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    • 2. 发明申请
    • A VACUUM TREATMENT APPARATUS, A BIAS POWER SUPPLY AND A METHOD OF OPERATING A VACUUM TREATMENT APPARATUS
    • 真空处理装置,偏压电源和操作真空处理装置的方法
    • WO2007115819A8
    • 2008-02-07
    • PCT/EP2007003181
    • 2007-04-10
    • HAUZER TECHNO COATING BVUNIV SHEFFIELD HALLAMTIETEMA ROELDOERWALD DAVEEHIASARIAN ARUTIUN PHOVSEPIAN PAPKEN E
    • TIETEMA ROELDOERWALD DAVEEHIASARIAN ARUTIUN PHOVSEPIAN PAPKEN E
    • H01J37/34H01J37/32
    • H01J37/3402H01J37/32045H01J37/32623H01J37/32706H01J37/3444H01J37/3467H01J2237/0206
    • A vacuum treatment apparatus (10) for treating at least one substrate (12) and comprising a treatment chamber (14), at least one cathode (16), a power supply (18) associated with the cathode for generating ions of a material present in the gas phase in the chamber and/or ions of a material of which the cathode is formed, a substrate carrier (20) and a bias power supply for applying a negative bias to the substrate carrier and any substrate present thereon, whereby to attract said ions to said at least one substrate, said cathode power supply being adapted to apply relatively high power pulses of relatively short duration to said cathode at intervals resulting in lower average power levels comparable with DC operation, e.g. in the range from ca. 1 KW to 100 KW, is characterized in that the bias power supply is adapted to permit a bias current to flow at a level corresponding generally to the average power level, and in that an additional voltage supply of relatively low inductive and resistive impedance is associated with the bias power supply for supplying a bias voltage adapted to the power of the relatively high power pulses when said relatively high power pulses are applied to said at least one cathode.
    • 一种用于处理至少一个基板(12)并包括处理室(14),至少一个阴极(16),与阴极相关联的电源(18)的真空处理设备(10),用于产生存在的材料的离子 在腔室中的气相和/或形成阴极的材料的离子,衬底载体(20)和偏置电源,用于向衬底载体和存在于其上的任何衬底施加负偏压,从而吸引 所述离子到所述至少一个衬底,所述阴极电源适于以间隔施加相对较短持续时间的相对高功率脉冲,导致与DC操作相当的较低平均功率水平,例如 在从 1KW至100KW,其特征在于偏置电源适于允许偏置电流以大致对应于平均功率电平的水平流动,并且相关联的电感和阻抗相对较低的附加电压源 当所述相对较高的功率脉冲被施加到所述至少一个阴极时,偏置电源用于提供适合于相对高功率脉冲功率的偏置电压。
    • 10. 发明申请
    • SOL-GEL DERIVED COATING
    • 溶胶凝胶涂层
    • WO2006120387A3
    • 2007-02-22
    • PCT/GB2006001620
    • 2006-05-03
    • UNIV SHEFFIELD HALLAMWANG HEMINGAKID ROBERT
    • WANG HEMINGAKID ROBERT
    • C23C18/12C23C18/02
    • C23C18/1225C23C18/02C23C18/1216C23C18/1254
    • A sol-gel derived coating and method of preparing the same is provided. The coating is particularly suitable as an anticorrosion coating and may comprise additional functionality by the incorporation of one or more dopant compounds within the resulting ceramic coating. The sol-gel processing technique comprises formation of gel particulates suspended in a solution based slurry. The slurry is then applied to the substrate to form a first coat. Gellation of the particles is controlled to provide chemically active sites present within the first coat. A sol comprising an inorganic oxide is then applied to the first coat followed by subsequent heat treatment and/or drying to produce a thick, dense ceramic coating.
    • 提供了溶胶 - 凝胶衍生的涂层及其制备方法。 该涂层特别适合作为防腐涂层,并且可以通过在所得的陶瓷涂层中引入一种或多种掺杂剂化合物来包含额外的功能。 溶胶 - 凝胶加工技术包括形成悬浮在基于溶液的浆料中的凝胶微粒。 然后将浆料施加到基材上以形成第一涂层。 控制颗粒的凝胶以提供存在于第一涂层内的化学活性位点。 然后将包含无机氧化物的溶胶施加到第一涂层,随后进行热处理和/或干燥以产生厚而致密的陶瓷涂层。