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1. 发明申请

WO2008120772A1 ACTIVE ENERGY RAY CURABLE LIQUID COMPOSITION AND LIQUID CARTRIDGE 审中-公开
标题翻译：活性能量可固化液体组合物和液体盒
公开(公告)号：WO2008120772A1
公开(公告)日：2008-10-09
申请号：PCT/JP2008/056266
申请日：2008-03-25
申请人： CANON KABUSHIKI KAISHA , SHINJO, Kenji , OHKUMA, Norio , SHIBA, Shoji , UEDA, Hikaru , ISHIKURA, Hiroe , TSUJI, Shinsuke , SAITO, Yoshikazu , HARADA, Kouji , KANASUGI, Yuichiro
发明人： SHINJO, Kenji , OHKUMA, Norio , SHIBA, Shoji , UEDA, Hikaru , ISHIKURA, Hiroe , TSUJI, Shinsuke , SAITO, Yoshikazu , HARADA, Kouji , KANASUGI, Yuichiro
IPC分类号： C08F22/40 , B41M5/00 , C08F26/06 , C09D11/00
CPC分类号： C09D11/30 , C08F222/40 , C09D11/101
摘要： The invention provides an active energy ray curable liquid composition containing a compound represented by a general formula (I): wherein A is a hydrogen atom or a monovalent organic residue which may be substituted, R 1 and R 2 are, independently of each other, a divalent organic group which may be substituted, E is an amide bond, R n is a cyclic linking group having a carbonyl group and an unsaturated carbon-carbon bond adjacent to the carbon atom of the carbonyl group, m is a number of 0 or greater, n is a number of 2 or greater, m + n is 3, and Z is a secondary or tertiary amino bond structure, with the proviso that the amino bond may be a salt of a secondary or tertiary amine, and a liquid cartridge.
摘要翻译：本发明提供了含有由通式（I）表示的化合物的活性能量射线可固化液体组合物：其中A是氢原子或可被取代的一价有机残基，R 1和R 2， SUB> 2 <！ - SIPO - >彼此独立地是可以被取代的二价有机基团，E是酰胺键，R n是具有羰基和不饱和的环状连接基团与羰基的碳原子相邻的碳 - 碳键，m为0以上数，n为2以上数，m + n为3，Z为仲或叔氨基键结构，与条件是氨基键可以是仲胺或叔胺的盐，和液体盒。

2. 发明申请

WO2006001532A1 INK JET HEAD MANUFACTURING METHOD AND INK JET HEAD MANUFACTURED BY THE MANUFACTURING METHOD 审中-公开
标题翻译：喷墨头制造方法和制造喷头制造方法
公开(公告)号：WO2006001532A1
公开(公告)日：2006-01-05
申请号：PCT/JP2005/012268
申请日：2005-06-27
申请人： CANON KABUSHIKI KAISHA , OKANO, Akihiko , SHIBA, Shoji , ISHIKURA, Hiroe
发明人： OKANO, Akihiko , SHIBA, Shoji , ISHIKURA, Hiroe
IPC分类号： B41J2/16
CPC分类号： B41J2/1603 , B41J2/1631 , B41J2/1639 , B41J2/1645
摘要： A method of manufacturing an ink jet head includes a process of forming a photodegradable positive type resist layer on a substrate having energy generating elements, a process of forming a structure which becomes an ink flow path by exposing and developing the photodegradable positive type resist layer, a process of coating the substrate having said structure with a negative type resist layer, a process of forming ink discharge ports in the negative type resist layer, and process of forming the ink flow path by removing said structure, wherein the photodegradable positive type resist layer includes an acrylic copolymer composition, containing at least a unit obtained from (meta) acrylic ester and further containing a unit obtained from (meta) acrylic acid. The acrylic copolymer composition contains the (meta) acrylic acid unit at a proportion of 5 to 30 weigth %, and weigth average molecular weigth of the acrylic copolymer ranges from 50000 to 300000.
摘要翻译：制造喷墨头的方法包括在具有能量产生元件的基底上形成可光降解的正型抗蚀剂层的方法，通过曝光和显影可光降解的正型抗蚀剂层形成成为油墨流动路径的结构的工艺，用负型抗蚀剂层涂布具有所述结构的基板的工艺，在负型抗蚀剂层中形成墨水排出口的工艺以及通过去除所述结构形成油墨流动路径的工艺，其中可光降解的正型抗蚀剂层包括丙烯酸共聚物组合物，其至少含有由（甲基）丙烯酸酯获得的单元，并且还含有由（甲基）丙烯酸获得的单元。丙烯酸类共聚物组合物含有比例为5〜30重量％的（甲基）丙烯酸单元，丙烯酸系共聚物的平均分子量优选为50000〜300000。

