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1. 发明申请

WO2011130017A2 MULTI-LAYER SIN FOR FUNCTIONAL AND OPTICAL GRADED ARC LAYERS ON CRYSTALLINE SOLAR CELLS 审中-公开
标题翻译：晶体太阳能电池上的功能和光学级分层的多层叠层
公开(公告)号：WO2011130017A2
公开(公告)日：2011-10-20
申请号：PCT/US2011/030782
申请日：2011-03-31
申请人： APPLIED MATERIALS, INC. , CHOI, Dongwon , STEWART, Michael, P. , XU, Li , MUNGEKAR, Hemant, P. , PAAK, Sunhom , MACWILLIAMS, Kenneth
发明人： CHOI, Dongwon , STEWART, Michael, P. , XU, Li , MUNGEKAR, Hemant, P. , PAAK, Sunhom , MACWILLIAMS, Kenneth
IPC分类号： H01L31/18 , H01L31/042
CPC分类号： H01L31/02168 , H01L31/068 , H01L31/1868 , Y02E10/547 , Y02P70/521
摘要： Embodiments of the invention include a solar cell and methods of forming a solar cell. Specifically, the methods may be used to form a passivation/anti-reflection layer having combined functional and optical gradient properties on a solar cell substrate. The methods may include flowing a first process gas mixture into a process volume within a processing chamber generating plasma in the processing chamber at a power density of greater than 0.65 W/cm 2 depositing a silicon nitride-containing interface sub-layer on a solar cell substrate in the process volume, flowing a second process gas mixture into the process volume, and depositing a silicon nitride-containing bulk sub-layer on the silicon nitride-containing interface sub-layer.
摘要翻译：本发明的实施例包括太阳能电池和形成太阳能电池的方法。具体地，可以使用这些方法来形成在太阳能电池基板上具有组合的功能和光学梯度特性的钝化/抗反射层。所述方法可以包括将第一工艺气体混合物流入处理室内的处理容积，该处理室在处理室中以大于0.65W / cm 2的功率密度产生等离子体，将含氮化硅的界面子层沉积在太阳能电池基板在处理体积中，使第二工艺气体混合物流入处理体积，以及在含氮化硅的界面子层上沉积含氮化硅的整体子层。

2. 发明申请

WO2010141814A2 PASSIVATION PROCESS FOR SOLAR CELL FABRICATION 审中-公开
标题翻译：太阳能电池制造的钝化过程
公开(公告)号：WO2010141814A2
公开(公告)日：2010-12-09
申请号：PCT/US2010/037395
申请日：2010-06-04
申请人： APPLIED MATERIALS, INC. , BORDEN, Peter , STEWART, Michael, P. , XU, Li , MUNGEKAR, Hemant, P. , OLSEN, Christopher, S.
发明人： BORDEN, Peter , STEWART, Michael, P. , XU, Li , MUNGEKAR, Hemant, P. , OLSEN, Christopher, S.
IPC分类号： H01L31/042
CPC分类号： H01L31/1868 , H01L31/022425 , H01L31/072 , Y02E10/50 , Y02P70/521
摘要： Embodiments of the invention contemplate the formation of a high efficiency solar cell using a novel plasma oxidation process to form a passivation film stack on a surface of a solar cell substrate. In one embodiment, the methods include providing a substrate having a first type of doping atom on a back surface of the substrate and a second type of doping atom on a front surface of the substrate, plasma oxidizing the back surface of the substrate to form an oxidation layer thereon, and forming a silicon nitride layer on the oxidation layer.
摘要翻译：本发明的实施例考虑使用新颖的等离子体氧化工艺形成高效太阳能电池，以在太阳能电池基板的表面上形成钝化膜堆叠。在一个实施方案中，所述方法包括提供在衬底的背面上具有第一类型的掺杂原子的衬底和在衬底的前表面上的第二类型的掺杂原子，等离子体氧化衬底的背表面以形成氧化层，并在氧化层上形成氮化硅层。

