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1. 发明申请

WO2013010730A1 METHOD FOR PROVIDING A TEMPLATE FOR A SELF-ASSEMBLABLE POLYMER FOR USE IN DEVICE LITHOGRAPHY 审中-公开
标题翻译：用于提供自组装聚合物的模板的方法用于器件平台的使用
公开(公告)号：WO2013010730A1
公开(公告)日：2013-01-24
申请号：PCT/EP2012/061293
申请日：2012-06-14
申请人： ASML NETHERLANDS B.V. , WUISTER, Sander
发明人： WUISTER, Sander
IPC分类号： G03F7/00
CPC分类号： G03F7/2024 , B81C1/00428 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/16
摘要： Methods are disclosed for depositing a template for directed self-assembly of a self-assemblable block polymer on a surface of a substrate. The method involves providing a chemical epitaxy pattern of alternating first and second regions having differing chemical affinities for first and second blocks of the polymer on the surface by photolithography, and providing spaced graphoepitaxy features on the surface by photolithography. The chemical epitaxy pattern is aligned with and located between pairs of spaced graphoepitaxy features. The spaced graphoepitaxy features and chemical epitaxy pattern are arranged to act together to direct self-assembly of the self- assemblage block copolymer. The resulting template may be used to direct self- assembly of a suitable self-assemblable polymer and the resulting aligned and oriented self-assembled polymer may itself be used as a resist for lithography of the substrate.
摘要翻译：公开了用于在衬底的表面上沉积用于自组装嵌段聚合物的定向自组装的模板的方法。该方法包括通过光刻法提供具有不同化学亲和力的交替的第一和第二区域的表面上的聚合物的第一和第二嵌段的化学外延图案，并且通过光刻法在表面上提供间隔的划线图案特征。化学外延图案与成对间隔的划线图案特征对准并定位。排列的划线图案特征和化学外延图案被布置成一起作用以引导自组装嵌段共聚物的自组装。所得到的模板可以用于引导合适的可自组装聚合物的自组装，并且所得到的对准且定向的自组装聚合物本身可以用作衬底的光刻用抗蚀剂。

2. 发明申请

WO2011064021A1 IMPRINT LITHOGRAPHY APPARATUS AND METHOD 审中-公开
标题翻译： IMPRINT LITHOGRAPHY APPARATUS和方法
公开(公告)号：WO2011064021A1
公开(公告)日：2011-06-03
申请号：PCT/EP2010/064662
申请日：2010-10-01
申请人： ASML NETHERLANDS B.V. , WUISTER, Sander
发明人： WUISTER, Sander
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： In an embodiment, a lithographic apparatus is disclosed that includes an imprint template holder configured to hold an imprint template, and a dispensing mechanism of polar molecules, wherein the dispensing mechanism of polar molecules is configured to provide polar molecules into a local environment in the vicinity of the imprint template, such that the concentration of polar molecules in the local environment in the vicinity of the imprint template is greater than the concentration of polar molecules in other parts of the lithographic apparatus.
摘要翻译：在一个实施例中，公开了一种光刻设备，其包括构造成保持压印模板的压印模板保持器和极性分子的分配机构，其中极性分子的分配机构被配置为在附近的局部环境中提供极性分子使得压印模板附近的局部环境中的极性分子的浓度大于光刻设备的其它部分中极性分子的浓度。

3. 发明申请

WO2012175343A1 SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：自组装聚合物及其在LITHOGRAPHY中的使用方法
公开(公告)号：WO2012175343A1
公开(公告)日：2012-12-27
申请号：PCT/EP2012/060784
申请日：2012-06-07
申请人： ASML NETHERLANDS B.V. , BRIZARD, Aurelie , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel
发明人： BRIZARD, Aurelie , WUISTER, Sander , KOOLE, Roelof , PEETERS, Emiel
IPC分类号： G03F7/00 , C08G83/00
CPC分类号： G03F7/004 , B82Y10/00 , B82Y40/00 , C30B19/00 , G03F7/0002
摘要： A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.
摘要翻译：适于自组装以在基底上形成有序图案的嵌段共聚物具有第一和第二嵌段，其末端部分共价键合到第一嵌段的末端。末端部分的分子量为嵌段共聚物的分子量的20％以下，末端部分对第一嵌段具有低的化学亲和力。末端部分可以帮助有序阵列的域的精确位置放置并且导致改进的临界尺寸均匀性和/或减少的线边缘粗糙度。所述聚合物可以与骨架外延模板组合使用，其中末端部分被选择为与模板的侧壁缔合。这可以减少侧壁处的聚合物域的不希望的聚集和/或有助于域放置精度。