3. 发明申请

WO2006001530A3 LIQUID DISCHARGE HEAD MANUFACTURING METHOD, AND LIQUID DISCHARGE HEAD OBTAINED USING THIS METHOD 审中-公开
公开(公告)号：WO2006001530A3
公开(公告)日：2006-01-05
申请号：PCT/JP2005/012266
申请日：2005-06-27
申请人： CANON KABUSHIKI KAISHA , KUBOTA, Masahiko , SUZUKI, Takumi , SATO, Tamaki , KANRI, Ryoji , HATTA, Maki , ASAI, Kazuhiro , SHIBA, Shoji , HINO, Etsuko , ISHIKURA, Hiroe , OKANO, Akihiko
发明人： KUBOTA, Masahiko , SUZUKI, Takumi , SATO, Tamaki , KANRI, Ryoji , HATTA, Maki , ASAI, Kazuhiro , SHIBA, Shoji , HINO, Etsuko , ISHIKURA, Hiroe , OKANO, Akihiko
IPC分类号： B41J2/16
摘要： According to the present invention, a method for manufacturing a liquid discharge head includes the steps of depositing a solid layer (3) for forming a flow path on a substrate (1) on which an energy generating element (2) is arranged to generate energy that is used to discharge liquid, forming, on the substrate where the solid layer is mounted, a coating layer (4) for coating the solid layer, forming a discharge port (7) used to discharge a liquid, through a photolithographic process, in the coating layer formed on the solid layer, and removing the solid layer to form a flow path (8) that communicates with the energy element and the discharge port, whereby a material used for the coating layer contains a cationically polymerizable chemical compound, cationic photopolymerization initiator and a inhibitor of cationic photopolymerization, and whereby a material of the solid layer that forms a boundary with a portion where the discharge port of the coating layer is formed contains a copolymer of methacrylic anhydride and methacrylate ester.

4. 发明申请

WO2004111732A1 PHOTOSENSITIVE RESIN COMPOSITION, INK-JET RECORDING HEAD USING THE COMPOSITION, AND PRODUCTION METHOD FOR THE SAME 审中-公开
标题翻译：感光性树脂组合物，使用该组合物的喷墨记录头及其制造方法
公开(公告)号：WO2004111732A1
公开(公告)日：2004-12-23
申请号：PCT/JP2004/008500
申请日：2004-06-10
申请人： CANON KABUSHIKI KAISHA , SHIBA, Shoji , ISHIKURA, Hiroe
发明人： SHIBA, Shoji , ISHIKURA, Hiroe
IPC分类号： G03F7/038
CPC分类号： B41J2/1631 , B41J2/1603 , B41J2/1626 , B41J2/1639 , G03F7/0387
摘要： A photosensitive resin composition usable in forming an ink-jet recording head, and a production method of the head. The composition comprises a polyetheramide resin having a repeating unit represented by the following formula (1), a compound that generates an acid by light irradiation, and a crosslinking agent for the polyetheramide resin which acts under acidic conditions. The composition improves adhesion between a substrate and an ink flow path forming member which constitute the ink-jet recording head.
摘要翻译：可用于形成喷墨记录头的感光性树脂组合物及其制造方法。该组合物包含具有下式（1）表示的重复单元的聚醚酰胺树脂，通过光照射产生酸的化合物和在酸性条件下起作用的聚醚酰胺树脂交联剂。该组合物提高了构成喷墨记录头的基板和油墨流路形成部件之间的粘合性。

