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    • 2. 发明申请
    • COMPOSITE COATINGS FOR OXIDATION PROTECTION
    • 用于氧化保护的复合涂层
    • WO2011113139A1
    • 2011-09-22
    • PCT/CA2011/000269
    • 2011-03-15
    • NATIONAL RESEARCH COUNCIL OF CANADASHAIGAN, NimaQU, Wei
    • SHAIGAN, NimaQU, Wei
    • C23C30/00B32B15/00C23C28/02C25D5/50
    • C23C8/02C25D5/12C25D5/50C25D15/00
    • The invention disclosed relates to an oxidized metal matrix composite coated substrate, comprising a substrate made of a material selected from the group consisting of a chromia- forming Fe, Ni and/or Co based alloy containing an amount of Cr ranging from 16 to 30 wt%, and an oxide- dispersion strengthened Cr-based alloy and a plain Cr-based alloy, and an oxidized metal matrix composite coating comprising at least two metals and reactive element oxide particles in the form of a tri-layer scale on the substrate surface comprising an inner chromia layer, an intermediate layer of a spinel solid solution formed by Cr and one or more of the deposited metals selected from the group consisting of Ni, Co, Cu, Mn, Fe and Zn and a mixture thereof, and an electrically conductive top layer comprising oxides of one or more deposited metals selected from the group consisting of Ni, Co, Cu, Fe, Mn, Zn and a mixture thereof, which is substantially free from Cr ions, and wherein one or more of such layers contain particles of doped or undoped oxides of a rare earth metal selected from the group consisting of Ce, Y, La, Hf, Zr, Gd and a mixture thereof.
    • 所公开的本发明涉及一种氧化金属基复合涂层基材,其包含由选自铬含量为Fe,Ni和/或Co基合金的材料制成的基材,其含量范围为16-30wt% 和氧化物分散强化的Cr基合金和普通的Cr基合金,以及氧化金属基复合涂层,其在基材表面上包含至少两种金属和三层标度形式的反应性元素氧化物颗粒 包括内部氧化铬层,由Cr形成的尖晶石固溶体的中间层和选自Ni,Co,Cu,Mn,Fe和Zn的一种或多种沉积金属及其混合物,以及电 导电顶层,其包含选自Ni,Co,Cu,Fe,Mn,Zn的一种或多种沉积金属的氧化物及其混合物,其基本上不含Cr离子,并且其中一种或多种 含有选自Ce,Y,La,Hf,Zr,Gd及其混合物的稀土金属的掺杂或未掺杂氧化物的颗粒。
    • 8. 发明申请
    • NOVEL PULSED POWER SUPPLY FOR PLASMA ELECTROLYTIC DEPOSITION AND OTHER PROCESSES
    • 用于等离子体电沉积和其他工艺的新型脉冲电源
    • WO2011003178A1
    • 2011-01-13
    • PCT/CA2010/000987
    • 2010-07-06
    • NATIONAL RESEARCH COUNCIL OF CANADASUN, JianQIAN, WeiminQU, WeiHUI, Shiqiang
    • SUN, JianQIAN, WeiminQU, WeiHUI, Shiqiang
    • C23C4/00C23C24/00H02M7/00
    • C25D11/00C25D11/026
    • The invention disclosed is a pulsed power supply for plasma electrolytic deposition (PED) for generating pulsed direct current for controlled interruption of the arcing process of PED, comprising a power distribution and relay logic (PDRL) module; a positive AC/DC (alternating current/direct current) power module; a negative AC/DC power module; a power pulse output module; and a computer control and data acquisition module, wherein the power pulse output module further comprises a pulse controller and an insulated-gate bipolar transistor (IGBT) power switch, and wherein the PDRL module is operatively coupled to both the positive and negative AC/DC power modules and the respective positive and negative power modules are then operatively coupled to both the power pulse output module and the computer control and data acquisition module, and wherein the computer control and data acquisition module controls both the respective positive and negative power modules and the power pulse output module to generate pulsed DC for controlled interruption of the arcing process.
    • 本发明公开了一种用于等离子体电解沉积(PED)的脉冲电源,用于产生脉冲直流电流,用于控制中断PED的电弧过程,包括功率分配和继电器逻辑(PDRL)模块; 正交流/直流(交流/直流)电源模块; 负极AC / DC电源模块; 电源脉冲输出模块; 以及计算机控制和数据采集模块,其中所述功率脉冲输出模块还包括脉冲控制器和绝缘栅双极晶体管(IGBT)功率开关,并且其中所述PDRL模块可操作地耦合到所述正和负AC / DC两者 功率模块和相应的正极和负极功率模块然后可操作地耦合到功率脉冲输出模块和计算机控制和数据采集模块两者,并且其中计算机控制和数据采集模块控制相应的正负电源模块和 功率脉冲输出模块产生脉冲直流,用于控制中断电弧过程。