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1. 发明申请

WO2009038441A3 METHOD FOR ETCHING GLASS OR METAL SUBSTRATES USING NEGATIVE PHOTORESIST AND METHOD FOR FABRICATING CLICHE USING THE SAME 审中-公开
标题翻译：使用阴极光刻机蚀刻玻璃或金属基板的方法以及使用相同方法制造屏障的方法
公开(公告)号：WO2009038441A3
公开(公告)日：2009-05-07
申请号：PCT/KR2008005639
申请日：2008-09-22
申请人： LG CHEMICAL LTD , KIM JI-SU , JEON KYOUNG-SU , CHOI KYUNG-SOO , YI GI-RA , LEE SEUNG-HEON , SHIN DONG-MYUNG
发明人： KIM JI-SU , JEON KYOUNG-SU , CHOI KYUNG-SOO , YI GI-RA , LEE SEUNG-HEON , SHIN DONG-MYUNG
IPC分类号： H01L21/306
CPC分类号： G03F1/34 , C03C15/00 , C03C17/06 , C03C17/23 , C03C17/3665 , C03C2217/219 , C03C2217/26 , C03C2218/355 , G03F1/80
摘要： The present invention relates to a method for etching glass or metal using a negative photoresist and a method for fabricating a cliche using the same. In the method for etching glass or metal according to the present invention, since adhesion strength between the negative photoresist and the metal or the metal oxide is excellent, the photoresist layer is not corroded by the metal or metal oxide etching solution, it is unnecessary to produce an inverse photomask, the fabrication process is simple, and a low resolution light source such as mixed wavelength type light source is capable of being used, thus, economic efficiency is ensured.
摘要翻译：本发明涉及使用负性光刻胶蚀刻玻璃或金属的方法以及使用该方法制造底板的方法。在根据本发明的用于蚀刻玻璃或金属的方法中，由于负性光刻胶与金属或金属氧化物之间的粘合强度优异，所以光刻胶层不会被金属或金属氧化物蚀刻溶液腐蚀，所以不必产生反向光掩模，制作工艺简单，可以使用混合波长型光源等低分辨率光源，从而保证经济性。

2. 发明申请

WO2010041834A2 PIGMENT CONSISTING OF PHOTONIC CRYSTALS FOR A PAINT COMPOSITION, AND METHOD FOR PRODUCING SAME 审中-公开
标题翻译：用于油漆组合物的光聚合物的颜料的制备及其制造方法
公开(公告)号：WO2010041834A2
公开(公告)日：2010-04-15
申请号：PCT/KR2009005401
申请日：2009-09-23
申请人： KOREA ADVANCED INST SCI & TECH , YANG SEUNG-MAN , KIM SHIN-HYUN , SHIM JAE WON , YI GI-RA
发明人： YANG SEUNG-MAN , KIM SHIN-HYUN , SHIM JAE WON , YI GI-RA
IPC分类号： C09C1/36 , B82B3/00 , C09C3/00
CPC分类号： C09C1/3669 , B82Y30/00 , C01P2002/82 , C01P2004/03 , C01P2004/04 , C01P2004/62 , C01P2004/64 , C01P2004/84 , C01P2006/22 , C01P2006/60 , C09C1/30 , C09C1/36 , C09C1/3684 , C09C3/12
摘要： The present invention relates to a pigment consisting of photonic crystals for a paint composition. More particularly, the present invention relates to a pigment consisting of photonic crystals for a paint composition wherein colloid particles are distributed in a high molecular substance, and to a method for producing same.
摘要翻译：本发明涉及由用于涂料组合物的光子晶体组成的颜料。更具体地说，本发明涉及由胶体粒子分布在高分子物质中的涂料组合物的光子晶体及其制造方法。

3. 发明申请

WO2009128588A1 METHOD FOR IN-SITU MANUFACTURING MONODISPERSE SPHERICAL PHOTONIC CRYSTALS WITH SINGLE OR MULTI-COLORS USING MICROFLUIDIC DEVICES 审中-公开
标题翻译：使用微流体装置制造具有单色或多色彩的单一制造单体光子晶体的方法
公开(公告)号：WO2009128588A1
公开(公告)日：2009-10-22
申请号：PCT/KR2008/004542
申请日：2008-08-05
申请人： KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY , YANG, Seung-Man , KIM, Shin-Hyun , JEON, Seog-Jin , YI, Gi-Ra , JEONG, Woong-Chan
发明人： YANG, Seung-Man , KIM, Shin-Hyun , JEON, Seog-Jin , YI, Gi-Ra , JEONG, Woong-Chan
IPC分类号： B01J13/00
CPC分类号： C08F292/00 , C08L51/10 , G02B2006/1213 , C08L2666/02
摘要： The present invention is a method for manufacturing monodisperse spherical photonic crystals with single or multi-colors with a uniform size, which comprises: preparing microfluidic devices consisting of glass tubes; treating a colloidal dispersion capable of being photo-polymerized to generate liquid drops with a uniform size in water using the prepared microfluidic devices; and passing the prepared liquid drops with a uniform size through a region exposed to the UV located downstream of the fluidic devices to carry out photo-curing. The present inventions include a method for in-situ manufacturing of monodisperse spherical photonic crystals with a uniform size using microfluidic devices consisting of glass tubes, a method for manufacturation of monodisperse spherical photonic crystals with single or multi-colors as well as evaluation of optical properties of the monodisperse spherical photonic crystals manufactured by the above method and electrical rotation of the monodisperse spherical photonic crystals. A monodisperse spherical photonic crystalline structure formed according to the present invention is preferably applied to a variety of applications including, pixels of reflex displays, labels for detection of biological molecules, etc.
摘要翻译：本发明是制造具有均匀尺寸的单色或多色的单分散球形光子晶体的方法，其包括：制备由玻璃管组成的微流体装置; 使用所制备的微流体装置处理能够被光聚合的胶体分散体以在水中产生具有均匀尺寸的液滴; 并且通过暴露于位于流体装置下游的UV的区域，将制备好的液滴以均匀的尺寸通过，以进行光固化。本发明包括使用由玻璃管组成的微流体装置即时制造具有均匀尺寸的单分散球形光子晶体的方法，用于制造具有单色或多色的单分散球形光子晶体的方法以及光学性质的评估的通过上述方法制造的单分散球形光子晶体和单分散球形光子晶体的电旋转。根据本发明形成的单分散球形光子晶体结构优选地应用于各种应用，包括反射显示器的像素，用于检测生物分子的标签等。