4. 发明申请

WO2012084558A1 METHODS FOR PROVIDING PATTERNED ORIENTATION TEMPLATES FOR SELF-ASSEMBLABLE POLYMERS FOR USE IN DEVICE LITHOGRAPHY 审中-公开
标题翻译：提供用于自组装聚合物的图案方向模板的方法用于器件平台的使用
公开(公告)号：WO2012084558A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072379
申请日：2011-12-09
申请人： ASML NETHERLANDS B.V. , PEETERS, Emiel , KETELAARS, Wilhelmus , DIJKSMAN, Johan , WUISTER, Sander , KOOLE, Roelof , VAN HEESCH, Chris
发明人： PEETERS, Emiel , KETELAARS, Wilhelmus , DIJKSMAN, Johan , WUISTER, Sander , KOOLE, Roelof , VAN HEESCH, Chris
IPC分类号： G03F7/00
CPC分类号： C30B19/12 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.
摘要翻译：公开了一种方法，其涉及在衬底上形成化学外延或者石墨电极特征之后，但在自组装聚合物的沉积和取向之前，将中性取向模板层沉积到衬底上。取向层被布置成与基底结合，但不具有某些特征，使得其可以容易地通过真空或用有机溶剂漂洗除去。中性取向层具有与自组装聚合物中的嵌段相符的化学亲和力，使得不同类型的块润湿中性取向层，使得自组装聚合物中的畴可以沿着衬底表面并排，界面垂直于衬底表面。所得到的对准和取向的自组装聚合物本身可以用作衬底的器件光刻的抗蚀剂。

5. 发明申请

WO2011064020A1 ALIGNMENT AND IMPRINT LITHOGRAPHY 审中-公开
标题翻译：对齐和绘制图
公开(公告)号：WO2011064020A1
公开(公告)日：2011-06-03
申请号：PCT/EP2010/064607
申请日：2010-09-30
申请人： ASML NETHERLANDS B.V. , WUISTER, Sander , KRUIJT-STEGEMAN, Yvonne
发明人： WUISTER, Sander , KRUIJT-STEGEMAN, Yvonne
IPC分类号： G03F7/00 , G03F9/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042 , G03F9/7088
摘要： An imprint lithography alignment apparatus is disclosed that includes at least two detectors which are configured to detect an imprint template alignment mark, wherein the alignment apparatus further comprises alignment radiation adjustment optics which are configured to provide adjustment of locations from which the at least two alignment detectors receive alignment radiation.
摘要翻译：公开了一种压印光刻对准装置，其包括被配置为检测压印模板对准标记的至少两个检测器，其中所述对准装置还包括对准辐射调节光学器件，其被配置为提供对所述至少两个对准检测器接收对准辐射。

6. 发明申请

WO2010063504A3 IMPRINT LITHOGRAPHY APPARATUS AND METHOD 审中-公开
公开(公告)号：WO2010063504A3
公开(公告)日：2010-06-10
申请号：PCT/EP2009/062963
申请日：2009-10-06
申请人： ASML NETHERLANDS B.V. , KONINKLIJKE PHILIPS ELECTRONICS B.V. , VAN DER TEMPEL, Leendert , DIJKSMAN, Johan , WUISTER, Sander , KRUIJT-STEGEMAN, Yvonne , LAMMERS, Jeroen , MUTSAERS, Cornelis
发明人： VAN DER TEMPEL, Leendert , DIJKSMAN, Johan , WUISTER, Sander , KRUIJT-STEGEMAN, Yvonne , LAMMERS, Jeroen , MUTSAERS, Cornelis
IPC分类号： G03F7/00
摘要： A method of imprint lithography involves the use of a void space in the substrate or imprint template. A gas pocket trapped between an imprint template and an imprintable, flowable medium on the substrate may lead to an irregularity once the imprintable medium has set. A void space allows the gas pocket to dissipate by flow or diffusion of gas into the void space, typically prior to setting the imprintable medium. A layer of solid porous medium as part of the imprint template, for instance as a layer forming or neighbouring the patterning surface of the template, may provide the void space. The void space of the porous layer acts as a void space into which the trapped gas can flow or diffuse. The substrate to be patterned may include a porous layer for the same purpose. A suitable solid porous medium includes a nanoporous silica.

7. 发明申请

WO2012136434A3 LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD 审中-公开
标题翻译：光栅设备，可编程格式设备和光刻方法
公开(公告)号：WO2012136434A3
公开(公告)日：2012-12-13
申请号：PCT/EP2012053918
申请日：2012-03-07
申请人： ASML NETHERLANDS BV , DE JAGER PIETER , BANINE VADIM , ONVLEE JOHANNES , STEVENS LUCAS , WUISTER SANDER , IOSAD NIKOLAY
发明人： DE JAGER PIETER , BANINE VADIM , ONVLEE JOHANNES , STEVENS LUCAS , WUISTER SANDER , IOSAD NIKOLAY
IPC分类号： G02F1/29 , G03F7/20
CPC分类号： G03F7/70191 , G02F1/1303 , G02F1/29 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.
摘要翻译：在一个实施例中，公开了一种光刻设备，其包括调制器，其被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统配置成将经调制的光束投影到基板上。调制器包括偏转器，用于相对于曝光区域移位多个光束。