5. 发明申请

WO2009078494A1 LIQUID DISCHARGE HEAD MANUFACTURING METHOD 审中-公开
标题翻译：液体放电头制造方法
公开(公告)号：WO2009078494A1
公开(公告)日：2009-06-25
申请号：PCT/JP2008/073673
申请日：2008-12-18
申请人： CANON KABUSHIKI KAISHA , SHIBA, Shoji , ISHIZUKA, Kazunari , TOMINAGA, Yasuaki
发明人： SHIBA, Shoji , ISHIZUKA, Kazunari , TOMINAGA, Yasuaki
IPC分类号： B41J2/16 , B41J2/05
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/1645
摘要： Provided is a method for manufacturing a liquid discharge head including a flow path forming member connected to a discharge port on or above a substrate, the method including: providing a layer containing a photosensitive resin on or above the substrate; providing a mask layer that enables reduction of transmission of light with a photosensitive wavelength of the photosensitive resin, at an area on the layer containing the photosensitive resin, the area corresponding to the flow path; performing exposure for the layer containing the photosensitive resin using the mask layer to make the layer containing the photosensitive resin be a pattern having the shape of the flow path; providing a layer that becomes the flow path forming member, so as to cover the pattern; forming the discharge port at a part of the layer that becomes the flow path forming member; and forming the flow path by removing the pattern.
摘要翻译：本发明提供一种液体排出头的制造方法，该排液头包括与基板上或上方的排出口连接的流路形成部件，该方法包括：在基板上或上方设置含有感光性树脂的层; 提供掩模层，其能够在包含感光性树脂的层的与该流路对应的面积的区域上，使感光性树脂的感光波长的光的透射率降低; 使用掩模层对含有感光性树脂的层进行曝光，使含有感光性树脂的层为具有流路形状的图案; 提供成为流路形成构件的层，以覆盖图案; 在成为流路形成构件的层的一部分处形成排出口; 并通过去除图案形成流路。

6. 发明申请

WO2006001530A2 LIQUID DISCHARGE HEAD MANUFACTURING METHOD, AND LIQUID DISCHARGE HEAD OBTAINED USING THIS METHOD 审中-公开
标题翻译：液体排放头制造方法和使用该方法获得的液体排放头
公开(公告)号：WO2006001530A2
公开(公告)日：2006-01-05
申请号：PCT/JP2005012266
申请日：2005-06-27
申请人： CANON KK , KUBOTA MASAHIKO , SUZUKI TAKUMI , SATO TAMAKI , KANRI RYOJI , HATTA MAKI , ASAI KAZUHIRO , SHIBA SHOJI , HINO ETSUKO , ISHIKURA HIROE , OKANO AKIHIKO
发明人： KUBOTA MASAHIKO , SUZUKI TAKUMI , SATO TAMAKI , KANRI RYOJI , HATTA MAKI , ASAI KAZUHIRO , SHIBA SHOJI , HINO ETSUKO , ISHIKURA HIROE , OKANO AKIHIKO
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1631 , B41J2002/14475 , G03F7/038
摘要： According to the present invention, a method for manufacturing a liquid discharge head includes the steps of depositing a solid layer for forming a flow path on a substrate on which an energy generating element is arranged to generate energy that is used to discharge liquid, forming, on the substrate where the solid layer is mounted, a coating layer for coating the solid layer, forming a discharge port used to discharge a liquid, through a photolithographic process, in the coating layer formed on the solid layer, and removing the solid layer to form a flow path that communicates with the energy element and the discharge port, whereby a material used for the coating layer contains a cationically polymerizable chemical compound, cationic photopolymerization initiator and a inhibitor of cationic photopolymerization, and whereby a material of the solid layer that forms a boundary with a portion where the discharge port of the coating layer is formed contains a copolymer of methacrylic anhydride and methacrylate ester.
摘要翻译：根据本发明，一种液体排出头的制造方法包括以下步骤：在其上布置能量产生元件的基板上沉积形成流路的固体层，以产生用于排出液体的能量，在固体层安装的基板上，涂布固体层的涂层，通过光刻工艺形成用于排出液体的排出口，形成在固体层上的涂层中，并将固体层除去形成与能量元件和排出口连通的流路，由此用于涂层的材料含有阳离子聚合化学化合物，阳离子光聚合引发剂和阳离子光聚合抑制剂，由此形成固体层的材料与形成涂层的排出口的部分的边界包含甲基丙烯酸酐的共聚物甲基丙烯酸酯和甲基丙烯酸酯。

