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    • 1. 发明申请
    • 積層構造及びそれを用いた電気回路用電極
    • 层叠结构和使用该电路的电路的电极
    • WO2007086280A1
    • 2007-08-02
    • PCT/JP2007/050497
    • 2007-01-16
    • 出光興産株式会社梅野 聡本田 克典井上 一吉松原 雅人
    • 梅野 聡本田 克典井上 一吉松原 雅人
    • G02F1/1343H01B5/02H01B5/14C23C14/08H01B13/00
    • C23C14/086G02F1/13439G02F2001/13629H01J9/02H01L51/5206H01L51/5209
    • A thin film composed of a thin film of ITO and a thin film of molybdenum stacked on top of each other has hitherto been used as a part of an electric circuit, for example, in liquid crystal displays. However, it is known that, when the thin film of molybdenum is formed on the thin film of ITO, internal stress takes place in each of the thin films, disadvantageously leading to separation of the thin film or breaking. To overcome this problem, a laminated film forming technique, which can simplify the step of film formation and the step of etching while preventing cracking and breaking caused by stress between the thin film of ITO and the thin film of molybdenum, has been demanded. As a result of extensive and intensive studies for solving the above problem, it was found that, when the thickness of a transparent electroconductive film is not more than 35 nm, the adhesion of the transparent electroconductive thin film and the thin film of molybdenum metal can be enhanced. By virtue of this finding, the prevention of cracking and breaking and an improvement in yield by the simplification of the process could have been simultaneously realized.
    • 迄今为止,已经使用由ITO的薄膜和堆积在其上方的钼薄膜构成的薄膜作为电路的一部分,例如在液晶显示器中。 然而,已知当ITO的薄膜上形成钼薄膜时,在各薄膜中产生内应力,导致薄膜分离或断裂。 为了克服这个问题,需要可以简化薄膜形成步骤的薄膜形成技术和在ITO薄膜和钼薄膜之间防止由应力引起的开裂和断裂的同时进行蚀刻的步骤。 作为解决上述问题的广泛而深入的研究的结果,发现当透明导电膜的厚度不大于35nm时,透明导电薄膜和钼金属薄膜的粘附能够 加强。 凭借这一发现,可以同时实现通过简化工艺来防止开裂和断裂以及产率的提高。
    • 2. 发明申请
    • 導電性組成物膜、電子注入電極及び有機エレクトロルミネッセンス素子
    • 导电组合物膜,电子注入电极和有机电致发光元件
    • WO2007029457A1
    • 2007-03-15
    • PCT/JP2006/316050
    • 2006-08-15
    • 出光興産株式会社笘井 重和梅野 聡
    • 笘井 重和梅野 聡
    • H01B1/08H01L51/50H05B33/28
    • H01L51/5234H01B1/08H01L51/5265H01L2251/5315
    • Disclosed are a conductive composition film, an electron injection electrode, and an organic electroluminescence element (abbreviated an "EL element", hereinafter). Display devices have been intensively developed using an EL element, and an electron injection electrode (14) for an EL element is required to have a low resistance and a high transparency. An ITO or the like has been proposed as a conductive composition film that meets with the requirement. However, an ITO has such a disadvantage that it has a large difference in work function from a light-emitting layer (13). The disadvantage can be overcome by providing a conductive composition film comprising the elements (A) and (B) below and an oxygen element, wherein the sum total of the amount of the element (A) (x) and the amount of the element (B) (y) (x+y) comprises 41 to 80 at% exclusive of the film, and the amount of the oxygen element comprises [(100-(x+y)] at% of the film, or the like: (A) an element selected from In, Sn and Zn; and (B) at least one element selected from In, Sn, Zn, V, W, Ni, Pd, Pt, Cu, Ag and Au which is different from the element (A).
    • 公开了导电组合物膜,电子注入电极和有机电致发光元件(以下简称为“EL元件”)。 已经使用EL元件强化显示器件,并且需要用于EL元件的电子注入电极(14)具有低电阻和高透明度。 已经提出了ITO等作为满足要求的导电性组合物膜。 然而,ITO具有与发光层(13)的功函数差异大的缺点。 通过提供包含下列元件(A)和(B)的导电组合物膜和氧元素可以克服缺点,其中元素(A)(x)的量与元素(A) B)(y)(x + y)除了膜以外含有41〜80原子%,氧元素的量包含膜的[(100-(x + y)]]% A)选自In,Sn和Zn的元素;和(B)选自In,Sn,Zn,V,W,Ni,Pd,Pt,Cu,Ag和Au中的至少一种元素(元素 一个)。