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1. 发明申请

WO2011128120A1 METHOD FOR PROVIDING AN ORDERED LAYER OF SELF-ASSEMBLABLE POLYMER FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：用于提供自组装聚合物的订购层的方法用于LITHOGRAPHY
公开(公告)号：WO2011128120A1
公开(公告)日：2011-10-20
申请号：PCT/EP2011/050668
申请日：2011-01-19
申请人： ASML NETHERLANDS B.V. , PEETERS, Emiel , WUISTER, Sander , KOOLE, Roelof
发明人： PEETERS, Emiel , WUISTER, Sander , KOOLE, Roelof
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for providing an ordered polymer layer at a surface of a substrate includes depositing a self-assemblable polymer layer directly onto a primer layer on a substrate to provide an interface between the self-assemblable polymer layer and the primer layer, and treating the self-assemblable polymer layer to provide self-assembly into an ordered polymer layer, such as a block copolymer, having first and second domain types at the interface. The primer layer is adapted to improve its chemical affinity to each domain type at the interface, in response to the presence of the respective domain type in the self-assembled polymer at the interface during the self-assembly of the self-assemblable polymer layer into the ordered polymer layer. This may lead to reduction in defect levels and/or improved persistence length for the ordered polymer layer. The method may be useful for forming resist layers for use in device lithography.
摘要翻译：在衬底的表面提供有序聚合物层的方法包括将可自组装的聚合物层直接沉积在基底上的底漆层上，以提供可自组装的聚合物层和底漆层之间的界面，以及处理自身可以将聚合物层自组装成有序聚合物层，例如在界面处具有第一和第二域类型的嵌段共聚物。响应于在自组装聚合物层的自组装期间在界面处的自组装聚合物中存在相应的畴型，引物层适于改善其在界面处对每种畴型的化学亲和力有序聚合物层。这可能导致有序聚合物层的缺陷水平和/或改善的持续长度的降低。该方法可用于形成用于器件光刻的抗蚀剂层。

2. 发明申请

WO2012031818A3 LITHOGRAPHY USING SELF-ASSEMBLED POLYMERS 审中-公开
公开(公告)号：WO2012031818A3
公开(公告)日：2012-03-15
申请号：PCT/EP2011/062554
申请日：2011-07-21
申请人： ASML NETHERLANDS B.V. , KOOLE, Roelof , DIJKSMAN, Johan , WUISTER, Sander , PEETERS, Emiel
发明人： KOOLE, Roelof , DIJKSMAN, Johan , WUISTER, Sander , PEETERS, Emiel
IPC分类号： B81C1/00 , H01L21/027
摘要： A method of lithography on a substrate uses a self-assembled polymer (SAP) layer deposited on the substrate, with first and second domains arranged in a pattern across the layer. A planarization layer is formed over the SAP and a development etch applied to substantially remove a portion of the planarization layer over the second domain leaving a cap of the planarization layer substantially covering the first domain. The uncapped second domain is then removed from the surface by a breakthrough etch leaving the capped first domain as a pattern feature on the surface. A transfer etch may then be used to transfer the pattern feature to the substrate using the capped first domain. The capping allows the second domain to be removed, e.g., without excessive loss of lateral feature width for the remaining first domain, even when the difference in etch resistance between the first and second domains is small.

