会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • MONOLITHIC 3D INTEGRATED CIRCUITS WITH INTER-TIER VIAS
    • 具有层间VIAS的单片3D集成电路
    • WO2017220968A1
    • 2017-12-28
    • PCT/GB2017/051682
    • 2017-06-09
    • ARM LTD
    • SINHA, Saurabh PijuskumarAITKEN, Robert CampbellCLINE, Brian TracyYERIC, Gregory MunsonCHANG, Kyungwook
    • H01L23/48H01L23/528H01L27/06
    • Various implementations described herein may be directed to using inter-tier vias (IVs) in integrated circuits (ICs). In one implementation, a three-dimensional (3D) IC may include a plurality of tiers disposed on a substrate layer, where the tiers may include a first tier having a first active device layer electrically coupled to first interconnect layers, and may also include a second tier having a second active device layer electrically coupled to a second interconnect layer, where the first interconnect layers include an uppermost layer that is least proximate to the first active device layer. The 3D IC may further include IVs to electrically couple the second interconnect layer and the uppermost layer. The uppermost layer may be electrically coupled to a power source at peripheral locations of the first tier, thereby electrically coupling the power source to the first active device layer and to the second active device layer.
    • 这里描述的各种实现可以涉及在集成电路(IC)中使用层间过孔(IV)。 在一个实现中,三维(3D)IC可以包括设置在衬底层上的多个层,其中层可以包括具有电耦合到第一互连层的第一有源器件层的第一层,并且还可以包括 第二层具有电耦合到第二互连层的第二有源器件层,其中第一互连层包括最接近第一有源器件层的最上层。 3D IC可以进一步包括电耦合第二互连层和最上层的IV。 最上层可以电耦合到第一层的外围位置处的电源,从而将电源电耦合到第一有源器件层和第二有源器件层。