7. 发明申请

WO2006001518A3 CATIONIC PHOTOPOLYMERIZABLE EPOXY RESIN COMPOSITION, MINUTE STRUCTURAL MEMBER USING THE SAME AND METHOD FOR MANUFACTURING MINUTE STRUCTURAL MEMBER 审中-公开
标题翻译：阳离子可光聚合的环氧树脂组合物，使用其的分钟结构成员和制造分钟结构成员的方法
公开(公告)号：WO2006001518A3
公开(公告)日：2007-08-09
申请号：PCT/JP2005012164
申请日：2005-06-24
申请人： CANON KK , SHIBA SHOJI , HATTA MAKI , HINO ETSUKO , ISHIKURA HIROE
发明人： SHIBA SHOJI , HATTA MAKI , HINO ETSUKO , ISHIKURA HIROE
IPC分类号： G03F7/038 , C08G59/00 , C08G59/18 , C08L63/00 , G03F7/004
CPC分类号： G03F7/038 , C08G59/18 , C08G59/40 , G03F7/0045 , G03F7/0046 , G03F7/40
摘要： A cationic photopolymerizable epoxy resin composition includes an epoxy resin, a cationic photopolymerization initiator, an inhibitor of cationic polymerization and a compound that has a fluoroalkyl group and also has a substituent at its terminal, with the substituent being allowed to cross-link react with the epoxy group of the epoxy resin. The cationic photopolymerizable epoxy resin composition further includes a thermal cationic polymerization catalyst.
摘要翻译：阳离子光聚合性环氧树脂组合物包括环氧树脂，阳离子光聚合引发剂，阳离子聚合抑制剂和具有氟烷基并且在其末端具有取代基的化合物，其中所述取代基被允许与环氧树脂的环氧树脂。阳离子光聚合性环氧树脂组合物还包含热阳离子聚合催化剂。

8. 发明申请

WO2006001534A3 METHOD FOR MANUFACTURING MINUTE STRUCTURE, METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD, AND LIQUID DISCHARGE HEAD 审中-公开
标题翻译：制造分钟结构的方法，制造液体排出头的方法和液体排出头
公开(公告)号：WO2006001534A3
公开(公告)日：2006-03-30
申请号：PCT/JP2005012270
申请日：2005-06-27
申请人： CANON KK , KUBOTA MASAHIKO , SUZUKI TAKUMI , SATO TAMAKI , KANRI RYOJI , HATTA MAKI , ASAI KAZUHIRO , SHIBA SHOJI , ISHIKURA HIROE , OKANO AKIHIKO
发明人： KUBOTA MASAHIKO , SUZUKI TAKUMI , SATO TAMAKI , KANRI RYOJI , HATTA MAKI , ASAI KAZUHIRO , SHIBA SHOJI , ISHIKURA HIROE , OKANO AKIHIKO
IPC分类号： G03F7/095 , B41J2/16
CPC分类号： B41J2/1603 , B41J2/1404 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1639 , B41J2/1645 , B41J2202/11 , G03F7/095 , Y10T29/49401
摘要： A method for manufacturing a minute structure comprises a step of forming a first ionizing radiation decomposing type positive type resist layer to be sensitized by an ionizing radiation of a first wavelength range, a step of forming a second ionizing radiation decomposing type positive type resist layer to be sensitized by an ionizing radiation of a second wavelength range on the first positive type photosensitive material layer, a step of forming a desired pattern in the above-mentioned second positive type photosensitive material layer as the upper layer by decomposing reaction without decomposing reaction of the above-mentioned first positive type photosensitive material layer, development using a developing solution, and then, a step of forming a desired pattern in the above-mentioned first positive type photosensitive material layer as the lower layer by decomposing reaction of a predetermined area development, whereby a pattern of a convex shape is manufactured in the substrate.
摘要翻译：微细结构的制造方法包括：形成第一电离辐射分解型正型抗蚀剂层的步骤，通过第一波长范围的电离辐射使其增感，第二电离辐射分解型正型抗蚀剂层的形成步骤通过第一正型感光材料层上的第二波长范围的电离辐射敏化，通过分解反应在上述第二正型感光材料层中形成所需图案的步骤，而不会分解反应上述第一正型感光材料层，使用显影液的显影，然后通过分解预定区域显影的反应在上述第一正型感光材料层中形成期望图案的步骤作为下层，从而在基板中制造凸形图案。