3. 发明申请

WO2011151109A1 SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：自组装聚合物和方法用于光刻
公开(公告)号：WO2011151109A1
公开(公告)日：2011-12-08
申请号：PCT/EP2011/056308
申请日：2011-04-20
申请人： ASML Netherlands B.V. , PEETERS, Emiel , WUISTER, Sander , KOOLE, Roelof
发明人： PEETERS, Emiel , WUISTER, Sander , KOOLE, Roelof
IPC分类号： C08F293/00 , G03F7/00 , B81C1/00 , B82Y10/00 , B82Y30/00
CPC分类号： C08F293/00 , B05D5/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C08F297/04 , G03F7/0002 , G03F7/004 , G03F7/165 , G03F7/26
摘要： A self-assemblable polymer is disclosed, having first and second molecular configurations with the first molecular configuration has a higher Flory Huggins parameter for the self-assemblable polymer than the second molecular configuration, and the self-assemblable polymer is configurable from the first molecular configuration to the second molecular configuration, from the second molecular configuration to the first molecular configuration, or both, by the application of a stimulus. The polymer is of use in a method for providing an ordered, periodically patterned layer of the polymer on a substrate, by ordering and annealing the polymer in its second molecular configuration and setting the polymer when it is in the first molecular configuration. The second molecular configuration provides better ordering kinetics and permits annealing of defects near its order/disorder transition temperature, while the first molecular configuration, with a higher order/disorder transition temperature, provides low line edge/width roughness for the pattern formed on setting.
摘要翻译：公开了具有第一和第二分子构型的自组装聚合物，其具有第一分子构型，其具有比第二分子构型更高的可自组装聚合物的Flory Huggins参数，并且可自组装聚合物可从第一分子构型到第二分子构型，从第二分子构型到第一分子构型，或两者都通过施加刺激。聚合物可用于通过在其第二分子构型中排列和退火聚合物并在聚合物处于第一分子构型时设置聚合物，从而在基底上提供聚合物的有序周期性图案化层的方法。第二种分子结构提供更好的排序动力学，并允许在其顺序/无序转变温度附近的缺陷退火，而具有较高阶/无序转变温度的第一分子构型为设置上形成的图案提供了低的线边缘/宽度粗糙度。

4. 发明申请

WO2012175343A1 SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：自组装聚合物及其在LITHOGRAPHY中的使用方法
公开(公告)号：WO2012175343A1
公开(公告)日：2012-12-27
申请号：PCT/EP2012/060784
申请日：2012-06-07
申请人： ASML NETHERLANDS B.V. , BRIZARD, Aurelie , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel
发明人： BRIZARD, Aurelie , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel
IPC分类号： G03F7/00 , C08G83/00
CPC分类号： G03F7/004 , B82Y10/00 , B82Y40/00 , C30B19/00 , G03F7/0002
摘要： A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.
摘要翻译：适于自组装以在基底上形成有序图案的嵌段共聚物具有第一和第二嵌段，其末端部分共价键合到第一嵌段的末端。末端部分的分子量为嵌段共聚物的分子量的20％以下，末端部分对第一嵌段具有低的化学亲和力。末端部分可以帮助有序阵列的域的精确位置放置并且导致改进的临界尺寸均匀性和/或减少的线边缘粗糙度。所述聚合物可以与骨架外延模板组合使用，其中末端部分被选择为与模板的侧壁缔合。这可以减少侧壁处的聚合物域的不希望的聚集和/或有助于域放置精度。

5. 发明申请

WO2012084558A1 METHODS FOR PROVIDING PATTERNED ORIENTATION TEMPLATES FOR SELF-ASSEMBLABLE POLYMERS FOR USE IN DEVICE LITHOGRAPHY 审中-公开
标题翻译：提供用于自组装聚合物的图案方向模板的方法用于器件平台的使用
公开(公告)号：WO2012084558A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072379
申请日：2011-12-09
申请人： ASML NETHERLANDS B.V. , PEETERS, Emiel , KETELAARS, Wilhelmus , DIJKSMAN, Johan , WUISTER, Sander , KOOLE, Roelof , VAN HEESCH, Chris
发明人： PEETERS, Emiel , KETELAARS, Wilhelmus , DIJKSMAN, Johan , WUISTER, Sander , KOOLE, Roelof , VAN HEESCH, Chris
IPC分类号： G03F7/00
CPC分类号： C30B19/12 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.
摘要翻译：公开了一种方法，其涉及在衬底上形成化学外延或者石墨电极特征之后，但在自组装聚合物的沉积和取向之前，将中性取向模板层沉积到衬底上。取向层被布置成与基底结合，但不具有某些特征，使得其可以容易地通过真空或用有机溶剂漂洗除去。中性取向层具有与自组装聚合物中的嵌段相符的化学亲和力，使得不同类型的块润湿中性取向层，使得自组装聚合物中的畴可以沿着衬底表面并排，界面垂直于衬底表面。所得到的对准和取向的自组装聚合物本身可以用作衬底的器件光刻的抗蚀剂。

