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    • 9. 发明申请
    • SUBSTRATE HEATING APPARATUS
    • 基座加热装置
    • WO2009008673A3
    • 2009-03-05
    • PCT/KR2008004060
    • 2008-07-10
    • JUSUNG ENG CO LTDPARK WON SEOKKIM KI DUCKLEE YONG HYUNCHOI SEUNG DAE
    • PARK WON SEOKKIM KI DUCKLEE YONG HYUNCHOI SEUNG DAE
    • H01L21/324
    • H01L21/67115
    • A substrate heating apparatus is provided. The substrate heating apparatus includes a chamber, a substrate supporting unit configured to support at least one substrate where a thin film is formed on the top surface thereof, and at least one heating unit disposed in a region adjacent to the rear surface of the substrate. The heating unit includes a plurality of reflecting units arranged under the substrate, at least one lamp heating unit disposed inside the plurality of reflecting units, and a short- wavelength blocking layer disposed on the lamp heating unit. By providing the lamp heating unit under the substrate where the thin film or pattern is formed on the top surface, and supplying heat energy to the rear surface of the substrate, it is possible to prevent the degradation in efficiency of the thin film, such as degradation of the thin film formed on the top surface of the substrate due to the heat source or the peeling of the thin film due to the temperature deviation between the substrate and the thin film. Furthermore, the heat energy is widely spread out at the central region of the rear surface of the substrate, and the heat energy is focused at the edge region of the substrate, thereby heating the large-sized substrate uniformly.
    • 提供了一种基板加热装置。 基板加热装置包括:室,基板支撑单元,被配置为支撑在其顶表面上形成薄膜的至少一个基板;以及设置在与基板的后表面相邻的区域中的至少一个加热单元。 加热单元包括布置在基板下方的多个反射单元,设置在多个反射单元内的至少一个灯加热单元和设置在灯加热单元上的短波长阻挡层。 通过在顶表面上形成有薄膜或图案的基板的下方设置灯加热单元,并且向基板的后表面供给热能,可以防止薄膜的效率降低,例如 由于热源引起的在基板的顶表面上形成的薄膜的劣化或由于基板和薄膜之间的温度偏差导致的薄膜的剥离。 此外,热能在基板的后表面的中心区域广泛分布,并且热能聚焦在基板的边缘区域,从而均匀地加热大尺寸基板。