3. 发明申请

WO2010056800A2 A METHOD OF FORMING FRONT CONTACTS TO A SILICON SOLAR CELL WITHOUT PATTERNING 审中-公开
标题翻译：在没有绘图的情况下形成与太阳能电池的前联系的方法
公开(公告)号：WO2010056800A2
公开(公告)日：2010-05-20
申请号：PCT/US2009/064121
申请日：2009-11-12
申请人： APPLIED MATERIALS, INC. , BORDEN, Peter , DUKOVIC, John , XU, Li
发明人： BORDEN, Peter , DUKOVIC, John , XU, Li
IPC分类号： H01L31/042 , H01L31/05
CPC分类号： H01L31/02168 , C25D5/02 , C25D7/126 , H01L31/022425 , H01L31/0236 , Y02E10/50
摘要： A method for forming front contacts on a silicon solar cell which includes texture etching the front surface of the solar cell, forming an antireflective layer over the face, diffusing a doping material into the face to form a heavily doped region in valleys formed during the texture-etching of the face, depositing an electrically conductive material on the heavily doped regions in the valleys and annealing the solar cell.
摘要翻译：一种用于在硅太阳能电池上形成前触点的方法，其包括纹理蚀刻太阳能电池的前表面，在该表面上形成抗反射层，将掺杂材料扩散到面中，以在纹理中形成的谷中形成重掺杂区域刻蚀表面，在谷中的重掺杂区域上沉积导电材料并退火太阳能电池。

4. 发明申请

WO2010068635A2 FILLED POLYMER COMPOSITION FOR ETCH CHAMBER COMPONENT 审中-公开
标题翻译：用于蚀刻室组件的填充聚合物组合物
公开(公告)号：WO2010068635A2
公开(公告)日：2010-06-17
申请号：PCT/US2009/067218
申请日：2009-12-08
申请人： APPLIED MATERIALS, INC. , SUN, Jennifer, Y. , DUAN, Ren-guan , THACH, Senh , XU, Li
发明人： SUN, Jennifer, Y. , DUAN, Ren-guan , THACH, Senh , XU, Li
IPC分类号： C08K3/22 , C08K3/34 , C08L101/00 , C09J11/04 , B01J19/08
CPC分类号： C09K3/10 , Y10T428/2857
摘要： A filled polymer composition having improved plasma resistance is disclosed. The composition includes a particle filler dispersed in a polymer matrix. The particle filler can be Nb 2 O 5 , YF 3 , AlN, SiC or Si 3 N 4 and rare earth oxides. In an embodiment, the composition is utilized as a bonding adhesive for electrostatic chuck, bonding adhesive for shower head, bonding adhesive for liner, sealing material, O-ring, or plastic component.
摘要翻译：公开了具有改善的等离子体电阻的填充聚合物组合物。该组合物包括分散在聚合物基质中的颗粒填料。颗粒填料可以是Nb2O5，YF3，AlN，SiC或Si3N4和稀土氧化物。在一个实施方案中，组合物用作静电卡盘的粘合剂，用于喷头的粘合剂，衬垫的粘合剂，密封材料，O形环或塑料组分。

5. 发明申请

WO2009085117A2 EROSION RESISTANT YTTRIUM COMPRISING METAL WITH OXIDIZED COATING FOR PLASMA CHAMBER COMPONENTS 审中-公开
标题翻译：抗金属氧化钇包含金属氧化涂层用于等离子室组件
公开(公告)号：WO2009085117A2
公开(公告)日：2009-07-09
申请号：PCT/US2008/013589
申请日：2008-12-10
申请人： APPLIED MATERIALS, INC.
发明人： SUN, Jennifer, Y. , XU, Li , COLLINS, Kenneth S. , GRAVES, Thomas , GUAN, Ren-guan , THACH, Senh
IPC分类号： C23C14/16 , H01L21/30
CPC分类号： C23C16/4404 , H01J37/32467 , H01J37/32477
摘要： An article which is resistant to corrosion or erosion by chemically active plasmas and a method of making the article are described. The article is comprised of a metal or metal alloy substrate having on its surface a coating which is an oxide of the metal or metal alloy. The structure of the oxide coating is columnar in nature. The grain size of the crystals which make up the oxide is larger at the surface of the oxide coating than at the interface between the oxide coating and the metal or metal alloy substrate, and wherein the oxide coating is in compression at the interface between the oxide coating and the metal or metal alloy substrate. Typically the metal is selected from the group consisting of yttrium, neodymium, samarium, terbium, dysprosium, erbium, ytterbium, scandium, hafnium, niobium or combinations thereof.
摘要翻译：描述了耐化学活性等离子体腐蚀或侵蚀的制品和制造该制品的方法。该制品由其表面上具有金属或金属合金的氧化物涂层的金属或金属合金基材组成。氧化物涂层的结构本质上是柱状的。构成氧化物的晶体的晶粒尺寸在氧化物涂层的表面处比在氧化物涂层与金属或金属合金基底之间的界面处大，并且其中氧化物涂层在氧化物涂层和金属或金属合金基材。典型地，金属选自钇，钕，钐，铽，镝，铒，镱，钪，铪，铌或它们的组合。

