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    • 1. 发明申请
    • SIC-ON-SI-BASED SEMICONDUCTOR MODULE WITH SHORT CIRCUIT FAILURE MODE
    • 基于SIC-ON-SI的半导体模块具有短路故障模式
    • WO2018065317A1
    • 2018-04-12
    • PCT/EP2017/074804
    • 2017-09-29
    • ABB SCHWEIZ AG
    • LIU, ChunleiRAHIMO, MunafSTEIMER, Peter
    • H01L23/62H01L23/051H01L25/07
    • H01L23/34H01L23/051H01L23/492H01L23/5252H01L23/62H01L24/72H01L25/072
    • A semiconductor module (10) comprises a semiconductor chip (12) comprising a Si base layer (14) and a SiC epitaxy layer (16) on the Si base layer (14), the SiC epitaxy layer (16) comprising a semiconductor element (17); an electrical conducting top layer (e.g. Mo) (24) for providing an electrical contact of the semiconductor module (10) on a side of the SiC epitaxy layer (16); an electrical conducting bottom layer (e.g. Mo) (22) for providing an electrical contact of the semiconductor module (10) on a side of the Si base layer (14); and a failure mode layer (26, 26a) in contact with the SiC epitaxy layer (16) and arranged between the top layer (24) and the bottom layer (22), the failure mode layer (26, 26a) comprising a metal material (e.g. Al, Cu, Ag, Au) (27) adapted for forming a eutectic alloy with the Si base layer (14), to short-circuit the semiconductor module (10). The semiconductor module (10) may also comprise a second failure mode layer (26, 26b) in contact with the Si base layer (14). The second failure mode layer (26, 26b) may be coated to a core (30) of the bottom layer (22), in which case the core (30) is made of Al-graphite (aluminium graphite composite), AlSiC (aluminium silicon carbide composite) or AlSip (aluminum matrix composite reinforced with high amount of silicon particles).
    • 半导体模块(10)包括在Si基底层(14)上包括Si基底层(14)和SiC外延层(16)的半导体芯片(12),SiC外延层 (16),包括半导体元件(17); 用于在SiC外延层(16)的一侧上提供半导体模块(10)的电接触的导电顶层(例如,Mo)(24); 用于在Si基层(14)的一侧上提供半导体模块(10)的电接触的导电底层(例如Mo)(22); 和与所述SiC外延层(16)接触并布置在所述顶层(24)和所述底层(22)之间的故障模式层(26,26a),所述故障模式层(26,26a)包括金属材料 (例如Al,Cu,Ag,Au)(27),用于与Si基层(14)形成共晶合金,以使半导体模块(10)短路。 半导体模块(10)还可以包括与Si基极层(14)接触的第二失效模式层(26,26b)。 第二破坏模式层(26,26b)可以被涂覆到底层(22)的芯部(30),在这种情况下,芯部(30)由Al-石墨(铝石墨复合材料),AlSiC 碳化硅复合材料)或AlSip(用大量硅颗粒增强的铝基复合材料)。
    • 2. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • WO2017157486A1
    • 2017-09-21
    • PCT/EP2016/075970
    • 2016-10-27
    • ABB SCHWEIZ AGAUDI AG
    • LIU, ChunleiMOHN, FabianBREM, Franziska
    • H01L23/49H01L23/492
    • A semiconductor device (28) comprises a semiconductor element (10) with a power electrode area (16), a control electrode area (18) and an elevated control electrode structure (20) on one side, wherein the elevated control electrode structure (20) is interconnected with the control electrode area (18) and protrudes the power electrode area (16); and a grooved plate (30), which is bonded with a grooved side (34) to the power electrode area (16); wherein the grooved plate (30) has at least one groove (36) in the grooved side (34), in which at least a part of the control electrode structure (20) is accommodated, whereby the grooved plate (30) is sintered via a sintering preform (40) interpositioned between the grooved plate (30) and the semiconductor element (10) to the power electrode area (16), such that the sintering preform (40) covers the elevated control electrode structure (20).
    • 半导体器件(28)包括在一侧具有功率电极区域(16),控制电极区域(18)和升高的控制电极结构(20)的半导体元件(10) 其中所述升高的控制电极结构(20)与所述控制电极区域(18)互连并且突出所述功率电极区域(16); 和沟槽板(30),所述沟槽板(30)与沟槽侧(34)结合到所述功率电极区域(16); 其特征在于,所述开槽板(30)在所述开槽侧(34)中具有至少一个凹槽(36),所述控制电极结构(20)的至少一部分容纳在所述凹槽中,其中所述开槽板(30) 在沟槽板(30)与半导体元件(10)之间插入功率电极区域(16)的烧结预型件(40),使得烧结预型件(40)覆盖升高的控制电极结构(20) p>