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1. 发明申请

WO1998028108A1 MANUFACTURE OF POROUS POLISHING PAD 审中-公开
标题翻译：多孔抛光垫的制造
公开(公告)号：WO1998028108A1
公开(公告)日：1998-07-02
申请号：PCT/SG1996000020
申请日：1996-12-20
申请人： UNIQUE TECHNOLOGY INTERNATIONAL PRIVATE LIMITED , TANI, Kazunori
发明人： UNIQUE TECHNOLOGY INTERNATIONAL PRIVATE LIMITED
IPC分类号： B24D11/00
CPC分类号： B24B37/26 , B24D3/26 , B24D11/001 , B24D15/04 , B24D18/00
摘要： A new method for manufacturing a porous polishing pad by implanting metallic or polymeric filings as pore former on a backing cloth/film inside an electric and/or magnetic field, coating the pad polymer onto the implanted filings and, thereafter, etc away or dissolve the pore former; the pores of the porous polymer can be controlled by the filing size and shape. The pore orientation, density and pattern can also be controlled. This porous polishing pad has consistent pore size, shape, orientation and density, and a flat surface; the pad polymer can be coated in different patterns. This new polishing pad is able to maintain constant polishing conditions and hence, produces a planar and super mirror-polished surface.
摘要翻译：一种用于制造多孔抛光垫的新方法，该方法通过将金属或聚合物填料作为成孔剂植入在电和/或磁场内的背衬/薄膜上，将垫聚合物涂覆到植入的填料上，然后将其除去或溶解成孔剂多孔聚合物的孔可以通过填充尺寸和形状来控制。也可以控制孔取向，密度和图案。该多孔抛光垫具有一致的孔径，形状，取向和密度以及平坦表面; 衬垫聚合物可以以不同的图案涂布。这种新的抛光垫能够保持恒定的抛光条件，从而产生平面和超镜面抛光表面。

2. 发明申请

WO1998019306A1 STORAGE CASSETTE FOR MAGNETIC DISKS OR THIN SUBSTRATES 审中-公开
标题翻译：磁条或薄基板的储存盒
公开(公告)号：WO1998019306A1
公开(公告)日：1998-05-07
申请号：PCT/SG1996000014
申请日：1996-10-30
申请人： TANI, Kazunori
IPC分类号： G11B23/033
CPC分类号： G11B23/00 , G11B33/0433
摘要： A storage cassette for holding disks or thin substrates during transportation, processing or stocking, which may be opened up by folding or dismantling for wet cleaning or to minimise the space required for transportation and storage of the cassette. In one embodiment, the cassette consists of the following parts: the bottom (1A), two sides (1B), two end pieces (1C) and top and bottom lids (not shown). The sides (1B) and end pieces (1C) are hinged to the bottom piece (1A) by means of hinges (4). The hinge (4) may be a removable plastic insert type. When folded up as a cassette, the sides (1B) and end pieces (1C) are held in place with each other by catches (5). The catch (5) may be an integral moulding with the end piece (1C) or it may be a removable plastic insert type pressed into the receptacle on the end piece (1C); the corresponding receptacles (6) for the catches are located at the end of the side pieces (1B). The top lid (not shown) is secured over the cassette body by means of compression catches (not shown), while the bottom lid (not shown) is held in place by tight fit with the corners of the cassette body.
摘要翻译：一种用于在运输，加工或储存期间保持盘或薄基板的存储盒，其可以通过折叠或拆卸进行湿式清洁而打开，或者最小化盒的运输和储存所需的空间。在一个实施例中，盒由以下部分组成：底部（1A），两侧（1B），两个端部件（1C）和顶盖和底盖（未示出）。侧面（1B）和端部件（1C）通过铰链（4）铰接到底部件（1A）上。铰链（4）可以是可移除的塑料插入物类型。当折叠成盒时，边（1B）和端片（1C）通过卡扣（5）彼此保持就位。卡扣（5）可以是具有端部件（1C）的整体模制件，或者它可以是压入端部件（1C）上的容器中的可移除的塑料插入件; 用于卡扣的相应的容器（6）位于侧件（1B）的端部。顶盖（未示出）通过压缩卡扣（未示出）固定在盒体上，而底盖（未示出）通过与盒体的角部紧密配合而保持就位。