6. 发明申请

WO2009017766A1 METHOD OF COATING SEMICONDUCTOR PROCESSING APPARATUS WITH PROTECTIVE YTTRIUM-CONTAINING COATINGS 审中-公开
标题翻译：涂层保护含镓涂层的半导体加工装置的方法
公开(公告)号：WO2009017766A1
公开(公告)日：2009-02-05
申请号：PCT/US2008/009221
申请日：2008-07-30
申请人： APPLIED MATERIALS, INC.
发明人： SUN, Jennifer, Y. , THACH, Senh , DEMPSTER, Jim , XU, Li , COLLINS, Kenneth, S. , DUAN, Ren-guan , GRAVES, Thomas , HE, Xiaoming , YUAN, Jie
IPC分类号： C23C16/44 , C23C28/00
CPC分类号： C23C28/042 , C23C4/11 , C23C4/18 , C23C16/4404
摘要： Methods of applying specialty ceramic materials to semiconductor processing apparatus, where the specialty ceramic materials are resistant to halogen-comprising plasmas. The specialty ceramic materials contain at least one yttrium oxide-comprising solid solution. Some embodiments of the specialty ceramic materials have been modified to provide a resistivity which reduces the possibility of arcing within a semiconductor processing chamber.
摘要翻译：将特种陶瓷材料应用于半导体加工设备的方法，其中特种陶瓷材料耐卤素等离子体。特种陶瓷材料含有至少一种含氧化钇的固溶体。已经修改了特种陶瓷材料的一些实施例以提供降低半导体处理室内的电弧的可能性的电阻率。

7. 发明申请

WO2009108275A9 CERAMIC COATING COMPRISING YTTRIUM WHICH IS RESISTANT TO A REDUCING PLASMA 审中-公开
公开(公告)号：WO2009108275A9
公开(公告)日：2009-09-03
申请号：PCT/US2009/000949
申请日：2009-02-13
申请人： APPLIED MATERIALS, INC.
发明人： SUN, Jennifer, Y. , HE, Xiaoming , COLLINS, Kenneth S. , GRAVES, Thomas , THACH, Senh , YUAN, Jie , XU, Li , DUAN, Ren-Guan
IPC分类号： C23C4/10 , C23C4/12
摘要： Particulate generation has been a problem in semiconductor device processing in highly corrosive plasma environments. The problem is exacerbated when the plasma is a reducing plasma. Empirically produced data has shown that the formation of a plasma spray coated yttrium-comprising ceramic such as yttrium oxide, Y 2 O 3 - ZrO 2 solid solution, YAG, and YF 3 provides a low porosity coating with smooth and compacted surfaces when such ceramics are spray coated from a powder feed having an average effective diameter ranging from about 22μm to about 0.1 μm. These spray- coated materials reduce the generation of particulates in corrosive reducing plasma environments.

