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2. 发明申请

WO1998025131A1 WAFER INSPECTION SYSTEM FOR DISTINGUISHING PITS AND PARTICLES 审中-公开
标题翻译：用于检测颗粒和颗粒的波浪检查系统
公开(公告)号：WO1998025131A1
公开(公告)日：1998-06-11
申请号：PCT/US1997021947
申请日：1997-12-02
申请人： ADE OPTICAL SYSTEMS CORPORATION , FOSSEY, Michael, E. , STOVER, John, C.
发明人： ADE OPTICAL SYSTEMS CORPORATION
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/94
摘要： A surface inspection system (20) and method is provided which detects defects such as particles or pits on the surface of a workpiece (W), such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system (20) comprises an inspection station for receiving a workpiece and a scanner (80) positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner (80) includes a light source (81) arranged to project a beam of P-polarized light and a deflector (85) positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.
摘要翻译：提供了表面检查系统（20）和方法，其检测诸如硅晶片的工件（W）的表面上的诸如颗粒或凹坑的缺陷，并且还区分凹坑缺陷和颗粒缺陷。表面检查系统（20）包括用于接收工件的检查站和定位和布置成在检查站扫描工件的表面的扫描器（80）。扫描器（80）包括布置成投射P偏振光束的光源（81）和定位成扫描P偏振光束穿过工件表面的偏转器（85）。该系统还提供了检测从工件散射的光的角度分布的差异，并且基于这些差异来区分颗粒缺陷和凹坑缺陷。

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