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    • 2. 发明申请
    • AQUEOUS POLYMER COMPOSITIONS
    • 水性聚合物组合物
    • WO2005023947A1
    • 2005-03-17
    • PCT/GB2004/003229
    • 2004-07-26
    • AVECIA BVAVECIA LIMITEDSATGURUNATHAN, RajasinghamMARTIN, EmilioOVERBEEK, Gerardus, CornelisROELANDS, Marc
    • SATGURUNATHAN, RajasinghamMARTIN, EmilioOVERBEEK, Gerardus, CornelisROELANDS, Marc
    • C09D175/04
    • C08G18/12C08G18/6692C09D175/04C08G18/3231C08L2666/20C08L2666/04
    • An aqueous coating composition comprising: (i) (10) to (80) wt% of a polyurethane A which exhibits a minimum film forming temperature of ≤ ambient temperature and which comprises a polyurethane obtained by the reaction of: (a) an isocyanate-terminated pre-polymer formed from components which comprise: (1) 10 to 30 wt% of a polyisocyanate; (2) 0.1 to 10 wt% of a polyol of weight average molecular weight less than 500, containing ionic or potentially ionic water-dispersing groups, and having two or more isocyanate-reactive groups; (3) 0 to 15 wt% of a polyol containing non-ionic water dispersing groups having two or more isocyanate-reactive groups; (4) 40 to 80 wt% of a polyol other than (2) or (3), having two or more isocyanate-reactive groups; where (1), (2), (3) and (4) add up to 100 %; and (b) an active-hydrogen chain extending compound; and (ii) 20 to 90 wt% of a polymer dispersion B which exhibits a minimum film forming temperature of above ambient temperature; wherein (i) and (ii) add up to 100 %. Processes for manufacture of said composition and methods of application to substrates are also described.
    • 一种水性涂料组合物,其包含:(i)(10) - (80)wt%的聚氨酯A,其表现出最小成膜温度<=环境温度,并且其包含通过以下反应获得的聚氨酯:(a)异氰酸酯 由包含以下组分的组分形成的终止预聚物:(1)10至30重量%的多异氰酸酯; (2)0.1〜10重量%的重均分子量小于500的多元醇,其含有离子或潜在离子性水分散基团,并且具有两个或多个异氰酸酯反应性基团; (3)含有2个以上异氰酸酯反应性基团的非离子性水分散基团的多元醇0〜15重量% (4)40〜80重量%的具有2个以上异氰酸酯反应性基团的(2)或(3)以外的多元醇; 其中(1),(2),(3)和(4)加起来为100%; 和(b)活性氢链增长化合物; 和(ii)20〜90重量%的表现出最高成膜温度高于环境温度的聚合物分散体B; 其中(i)和(ii)加起来为100%。 还描述了用于制造所述组合物的方法和施加于基材的方法。
    • 4. 发明申请
    • POLYMERIC COMPOSITION
    • 聚合物组合物
    • WO2011073404A1
    • 2011-06-23
    • PCT/EP2010/070107
    • 2010-12-17
    • DSM IP Assets B.V.SATGURUNATHAN, RajasinghamMARTIN, EmilioGEEL, VAN, Adrianus Antonius JohannesSUYKERBUYK, Franciscus Adrianus JohannesSENATORE, DanielaBÜCKMANN, Alfred Jean Paul
    • SATGURUNATHAN, RajasinghamMARTIN, EmilioGEEL, VAN, Adrianus Antonius JohannesSUYKERBUYK, Franciscus Adrianus JohannesSENATORE, DanielaBÜCKMANN, Alfred Jean Paul
    • C09D11/10
    • C09D11/107B05D3/06C09D11/101
    • There is described a substantially solid, solvent free, radiation curable composition comprising a) optionally from 0.1 % to 99.9% by weight of a colorant; and b) from 0.1 % to 99.9% of radiation curable polymer obtained and/or obtainable from at least one mono-(terminal functional forming) monomer of formula I: R 1 (R 2 )C=CR 3 (C=O)(X 1 ) n R 4 Formula 1, where n is 0 or 1, X 1 is oxy or -NR 5 - (where R 5 represents H or optionally substituted organo), R 1 independently represents optionally substituted C 1-10 hydrocarbo, hydroxyl, optionally substituted C 2-10 hydrocarbo-oxy comprising a ring moiety, and/or carboxy; and R 2 , R 3 and R 4 each independently represent H, an optional substituent and/or optionally substituted organo groups and where n is 0, R 3 may also represent oxy or -NR 5 -; and c) optionally from 0.1 % to 90% of a radiation curable high molecular weight reactive diluent; and d) optionally from 0.01 to 10% of at least one photo-initiator; and where the radiation curable polymer (b) is i) obtained and/or obtainable in a suspension polymerisation process using a cobalt catalyst as a chain transfer agent; ii) is solid under standard conditions; and iii) is mono-(terminal functional) comprising one terminally located activated unsaturated moiety (such as of Formula 1 herein). where the composition has at least one of the properties (A) to (F): A) is substantially free of volatile organic compounds (VOCs); B) has a residual concentration of initiator (such as peroxide) of less than 0.025 g per g of polymer; C) comprises a polymer having a total ethylenic unsaturation (for example from moiet(ies) of Formula 1, such as C=C and/or (meth)acrylate) greater than 0.1 milli-equivalents C=C per g polymer; D) is substantially-free of sulphur comprising species; E) is substantially free of cobalt (II) species; and/or F) has a weight average molecular weight (M w ) of less then 25kDa.
    • 描述了基本上固体的,无溶剂的可辐射固化组合物,其包含a)任选地0.1至99.9重量%的着色剂; 和b)从式I的至少一种(末端功能形成)单体获得和/或可获得的可辐射固化聚合物的0.1%至99.9%:R1(R2)C = CR3(C = O)(X1)nR4 式1其中n为0或1,X 1为氧或-NR 5 - (其中R 5表示H或任选取代的有机基),R 1独立地表示任选取代的C 1-10烃基,羟基,任选取代的C 2-10氢氧代 - ,和/或羧基; 并且R 2,R 3和R 4各自独立地表示H,任选的取代基和/或任选取代的有机基团,并且其中n是0,R 3也可以表示氧基或-NR 5 - ; 和c)任选地0.1%至90%的可辐射固化高分子量反应性稀释剂; 和d)任选的0.01至10%的至少一种光引发剂; 并且其中可辐射固化聚合物(b)是i)在使用钴催化剂作为链转移剂的悬浮聚合方法中获得和/或获得的; ii)在标准条件下是固体; 和iii)是包含一个末端定位的活化不饱和部分(例如本文的式1)的单 - (末端官能团)。 其中组合物具有性质(A)至(F)中的至少一种:A)基本上不含挥发性有机化合物(VOC); B)具有小于0.025g / g聚合物的引发剂(例如过氧化物)的残留浓度; C)包含大于0.1毫当量C = C / g聚合物的总烯属不饱和度(例如从式1的不饱和度,例如C = C和/或(甲基)丙烯酸酯))的聚合物; D)基本上不含含硫物质; E)基本上不含钴(II)物质; 和/或F)的重均分子量(Mw)小于25kDa。