8. 发明申请

WO2011107302A3 IMPRINT LITHOGRAPHY 审中-公开
标题翻译：印刷光刻
公开(公告)号：WO2011107302A3
公开(公告)日：2011-12-15
申请号：PCT/EP2011050246
申请日：2011-01-11
申请人： ASML NETHERLANDS BV , KRUIJT-STEGEMAN YVONNE , DEN BOEF ARIE , JEUNINK ANDRE , WUISTER SANDER
发明人： KRUIJT-STEGEMAN YVONNE , DEN BOEF ARIE , JEUNINK ANDRE , WUISTER SANDER
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
摘要翻译：公开了一种确定压印光刻设备中的压印模板的位置的方法。在一个实施例中，该方法包括通过在该区域上扫描对准辐射束来照射其中预期将找到对准标记的压印模板的区域，检测从该区域反射或透射的辐射的强度，以及识别对准标记通过分析检测到的强度来标记。

9. 发明申请

WO2011128120A1 METHOD FOR PROVIDING AN ORDERED LAYER OF SELF-ASSEMBLABLE POLYMER FOR USE IN LITHOGRAPHY 审中-公开
标题翻译：用于提供自组装聚合物的订购层的方法用于LITHOGRAPHY
公开(公告)号：WO2011128120A1
公开(公告)日：2011-10-20
申请号：PCT/EP2011/050668
申请日：2011-01-19
申请人： ASML NETHERLANDS B.V. , PEETERS, Emiel , WUISTER, Sander , KOOLE, Roelof
发明人： PEETERS, Emiel , WUISTER, Sander , KOOLE, Roelof
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for providing an ordered polymer layer at a surface of a substrate includes depositing a self-assemblable polymer layer directly onto a primer layer on a substrate to provide an interface between the self-assemblable polymer layer and the primer layer, and treating the self-assemblable polymer layer to provide self-assembly into an ordered polymer layer, such as a block copolymer, having first and second domain types at the interface. The primer layer is adapted to improve its chemical affinity to each domain type at the interface, in response to the presence of the respective domain type in the self-assembled polymer at the interface during the self-assembly of the self-assemblable polymer layer into the ordered polymer layer. This may lead to reduction in defect levels and/or improved persistence length for the ordered polymer layer. The method may be useful for forming resist layers for use in device lithography.
摘要翻译：在衬底的表面提供有序聚合物层的方法包括将可自组装的聚合物层直接沉积在基底上的底漆层上，以提供可自组装的聚合物层和底漆层之间的界面，以及处理自身可以将聚合物层自组装成有序聚合物层，例如在界面处具有第一和第二域类型的嵌段共聚物。响应于在自组装聚合物层的自组装期间在界面处的自组装聚合物中存在相应的畴型，引物层适于改善其在界面处对每种畴型的化学亲和力有序聚合物层。这可能导致有序聚合物层的缺陷水平和/或改善的持续长度的降低。该方法可用于形成用于器件光刻的抗蚀剂层。

10. 发明申请

WO2010063504A2 IMPRINT LITHOGRAPHY APPARATUS AND METHOD 审中-公开
标题翻译：印刷光刻设备和方法
公开(公告)号：WO2010063504A2
公开(公告)日：2010-06-10
申请号：PCT/EP2009062963
申请日：2009-10-06
申请人： ASML NETHERLANDS BV , KONINK PHILIPS ELECTRONICS B V , VAN DER TEMPEL LEENDERT , DIJKSMAN JOHAN , WUISTER SANDER , KRUIJT-STEGEMAN YVONNE , LAMMERS JEROEN , MUTSAERS CORNELIS
发明人： VAN DER TEMPEL LEENDERT , DIJKSMAN JOHAN , WUISTER SANDER , KRUIJT-STEGEMAN YVONNE , LAMMERS JEROEN , MUTSAERS CORNELIS
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of imprint lithography involves the use of a void space in the substrate or imprint template. A gas pocket trapped between an imprint template and an imprintable, flowable medium on the substrate may lead to an irregularity once the imprintable medium has set. A void space allows the gas pocket to dissipate by flow or diffusion of gas into the void space, typically prior to setting the imprintable medium. A layer of solid porous medium as part of the imprint template, for instance as a layer forming or neighbouring the patterning surface of the template, may provide the void space. The void space of the porous layer acts as a void space into which the trapped gas can flow or diffuse. The substrate to be patterned may include a porous layer for the same purpose. A suitable solid porous medium includes a nanoporous silica.
摘要翻译：压印光刻的方法涉及在基板或压印模板中使用空隙空间。一旦可压印介质凝固，被俘获在压印模板和衬底上的可压印的可流动介质之间的气袋可能导致不规则。通常在设置可压印介质之前，空隙空间允许气穴通过气流或空气扩散进入空隙空间而消散。作为压印模板的一部分的一层固体多孔介质，例如作为形成或邻近模板的图案化表面的层，可以提供空隙空间。多孔层的空隙空间充当被捕获的气体可以流入或扩散到其中的空隙空间。出于相同的目的，待图案化的衬底可以包括多孔层。合适的固体多孔介质包括纳米多孔二氧化硅。

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