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    • 1. 发明申请
    • POLARIZATION-OPTIMIZING ILLUMINATION SYSTEM
    • 极化优化照明系统
    • WO2005050325A1
    • 2005-06-02
    • PCT/EP2004/012398
    • 2004-11-03
    • CARL ZEISS SMT AGKOEHLER, JessFIOLKA, Damian
    • KOEHLER, JessFIOLKA, Damian
    • G03F7/20
    • G03F7/70066G03F7/70566
    • An illumination system for a projection exposure installation for microlithography, in particular for a wafer scanner, for illuminating an illumination field on an outlet plane (53) of the illumination system with the light from a light source (2) has, within an imaging system (15) which images an intermediate field plane (13) on the outlet plane (53), a polarization conversion device (22) having a large number of polarization rectifier elements for producing a defined polarization state of the light emerging from the illumination system. The use of the polarization conversion device (22) allows the polarization state of the illumination light to be matched to the polarization state which is required in the downstream projection objective (51) without a significant proportion of the light injected from the light source into the illumination system being lost during the production of this polarization state.
    • 用于微光学的投影曝光装置的照明系统,特别是用于晶片扫描器的照明系统,用于利用来自光源(2)的光照射照明系统的出口平面(53)上的照明场,在照相系统 (15),其在出射平面(53)上成像中间场平面(13);偏振转换装置(22),其具有大量的偏振整流元件,用于产生从照明系统出射的光的限定的偏振状态。 偏振转换装置(22)的使用允许照明光的偏振状态与下游投影物镜(51)中所需的偏振状态相匹配,而从光源注入的光的大部分不会 照明系统在该极化状态的产生期间丢失。