9. 发明申请

WO2006001534A2 METHOD FOR MANUFACTURING MINUTE STRUCTURE, METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD, AND LIQUID DISCHARGE HEAD 审中-公开
标题翻译：制造分钟结构的方法，制造液体排出头的方法和液体排出头
公开(公告)号：WO2006001534A2
公开(公告)日：2006-01-05
申请号：PCT/JP2005/012270
申请日：2005-06-27
申请人： CANON KABUSHIKI KAISHA , KUBOTA, Masahiko , SUZUKI, Takumi , SATO, Tamaki , KANRI, Ryoji , HATTA, Maki , ASAI, Kazuhiro , SHIBA, Shoji , ISHIKURA, Hiroe , OKANO, Akihiko
发明人： KUBOTA, Masahiko , SUZUKI, Takumi , SATO, Tamaki , KANRI, Ryoji , HATTA, Maki , ASAI, Kazuhiro , SHIBA, Shoji , ISHIKURA, Hiroe , OKANO, Akihiko
IPC分类号： G03F7/095
CPC分类号： B41J2/1603 , B41J2/1404 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1639 , B41J2/1645 , B41J2202/11 , G03F7/095 , Y10T29/49401
摘要： A method for manufacturing a minute structure comprises a step of forming a first ionizing radiation decomposing type positive type resist layer to be sensitized by an ionizing radiation of a first wavelength range, a step of forming a second ionizing radiation decomposing type positive type resist layer to be sensitized by an ionizing radiation of a second wavelength range on the first positive type photosensitive material layer, a step of forming a desired pattern in the above-mentioned second positive type photosensitive material layer as the upper layer by decomposing reaction without decomposing reaction of the above-mentioned first positive type photosensitive material layer, development using a developing solution, and then, a step of forming a desired pattern in the above-mentioned first positive type photosensitive material layer as the lower layer by decomposing reaction of a predetermined area, and development, whereby a pattern of a convex shape is manufactured in the substrate by executing the above-mentioned steps.
摘要翻译：微细结构的制造方法包括：形成第一电离辐射分解型正型抗蚀剂层的步骤，通过第一波长范围的电离辐射使其增感，第二电离辐射分解型正型抗蚀剂层的形成步骤通过第一正型感光材料层上的第二波长范围的电离辐射敏化，通过分解反应在上述第二正型感光材料层中形成所需图案的步骤，而不会分解反应上述第一正型感光材料层，使用显影液的显影，然后通过分解预定区域的反应在上述第一正型感光材料层中形成期望图案的步骤作为下层，以及显影，由此在底部制造出凸形的图案执行上述步骤。

10. 发明申请

WO2006001516A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING LEVEL DIFFERENCE PATTERN USING THE PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD OF PRODUCING INK JET HEAD 审中-公开
标题翻译：感光性树脂组合物，使用感光性树脂组合物形成水平差异图案的方法，以及制造喷墨头的方法
公开(公告)号：WO2006001516A1
公开(公告)日：2006-01-05
申请号：PCT/JP2005/012161
申请日：2005-06-24
申请人： CANON KABUSHIKI KAISHA , SHIBA, Shoji , ISHIKURA, Hiroe , OKANO, Akihiko
发明人： SHIBA, Shoji , ISHIKURA, Hiroe , OKANO, Akihiko
IPC分类号： G03F7/039
CPC分类号： B41J2/1631 , B41J2/1603 , B41J2/1639 , G03F7/0392 , G03F7/2024
摘要： To provide a positive type photosensitive resin composition, containing at least an acrylic resin having a carboxylic anhydride structure in a molecule, and a compound that generates an acid when irradiated with light.
摘要翻译：提供一种含有分子中至少含有羧酸酐结构的丙烯酸树脂的正型感光性树脂组合物和在照射时产生酸的化合物。

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