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1. 发明申请

WO2016079051A2 MASK ASSEMBLY 审中-公开
标题翻译： MASK组装
公开(公告)号：WO2016079051A2
公开(公告)日：2016-05-26
申请号：PCT/EP2015/076687
申请日：2015-11-16
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： KRUIZINGA, Matthias , JANSEN, Maarten, Mathijs, Marinus , AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, H. , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC分类号： G03F1/62
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译：一种适用于光刻工艺的掩模组件，所述掩模组件包括图案形成装置; 以及防护薄膜组件框架，其被配置为支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件被配置为相对于所述图案形成装置悬挂所述防护薄膜框架，使得所述防护薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。

2. 发明申请

WO2005022082A1 HIGH-RRESOULUTION GAS GAUGE PROXIMITY SENSOR 审中-公开
标题翻译：高精度气体接近传感器
公开(公告)号：WO2005022082A1
公开(公告)日：2005-03-10
申请号：PCT/US2004/027447
申请日：2004-08-25
申请人： ASML HOLDING N.V. , LYONS, Joseph, H.
发明人： LYONS, Joseph, H.
IPC分类号： G01B13/00
CPC分类号： G01B13/12 , G01B13/00 , G01B13/16
摘要： An apparatus and method for precisely detecting very small distances between a measurement probe (128) and a surface (132), eg. a semiconductor substrate and more particularly to a proximity sensor using a constant gas flow and sensing a mass flow rate within a pneumatic bridge to detect very small distances. Within the apparatus the use of a flow restrictor (120, 122) and/or snubber (110) made of porous material and/or a mass flow rate controller (106) reduces turbulence and acoustic noise and thus enables detection of very small distances in the nanometer to sub-nanometer range. It is in particular proposed to use in the probe a nozzle having an elongated or stretched cross-section to achieve higher accuracy in topographic measurements. An application in photolithography is also foreseen.
摘要翻译：一种用于精确检测测量探针（128）和表面（132）之间的非常小距离的装置和方法，例如，更具体地涉及使用恒定气流并感测气动桥中的质量流量以检测非常小的距离的接近传感器。在该设备内，使用由多孔材料制成的限流器（120,122）和/或缓冲器（110）和/或质量流量控制器（106）可以减少湍流和声学噪声，从而能够检测非常小的距离纳米至亚纳米范围。特别提出在探头中使用具有细长或拉伸横截面的喷嘴，以在地形测量中实现更高的精度。还可以预见在光刻中的应用。

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