3. 发明申请

WO1999010569A1 COMBINATION ELECTROLYTIC POLISHING AND POLISHING AND TEXTURING MACHINE AND THE COMBINATION ELECTROLYTIC POLISHING AND POLISHING AND TEXTURING TAPE USED IN THE SAID MACHINE 审中-公开
标题翻译：组合电解抛光和抛光机和组合电解抛光和抛光和纹理胶带在机器中使用
公开(公告)号：WO1999010569A1
公开(公告)日：1999-03-04
申请号：PCT/SG1997000051
申请日：1997-10-03
申请人： UNIQUE TECHNOLOGY INTERNATIONAL PTE. LTD. , TANI, Kazunori , KAWACHI, Kohichi
发明人： UNIQUE TECHNOLOGY INTERNATIONAL PTE. LTD.
IPC分类号： C25F03/16
CPC分类号： B24D11/00 , B24B19/028 , C25F3/16 , G11B5/8404 , Y10S451/908
摘要： Objective: to provide a combination electrolytic polishing and polishing and grinding machine and processing tape which will enable the formation on the surface of hard disks uniform, accurate texturing without abnormal protrusions. Composition: a polishing and texturing machine and processing tape in which a layer which can hold polishing grains is formed with flocking or foam resin on one surface of tape-shaped backing, such as synthetic resin film or woven material or non-woven cloth, and electrolytic solution into which polishing grains have been dispersed is supplied to this tape to conduct polishing or texturing of the hard disk board, at the same time as which a voltage is applied between the electrode established close to the surface being processed and the disk board to enable electrolytic polishing. Effect: simultaneous mechanical processing and electrolytic polishing enables the efficient provision of hard disks in one-stage processing with surface properties equal, or superior to those produced in two-stage processing.
摘要翻译：目的：提供一种电解抛光和抛光研磨机和加工胶带的组合，使硬盘表面的形成均匀，纹理不变，无异常突起。组合物：抛光和变形机和处理带，其中可以保持抛光颗粒的层在植物或泡沫树脂上形成在诸如合成树脂膜或编织材料或无纺布的带状背衬的一个表面上，以及将该抛光颗粒分散在其中的电解溶液供给到该带，以在与被处理表面之间建立的电极与盘板之间施加电压的同时对硬盘板进行抛光或纹理化，使电解抛光。效果：同时机械加工和电解抛光使得能够在一阶段加工中有效地提供硬盘，其表面性能等同于或优于两级加工中生产的。

4. 发明申请

WO1994022664A1 PHOTOHARDENING MOLDING APPARATUS WITH RECOATER TRAVELLING STROKE REGULATING MECHANISM 审中-公开
标题翻译：带摄像机行驶调节机构的摄影模具
公开(公告)号：WO1994022664A1
公开(公告)日：1994-10-13
申请号：PCT/JP1993000440
申请日：1993-04-05
申请人： CMET, INC. , YAC CORPORATION , NARUKAWA, Hidetaka , SAITO, Naoichiro , HAYANO, Seiji , TANI, Kazunori , NARUO, Hatsumi , SARADA, Ichitaro
发明人： CMET, INC. , YAC CORPORATION
IPC分类号： B29C67/00
CPC分类号： H03K17/693 , B29C41/12 , B29C64/124 , B29C64/386 , B29C2037/90 , H01L29/1087 , H01L29/78 , H01L29/7801 , H03K17/08142 , H03K2217/0018
摘要： A photohardening molding apparatus for forming a hardened layer having a controlled contour by applying light, the irradiation region of which is controlled, to the surface of a photosetting liquid, precipitating the hardened layer, and repeating the step of recoating the upper surface of the hardened layer with an unhardened liquid while making a recoater travel on the hardened layer, wherein the recoater travelling stroke is restricted to a required minimum level so as to reduce the recoating time. To achieve this object, a means for determining minimum and maximum coordinates of the contour of each section is added, whereby a recoater travelling stroke is restricted to within the coordinates.
摘要翻译：一种光硬化成型装置，其特征在于，通过将照射区域进行控制的光照射到光固化液的表面上，形成具有受控轮廓的硬化层，使硬化层析出，重复上述硬化层层，同时在硬化层上进行再涂布行进，其中重涂器行进行程被限制到所需的最小水平，以便减少重新涂覆时间。为了实现该目的，添加了用于确定每个部分的轮廓的最小和最大坐标的装置，由此将重涂器行进冲程限制在坐标内。

5. 发明申请

WO1993024303A1 PHOTOHARDENING MOLDING APPARATUS WITH IMPROVED RECOATING PROCESS AND PHOTOHARDENING MOLDING METHOD 审中-公开
标题翻译：具有改进的拍摄过程和光刻模塑方法的光电模塑设备
公开(公告)号：WO1993024303A1
公开(公告)日：1993-12-09
申请号：PCT/JP1993000439
申请日：1993-04-05
申请人： CMET, INC. , YAC CORPORATION , NARUKAWA, Hidetaka , SAITO, Naoichiro , HAYANO, Seiji , TANI, Kazunori , NARUO, Hatsumi , SARADA, Ichitaro
发明人： CMET, INC. , YAC CORPORATION
IPC分类号： B29C67/00
CPC分类号： B29C41/12 , B29C31/04 , B29C64/106 , B29C64/135
摘要： A photohardening molding apparatus and a photohardening molding method, wherein the reliability of an operation for coating the upper surface of a hardened layer with an unhardened liquid is improved and the time required to carry out the same operation is reduced. To meet the purpose, a clearance shall be formed between the lower surface of a recoater travelling on a hardened layer and the upper surface of the hardened layer. When this condition is satisfied, an unhardened liquid is introduced onto the hardened layer owing to both the force of the lower surface of the recoater of dragging the unhardened liquid and the nature of the unhardened liquid of entering the clearance. When recesses are provided in the lower surface of the recoater, the liquid adsorbed to the surfaces thereof is also introduced onto the unhardened layer.
摘要翻译：光硬化成型装置和光硬化成型方法，其中改善了用未硬化液体涂覆硬化层的上表面的操作的可靠性，并且减少了进行相同操作所需的时间。为了达到这个目的，在硬化层上运行的再涂器的下表面和硬化层的上表面之间应形成间隙。当满足这一条件时，由于将未硬化液体拖曳的再涂布机的下表面的力和进入间隙的未硬化液体的性质两者都将未硬化液体引入硬化层。当在重涂器的下表面设置凹部时，吸附到其表面的液体也被引入未硬化层。

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