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    • 4. 发明申请
    • DESIGN TOOL FOR THE TYPE AND FORM OF A CIRCUIT PRODUCTION
    • 艺术设计工具,并形成电路识别
    • WO2008135596A2
    • 2008-11-13
    • PCT/EP2008055658
    • 2008-05-07
    • FRAUNHOFER GES FORSCHUNGUNIV BERLIN TECHSCHROEDER MICHAELKUEFER KARL-HEINZPOLITYKO DMITRY-DAVID
    • SCHROEDER MICHAELKUEFER KARL-HEINZPOLITYKO DMITRY-DAVID
    • G06F17/5045
    • The invention relates to a method for influencing a selection for the "type and form of a circuit production" in at least one layer (L1, L2) for a given integration task for an integrated circuit or multiples thereof in a wafer composite, an assembly on a planar substrate or a compact assembly. A number of electrical or electronic components are thus arranged in three dimensions and are to be electrically connected together. A number of ready solutions (5; 5a, 5b) are retained in a databank (10) and each of the ready solutions has a group of properties, each group having at least the following properties for the given integration task: an integration technique, a housing or assembly size, a number of layers (physical planes) for conductor tracks or lines in a vertical direction and a line or conductor track length. The ready solutions (5) stored in the databank (10) for the given integration task define a target space (40), from which a solution (5b) may be selected using operating elements (21, 22) which fixes the type and form of the circuit production resulting from the given integration task and the number of electrical and electronic components in one of many integration techniques. The design time can thus be reduced.
    • 本发明涉及一种方法,用于在晶片复合体在给定的集成任务füreinen集成电路选择用于在至少一个层(L1,L2)“的电路实现的种类和形状”的影响或其中许多在一起,一个平面的支撑衬底上的组件 或紧凑的组件。 在这种情况下,多个电气或电子组件中的空间布置和导电连接到彼此。 为了这个目的,在一个数据库(10)是多个现成的解决办法的(5; 5A,5B)保持存储,并且每个最终解决方案的包括一组属性,其中,每个组包括至少对于给定的集成任务以下性质:甲技术为一体, 外壳或框架的尺寸,用于印刷电路的轨道或Leitungenin一个Vertikalrichtungund一个线状或带状导体的长度的多个层(物理层)。 存储在数据库(10)最终给定集成任务的解决方案(5)中的数据限定目标区域(40),从该经由操作元件(21,22)的(5B)是可选择的电路实现作为结果的溶液的性质和形式 鉴于整合任务集,以及多个电气和电子部件在总结了许多集成技术。 设计时间可以缩短这样的。
    • 9. 发明申请
    • INTERFEROMETRIC ENCODER SYSTEMS
    • INTERFEROMETRIC编码器系统
    • WO2011126610A3
    • 2012-01-05
    • PCT/US2011025039
    • 2011-02-16
    • ZYGO CORPDECK LESLIE LDE GROOT PETER JSCHROEDER MICHAEL
    • DECK LESLIE LDE GROOT PETER JSCHROEDER MICHAEL
    • G01D5/38G01D5/26G02B6/00H01L21/027
    • G01D5/266G01D5/38
    • A method for determining information about changes along a degree of freedom of an encoder scale includes directing a first beam and a second beam along different paths and combining the first and second beams to form an output beam, where the first and second beams are derived from a common source, the first and second beams have different frequencies, where the first beam contacts the encoder scale at a non-Littrow angle and the first beam diffracts from the encoder scale at least once; detecting an interference signal based on the output beam, the interference signal including a heterodyne phase related to an optical path difference between the first beam and the second beam; and determining information about a degree of freedom of the encoder scale based on the heterodyne phase.
    • 用于确定关于沿着编码器刻度的自由度的变化的信息的方法包括沿不同的路径引导第一波束和第二波束,并组合第一和第二波束以形成输出波束,其中第一和第二波束从 公共源,第一和第二光束具有不同的频率,其中第一光束以非Littrow角接触编码器刻度,并且第一光束从编码器刻度至少一次衍射; 基于所述输出光束检测干扰信号,所述干扰信号包括与所述第一光束和所述第二光束之间的光程差有关的外差相位; 以及基于所述外差相位确定关于所述编码器刻度的自由度的信息。