6. 发明申请

WO2012175342A2 SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：自组装聚合物和方法用于光刻
公开(公告)号：WO2012175342A2
公开(公告)日：2012-12-27
申请号：PCT/EP2012/060783
申请日：2012-06-07
申请人： ASML NETHERLANDS B.V. , BRIZARD, Aurelie , KETELAARS, Wilhelmus , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , BOOTS, Henri , NGUYEN, Thanh
发明人： BRIZARD, Aurelie , KETELAARS, Wilhelmus , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , BOOTS, Henri , NGUYEN, Thanh
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C08F299/02 , C08F299/04 , H01L51/0043
摘要： A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T0D, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature T g for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.
摘要翻译： BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于T0D的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

7. 发明申请

WO2012025316A1 IMPRINT LITHOGRAPHY METHOD AND IMPRINTABLE MEDIUM 审中-公开
标题翻译：印刷地图法和可变介质
公开(公告)号：WO2012025316A1
公开(公告)日：2012-03-01
申请号：PCT/EP2011/062553
申请日：2011-07-21
申请人： ASML NETHERLANDS B.V. , VAN DER MARK, Martinus , BANINE, Vadim , JEUNINK, Andre , DIJKSMAN, Johan , WUISTER, Sander , KLOOTWIJK, Johan , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , MAUCZOK, Ruediger , GIESBERS, Jacobus
发明人： VAN DER MARK, Martinus , BANINE, Vadim , JEUNINK, Andre , DIJKSMAN, Johan , WUISTER, Sander , KLOOTWIJK, Johan , KOOLE, Roelof , PEETERS, Emiel , VAN HEESCH, Chris , MAUCZOK, Ruediger , GIESBERS, Jacobus
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
摘要翻译：公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是随后用作图案化基板的抗蚀剂。还公开了适用于该方法的压印光刻的压印介质。

8. 发明申请

WO2011104045A1 METHOD AND APPARATUS FOR TREATMENT OF SELF-ASSEMBLABLE POLYMER LAYERS FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：用于处理自组装聚合物层的方法和装置，用于在LITHOGRAPHY中使用
公开(公告)号：WO2011104045A1
公开(公告)日：2011-09-01
申请号：PCT/EP2011/050126
申请日：2011-01-06
申请人： ASML NETHERLANDS B.V. , BANINE, Vadim , KOOLE, Roelof , WUISTER, Sander , PEETERS, Emiel
发明人： BANINE, Vadim , KOOLE, Roelof , WUISTER, Sander , PEETERS, Emiel
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.
摘要翻译：公开了在衬底表面处理包含可自组装聚合物的层。在一个实施方案中，处理包括布置温度变化区域以扫过层，其中该区域内的层的温度与该区域通过之前该层的初始温度不同。