8. 发明申请

WO2009094575A2 BURIED INSULATOR ISOLATION FOR SOLAR CELL CONTACTS 审中-公开
标题翻译：用于太阳能电池接触的绝缘绝缘体隔离
公开(公告)号：WO2009094575A2
公开(公告)日：2009-07-30
申请号：PCT/US2009/031882
申请日：2009-01-23
申请人： APPLIED MATERIALS, INC.
发明人： BORDEN, Peter , XU, Li
IPC分类号： H01L31/042 , H01L31/05
CPC分类号： H01L31/062 , H01L31/022425 , Y02E10/50
摘要： The present invention relates to methods and apparatuses for providing a buried insulator isolation for solar cell contacts. According to certain aspects, the invention places a buried oxide under the emitter of a polysilicon emitter solar cell. The oxide provides an excellent passivation layer over most of the surface. Holes in the oxide provide contact areas, increasing the current density to enhance efficiency. The oxide isolates the contacts from the substrate, achieving the advantage of a selective emitter structure without requiring deep diffusions. The oxide further enables use of screen printing on advanced shallow emitter cells. Positioning of the grid lines close to the openings also enables use of a very thin emitter to maximize blue response.
摘要翻译：本发明涉及用于为太阳能电池触点提供掩埋绝缘体隔离的方法和设备。根据某些方面，本发明将埋置氧化物置于多晶硅发射极太阳能电池的发射极下方。氧化物在大部分表面上提供了优异的钝化层。氧化物中的孔提供接触面积，增加电流密度以提高效率。氧化物将触点与衬底隔离，实现了选择性发射极结构的优点而不需要深扩散。氧化物进一步使得能够在先进的浅发射器单元上使用丝网印刷。网格线靠近开口的位置也可以使用非常薄的发射器来最大化蓝色响应。

9. 发明申请

WO2003060187A1 PROCESS CHAMBER HAVING COMPONENT WITH YTTRIUM-ALUMINUM COATING 审中-公开
标题翻译：具有铝 - 铝涂层的组件的工艺室
公开(公告)号：WO2003060187A1
公开(公告)日：2003-07-24
申请号：PCT/US2002/041150
申请日：2002-12-19
申请人： APPLIED MATERIALS, INC.
发明人： HAN, Nianci , XU, Li , SHIH, Hong
IPC分类号： C23C16/44
CPC分类号： H01J37/32477 , C23C16/4404 , Y10T428/12458 , Y10T428/12667 , Y10T428/12736 , Y10T428/12764 , Y10T428/13 , Y10T428/26
摘要： A substrate processing chamber component is a structure having an integral surface coating comprising an yttrium-aluminum compound. The component may be fabricated by forming a metal alloy comprising yttrium and aluminum into the component shape and anodizing its surface to form an integral anodized surface coating. The chamber component may be also formed by ion implanting material in a preformed metal shape. The component may be one or more of a chamber wall, substrate support:, substrate transport, gas supply, gas energizer and gas exhaust.
摘要翻译：衬底处理室组件是具有包含钇铝化合物的整体表面涂层的结构。该组件可以通过将包含钇和铝的金属合金形成为组件形状并对其表面进行阳极氧化以形成整体的阳极氧化表面涂层来制造。腔室部件也可以由预先形成的金属形状的离子注入材料形成。该组件可以是室壁，衬底支撑件，衬底输送，气体供应，气体激发器和排气中的一个或多个。

10. 发明申请

WO2009126803A2 SIMPLIFIED BACK CONTACT FOR POLYSILICON EMITTER SOLAR CELLS 审中-公开
标题翻译：简单的背面接触多晶硅发射太阳能电池
公开(公告)号：WO2009126803A2
公开(公告)日：2009-10-15
申请号：PCT/US2009/040063
申请日：2009-04-09
申请人： APPLIED MATERIALS, INC.
发明人： BORDEN, Peter G. , XU, Li
IPC分类号： H01L31/042
CPC分类号： H01L31/0682 , H01L31/022441 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The present invention relates to forming contacts for solar cells. According to one aspect, an interdigitated back contact (IBC) cell design according to the invention requires only one patterning step to form the interdigitated junctions (vs. two for alternate designs). According to another aspect, the back contact structure includes a silicon nitride or a nitrided tunnel dielectric. This acts as a diffusion barrier, so that the properties of the tunnel dielectric can be maintained during a high temperature process step, and boron diffusion through the tunnel dielectric can be prevented. According to another aspect, the process for forming the back contacts requires no deep drive-in diffusions.
摘要翻译：本发明涉及形成太阳能电池的触点。根据一个方面，根据本发明的叉指式背接触（IBC）电池设计仅需要一个构图步骤来形成叉指结点（相对于替代设计的两个接合）。根据另一方面，背接触结构包括氮化硅或氮化隧道电介质。这充当扩散阻挡层，使得可以在高温工艺步骤期间保持隧道电介质的性质，并且可以防止通过隧道电介质的硼扩散。根据另一方面，用于形成背部接触的方法不需要深度驱动扩散。

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