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    • 1. 发明申请
    • GAS WIPING APPARATUS
    • 气体擦拭装置
    • WO2007142397A9
    • 2008-10-30
    • PCT/KR2006005650
    • 2006-12-22
    • POSCOOH KI-JANGSHIN KI-TAEPARK HYOUNG-KUKSEON PAN-WOOKIM SANG-JOON
    • OH KI-JANGSHIN KI-TAEPARK HYOUNG-KUKSEON PAN-WOOKIM SANG-JOON
    • C23C2/16
    • C23C2/20
    • A gas wiping apparatus is a type of equipment for coating a molten metal such as molten zinc onto a steel strip. In the gas wiping apparatus, a lip defines a gas outlet for ejecting a high- pressure gas to adjust a coating amount on a steel strip. A metal chip removing unit includes a metal chip remover disposed inside the lip to remove metal chips from the gas outlet and a drive unit associated with the metal chip remover to drive the metal chip remover along the gas outlet. A metal deposition prevention layer is formed on a surface of the lip around the gas outlet, the metal deposition prevention layer having a surface roughness up to 0.5µm. Thus, the gas wiping apparatus including the metal chip removing unit or the metal deposition prevention layer prevents the steel strip from defective coating caused by the metal chip. The gas wiping apparatus effectively removes zinc chips (metal chips) which are splashed from the surface of the steel strip and deposited on a gas outlet. Also, the gas wiping apparatus has a metal chip removing unit installed therein and prevents a lip around the gas outlet from con¬ tamination by metal chips. This eventually prevents non-uniform coating of the steel strip and shortening in useful life of the apparatus due to the metal chips.
    • 气体擦拭装置是一种用于将诸如熔融锌的熔融金属涂覆到钢带上的设备。 在气体擦拭装置中,唇缘限定用于喷射高压气体的气体出口,以调节钢带上的涂覆量。 金属屑去除单元包括设置在唇部内部以从气体出口除去金属屑的金属屑去除器和与金属屑去除器相关联的驱动单元,以沿着气体出口驱动金属屑去除器。 金属沉积防止层形成在气体出口周围的唇缘的表面上,金属沉积防止层具有高达0.5μm的表面粗糙度。 因此,包括金属屑去除单元或金属沉积防止层的气体擦拭装置防止钢带由金属屑引起的有缺陷的涂层。 气体擦拭装置有效地除去从钢带表面飞溅并沉积在气体出口上的锌屑(金属屑)。 此外,气体擦拭装置具有安装在其中的金属屑去除单元,并且防止气体出口周围的唇缘被金属碎片分离。 这最终防止了钢带的不均匀涂覆,并且由于金属屑而缩短了设备的使用寿命。
    • 2. 发明申请
    • GAS WIPING APPARATUS
    • 气体擦拭装置
    • WO2007142396A1
    • 2007-12-13
    • PCT/KR2006/005583
    • 2006-12-19
    • POSCOLEE, Dong-EunCHO, Myung-JongSEON, Pan-WooKIM, Sang-Joon
    • LEE, Dong-EunCHO, Myung-JongSEON, Pan-WooKIM, Sang-Joon
    • C23C2/16
    • C23C2/20
    • A gas wiping apparatus is a type of equipment for coating a molten metal onto a steel strip. In the apparatus, a chamber, to which a high pressure gas is supplied, defines a multistage uniform pressure space. A lip support unit is associated with a front of the chamber to allow the high pressure gas to flow therethrough, the lip support unit supporting the apparatus against load. Upper and lower lips are associated with a front of the lip support unit to cooperatively define an outlet. The upper lip adjusts a gap of a gas outlet cooperatively with the lower lip, and can be easily installed in a lip support unit while adjusting the gap of the gas outlet stably. Also, edge over coating (EOC) of the steel strip can be prevented without an additional auxiliary nozzle. Meanwhile, a multistage uniform space is defined by the chamber and the lip, allowing the high pressure gas to be ejected more uniformly in response to a high pressure gas ejection profile. This eventually enhances coating quality of the steel strip.
    • 气体擦拭装置是将熔融金属涂覆到钢带上的一种设备。 在该装置中,供应高压气体的腔室限定了多级统一的压力空间。 唇支撑单元与腔室的前部相关联,以允许高压气体流过其中,唇支撑单元支撑装置抵抗负载。 上唇和下唇与唇支撑单元的前部相关联,以协作地限定出口。 上唇与下唇协调地调节气体出口的间隙,并且可以容易地安装在唇支撑单元中,同时稳定地调节气体出口的间隙。 此外,可以防止钢带的边缘涂覆(EOC),而无需附加辅助喷嘴。 同时,由腔室和唇缘限定多级均匀空间,从而允许高压气体响应于高压气体喷射曲线更均匀地喷出。 这最终提高了钢带的涂层质量。
    • 3. 发明申请
    • GAS WIPING APPARATUS
    • 气体擦拭装置
    • WO2007142397A1
    • 2007-12-13
    • PCT/KR2006/005650
    • 2006-12-22
    • POSCOOH, Ki-JangSHIN, Ki-TaePARK, Hyoung-KukSEON, Pan-WooKIM, Sang-Joon
    • OH, Ki-JangSHIN, Ki-TaePARK, Hyoung-KukSEON, Pan-WooKIM, Sang-Joon
    • C23C2/16
    • C23C2/20
    • A gas wiping apparatus is a type of equipment for coating a molten metal such as molten zinc onto a steel strip. In the gas wiping apparatus, a lip defines a gas outlet for ejecting a high- pressure gas to adjust a coating amount on a steel strip. A metal chip removing unit includes a metal chip remover disposed inside the lip to remove metal chips from the gas outlet and a drive unit associated with the metal chip remover to drive the metal chip remover along the gas outlet. A metal deposition prevention layer is formed on a surface of the lip around the gas outlet, the metal deposition prevention layer having a surface roughness up to 0.5D. Thus, the gas wiping apparatus including the metal chip removing unit or the metal deposition prevention layer prevents the steel strip from defective coating caused by the metal chip. The gas wiping apparatus effectively removes zinc chips (metal chips) which are splashed from the surface of the steel strip and deposited on a gas outlet. Also, the gas wiping apparatus has a metal chip removing unit installed therein and prevents a lip around the gas outlet from contamination by metal chips. This eventually prevents non-uniform coating of the steel strip and shortening in useful life of the apparatus due to the metal chips.
    • 气体擦拭装置是一种用于将诸如熔融锌的熔融金属涂覆到钢带上的设备。 在气体擦拭装置中,唇缘限定用于喷射高压气体的气体出口,以调节钢带上的涂覆量。 金属屑去除单元包括设置在唇部内部以从气体出口除去金属屑的金属屑去除器和与金属屑去除器相关联的驱动单元,以沿着气体出口驱动金属屑去除器。 在气体出口周围的表面上形成金属沉积防止层,金属沉积防止层的表面粗糙度高达0.5D。 因此,包括金属屑去除单元或金属沉积防止层的气体擦拭装置防止钢带由金属屑引起的有缺陷的涂层。 气体擦拭装置有效地除去从钢带表面飞溅并沉积在气体出口上的锌屑(金属屑)。 此外,气体擦拭装置具有安装在其中的金属屑去除单元,并且防止气体出口周围的唇缘被金属屑污染。 这最终防止了钢带的不均匀涂覆,并且由于金属屑而缩短了设备的使用寿命。