solar cell substrate (50), which glass layer has a lower dopant concentration in a first partial layer (52) of the glass layer (55), said first partial layer being located nearer the surface of the solar cell substrate (50), than in a second partial layer (54) of the glass layer (55), said second partial layer being located further away from the surface of the solar cell substrate (50).
    • 一种用于轻掺杂发射极的制造太阳能电池与包含形成在太阳能电池基板(50)的表面的至少一部分上含有掺杂剂玻璃层(55)中的步骤(10,12,14)的选择性发射极,形成(16)处理( (58)覆盖在(玻璃层55)的太阳能电池基板50)(的区域由从玻璃层(55)(在该太阳能电池基板50的掺杂剂)的内部,局部扩散(18)附加的从玻璃层的掺杂剂的向内扩散16)(55 ()(在太阳能电池基板50)代入(通过局部加热18)位于(在玻璃层下方55),用于本地培训18的目的在太阳能电池基板(50)的)的区域)重掺杂发射极区域(60,其中含有作为掺杂剂玻璃层( 55)这样的玻璃层(55形成)在所述至少(太阳能电池基板50)(10,12的表面的一部分,14)是一个 ř接近位于(50)的太阳能电池基板的玻璃层(55)具有从所述玻璃层(55)的所述太阳能电池基板(50)远离位于第二局部层(54)的表面的杂质浓度比在一个进一步的第一部分层(52)的表面上。