4. 发明申请

WO2009038441A2 METHOD FOR ETCHING GLASS OR METAL SUBSTRATES USING NEGATIVE PHOTORESIST AND METHOD FOR FABRICATING CLICHE USING THE SAME 审中-公开
标题翻译：使用负离子光刻机蚀刻玻璃或金属基板的方法和使用该方法来制造层叠体的方法
公开(公告)号：WO2009038441A2
公开(公告)日：2009-03-26
申请号：PCT/KR2008/005639
申请日：2008-09-22
申请人： LG CHEM, LTD. , KIM, Ji-Su , JEON, Kyoung-Su , CHOI, Kyung-Soo , YI, Gi-Ra , LEE, Seung-Heon , SHIN, Dong-Myung
发明人： KIM, Ji-Su , JEON, Kyoung-Su , CHOI, Kyung-Soo , YI, Gi-Ra , LEE, Seung-Heon , SHIN, Dong-Myung
IPC分类号： H01L21/306
CPC分类号： G03F1/34 , C03C15/00 , C03C17/06 , C03C17/23 , C03C17/3665 , C03C2217/219 , C03C2217/26 , C03C2218/355 , G03F1/80
摘要： The present invention relates to a method for etching glass or metal using a negative photoresist and a method for fabricating a cliche using the same. In the method for etching glass or metal according to the present invention, since adhesion strength between the negative photoresist and the metal or the metal oxide is excellent, the photoresist layer is not corroded by the metal or metal oxide etching solution, it is unnecessary to produce an inverse photomask, the fabrication process is simple, and a low resolution light source such as mixed wavelength type light source is capable of being used, thus, economic efficiency is ensured.
摘要翻译：本发明涉及一种使用负性光致抗蚀剂蚀刻玻璃或金属的方法，以及使用该光致抗蚀剂制造方法。在根据本发明的用于蚀刻玻璃或金属的方法中，由于负性光致抗蚀剂和金属或金属氧化物之间的粘合强度优异，因此光致抗蚀剂层不被金属或金属氧化物蚀刻溶液腐蚀，因此不需要产生反光掩模，制造工艺简单，并且能够使用诸如混合波长型光源的低分辨率光源，从而确保经济效率。

5. 发明申请

WO2007067003A1 ADJUVANT FOR CONTROLLING POLISHING SELECTIVITY AND CHEMICAL MECHANICAL POLISHING SLURRY COMPRISING THE SAME 审中-公开
标题翻译：用于控制抛光选择性和化学机械抛光浆料的添加剂
公开(公告)号：WO2007067003A1
公开(公告)日：2007-06-14
申请号：PCT/KR2006/005317
申请日：2006-12-08
申请人： LG CHEM, LTD. , LEE, Jung-Hee , KIM, Jong-Pil , YI, Gi-Ra , MOON, Kwang-Ik , KO, Chang-Bum , JANG, Soon-Ho , CHO, Seung-Beom , HONG, Young-Jun
发明人： LEE, Jung-Hee , KIM, Jong-Pil , YI, Gi-Ra , MOON, Kwang-Ik , KO, Chang-Bum , JANG, Soon-Ho , CHO, Seung-Beom , HONG, Young-Jun
IPC分类号： C09K3/14
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
摘要： Disclosed is an adjuvant for controlling polishing selectivity when polishing a cationically charged material simultaneously with an anionically charged material. CMP slurry comprising the adjuvant is also disclosed. The adjuvant comprises: (a) a polyelectrolyte that forms an adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material; (b) a basic material; and (c) a fluorine-based compound. when the adjuvant for controlling polishing selectivity of CMP slurry according to the present invention is applied to a CMP process, it is possible to increase the polishing selectivity of a silicon oxide layer, to obtain a uniform particle size of CMP slurry, to stabilize variations in viscosity under an external force and to minimize generation of microscratches during a polishing process. Therefore, the adjuvant for CMP slurry according to the present invention can improve reliability and productivity during the fabrication of very large scale integrated semiconductors.
摘要翻译：公开了用于在与阴离子充电材料同时研磨阳离子充电材料时控制抛光选择性的佐剂。还公开了包含佐剂的CMP浆料。助剂包括：（a）在阳离子充电材料上形成吸附层的聚电解质，以增加阴离子充电材料的抛光选择性; （b）基本材料; 和（c）氟系化合物。当将用于控制根据本发明的CMP浆料的抛光选择性的佐剂应用于CMP工艺时，可以增加氧化硅层的抛光选择性，以获得CMP浆料的均匀粒度，以稳定化在外力下的粘度并且在抛光过程中最小化微细纹的产生。因此，根据本发明的用于CMP浆料的助剂可以在制造非常大规模的集成半导体期间提高可靠性和生产率。

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