9. 发明申请

WO2010007549A1 PROCESS FOR PROVIDING AN ASSEMBLY OF CELL MICROCARRIERS 审中-公开
标题翻译：提供细胞培养基组装的方法
公开(公告)号：WO2010007549A1
公开(公告)日：2010-01-21
申请号：PCT/IB2009/052757
申请日：2009-06-26
申请人： KONINKLIJKE PHILIPS ELECTRONICS N. V. , HALTER, David , PEETERS, Emiel , PENTERMAN, Roel , KURT, Ralph , BROER, Dirk, J.
发明人： HALTER, David , PEETERS, Emiel , PENTERMAN, Roel , KURT, Ralph , BROER, Dirk, J.
IPC分类号： C12N5/00
CPC分类号： C12N5/0062 , C12N2531/00
摘要： The present invention is related to a process for providing an assembly of cell microcarriers, comprising the steps of providing planar, two-dimensional objects having two sides (“flakes”), wherein these objects comprise a material which, upon application of an extrinsic stimulus, is transferred from the planar state into a rolled state, providing cells on one side of said flakes (“cell-bearing side”), transferring the flakes from the planar state into a rolled state (“cell wrap”) by application of said extrinsic stimulus, and coupling at least one type of binding agent to the flakes.
摘要翻译：本发明涉及一种用于提供细胞微载体组件的方法，包括以下步骤：提供具有两侧（“薄片”）的平面二维物体，其中这些物体包括在应用外在刺激时从平面状态转移到卷绕状态，在所述片状物（“细胞承载侧”）的一侧提供细胞，通过施加所述片状物将片状物从平面状态转移到卷状态（“细胞包裹”）外部刺激，并将至少一种类型的结合剂偶联到片状物上。

10. 发明申请

WO2009144615A1 MOISTURE CONTROL WITHIN A MULTI-ELECTRODE PATCH FOR MONITORING AND ELECTRICAL STIMULATION OF WOUND HEALING 审中-公开
标题翻译：用于监测和电刺激伤口愈合的多电极分配器中的水分控制
公开(公告)号：WO2009144615A1
公开(公告)日：2009-12-03
申请号：PCT/IB2009/052063
申请日：2009-05-18
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , BROER, Dirk, J. , PENTERMAN, Roel , PEETERS, Emiel , KURT, Ralph , HALTER, David , GILLIES, Murray, F. , DE KONING, Hendrik
发明人： BROER, Dirk, J. , PENTERMAN, Roel , PEETERS, Emiel , KURT, Ralph , HALTER, David , GILLIES, Murray, F. , DE KONING, Hendrik
IPC分类号： A61N1/20 , A61N1/32 , A61B5/053 , A61B5/103 , A61K9/00
CPC分类号： A61N1/205 , A61B5/053 , A61B5/445 , A61B2562/0209 , A61B2562/046 , A61F13/0213 , A61F13/0216 , A61F13/0226 , A61F2013/00442 , A61F2013/00523 , A61F2013/00536 , A61F2013/0054 , A61F2013/0094 , A61F2013/00944 , A61K9/0009 , A61N1/044 , A61N1/0468 , A61N1/325 , A61N1/326
摘要： The present invention provides a device for electrical treatment of a skin wound comprising a flexible substrate adapted for attaching to the skin wound and the surrounding skin, a matrix of electrodes, means for determining the presence of the wound and/or its perimeter and/or means for controlling a liquid load between the matrix (1) and the wound, and means for applying a voltage between the wound and the surrounding skin. The present invention further provides a method for electrical treatment of a skin wound comprising the following steps: placing a matrix of electrodes attached to a flexible substrate on top of the skin wound and the surrounding skin; determining the presence of the wound and/or its perimeter and/or controlling a liquid load between the matrix of electrodes and the wound; and applying a potential differential between particular electrodes, wherein the absorption or release of the liquid load is controlling to maintain optimum moisture content at and/or close to the wound.
摘要翻译：本发明提供了一种用于皮肤伤口的电处理的装置，包括适于附着到皮肤伤口和周围皮肤的柔性基底，电极基体，用于确定伤口和/或其周边的存在的装置和/或用于控制基质（1）和伤口之间的液体负载的装置，以及用于在伤口和周围皮肤之间施加电压的装置。本发明还提供了一种皮肤伤口的电处理方法，包括以下步骤：将附着在柔性基底上的电极基体放置在皮肤伤口和周围皮肤的顶部上; 确定伤口和/或其周边的存在和/或控制电极矩阵和伤口之间的液体负载; 以及在特定电极之间施加电位差，其中所述液体负载的吸收或释放被控制以保持伤口处和/或接近伤口处的最佳含水量。

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