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    • 1. 发明申请
    • A COMPACT HIGH EFFICIENCY ELECTROSTATIC PRECIPITATOR FOR DROPLET AEROSOL COLLECTION
    • 用于喷雾气溶胶收集的紧凑型高效静电抑制剂
    • WO0030755A2
    • 2000-06-02
    • PCT/US9927718
    • 1999-11-22
    • MSP CORP
    • LIU BENJAMIN Y HSUN JAMES J
    • F01M13/04B03C3/00B03C3/017B03C3/02B03C3/06B03C3/155B03C3/16B03C3/40B03C3/41B03C3/45B03C3/49B03C3/70F01N3/02
    • B03C3/41B03C3/017B03C3/16B03C3/70B03C2201/10F01N3/02Y02T10/20Y10S55/19
    • An electrostatic precipitator (10, 82, 98) has a high voltage electrode assembly (14, 100, 120, 214) including multiple wire segments (36, 77, 113A, 126, 228) that are positioned within a surrounding electrically conductive media (26, 114, 129, 200) having a central axis and wherein the electrode assembly (14, 100, 120, 214) has a plurality of wire lengths (36, 77, 113A, 126, 228) positioned to extend in a direction along the longitudinal axis of the conductive media (26, 114, 129, 200), and are arranged to thave a substantially longer total length than the length of extension along the longitudinal axis. An aerosol containing droplets is passed into the interior of the conductive media (26, 114, 129, 200), and they are charged with a high voltage. The conductive media (26, 114, 129, 200) is at a substantially lower or different voltage from the high voltage. The particles charged by the electrode assembly (14, 100, 120, 214) pass along or through the conductive media and are precipitated by the conductive media (26, 114, 129, 200).
    • 静电除尘器(10,82,98)具有高电压电极组件(14,100,120,214),其包括多个线段(36,77,113A,126,228),所述多个线段定位在周围的导电介质 具有中心轴线,并且其中所述电极组件(14,100,120,214)具有多个线材长度(36,77,113A,126,228),所述多个线材长度定位成沿着沿着 导电介质(26,114,129,200)的纵向轴线,并且被设置成比沿着纵向轴线的延伸长度大得多的总长度。 含有液滴的气溶胶被传送到导电介质(26,114,129,200)的内部,并且它们以高电压充电。 导电介质(26,114,129,200)处于与高电压基本上较低或不同的电压。 由电极组件(14,100,120,214)充电的颗粒沿导电介质传导或穿过导电介质,并被导电介质(26,114,129,200)沉淀。
    • 2. 发明申请
    • COMPACT, HIGH-EFFICIENCY CONDENSATION NUCLEUS COUNTER
    • 紧凑,高效冷凝核子计数器
    • WO03091708A2
    • 2003-11-06
    • PCT/US0309820
    • 2003-04-02
    • MSP CORP
    • LIU BENJAMIN Y H
    • G01N15/00G01N15/06
    • G01N15/065
    • A condensation nucleus counter (20, 90) has a series of flow passageways forming a flow path, including a first passageway (24, 30, 42, 54, 56, 106, 110, 118, 122) for carrying the gas stream having the particles to be detected which is heated, so that the gas stream is heated prior to entering a saturator (30, 110). The saturator (30, 110) is positioned as part of the flow path (24, 30, 42, 54, 56, 106, 110, 118) for the gas stream and is made of a porous material having a portion immersed in a liquid working fluid (36). The porous material is selected so that capillary action will move the liquid working fluid (36, 114) along the length of the saturator (30, 110). Vapor from the working liquid will be transferred to the gas stream as it moves through the saturator (30). The gas stream then passes to a condenser or cooler (54, 122) that reduces the temperature of the gas stream and causes the working fluid vapor to condense on the particles in the gas stream to form droplets. A particle detector (58, 132), such as a light scattering particle detector (58, 132), then receives the gas stream and detects the droplets that have been formed.
    • 冷凝核计数器(20,90)具有形成流路的一系列流动通道,其包括用于承载气流的第一通道(24,30,42,54,56,106,110,118,122),所述第一通道具有 要被检测的被加热的颗粒,使得气体流在进入饱和器(30,110)之前被加热。 饱和器(30,110)被定位为用于气流的流动路径(24,30,32,44,56,106,110,118)的一部分,并且由多孔材料制成,该多孔材料具有浸入液体中的部分 工作流体(36)。 选择多孔材料使得毛细作用将沿着饱和器(30,110)的长度移动液体工作流体(36,114)。 当工作液体流过饱和器(30)时,来自工作液体的蒸汽将被转移到气流中。 气流然后传递到冷凝器或冷却器(54,122),该冷凝器或冷却器降低气流的温度并使工作流体蒸气冷凝在气流中的颗粒上以形成液滴。 然后,诸如光散射粒子检测器(58,132)的粒子检测器(58,132)接收气流并检测已经形成的液滴。
    • 4. 发明申请
    • FINE DROPLET ATOMIZER FOR LIQUID PRECURSOR VAPORIZATION
    • 用于液体前驱体气化的细小液滴雾化器
    • WO2011097238A3
    • 2011-12-01
    • PCT/US2011023362
    • 2011-02-01
    • MSP CORPLIU BENJAMIN Y HDINH THUC MMA YAMIN
    • LIU BENJAMIN Y HDINH THUC MMA YAMIN
    • H01L21/205
    • B05B17/04C23C16/4486
    • The present disclosure relates to an apparatus 10 and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus 10 includes a mechanism to control the rate of liquid flow through the apparatus 10, the mechanism including a piezoelectric actuator 240 to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source 70 such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
    • 本公开涉及用于形成用于汽化和随后在基板上的薄膜沉积的微滴气溶胶的设备10和方法。 设备10包括控制液体流过装置10的速率的机构,该机构包括用于调节液体流动速率的压电致动器240和雾化机构从压缩气体源70抽取气体,使得当气体源 与液体结合时,液体被雾化以形成悬浮在气体中的液滴,由此形成适于随后在基板上的薄膜沉积的液滴气雾剂。 该方法包括从压缩气体源抽取气体并从液体源抽取液体。 液体和气体以同轴流动关系或径向流动关系或径向和同轴流动之间的角度关系联结,其中气体与液体接合以形成适于汽化和随后在基底上的薄膜沉积的液滴。
    • 5. 发明申请
    • CASCADE IMPACTOR WITH INDIVIDUALLY DRIVEN IMPACTOR PLATES
    • 带有单独驱动冲击板的级联冲击器
    • WO2005015171A2
    • 2005-02-17
    • PCT/US2004025461
    • 2004-08-06
    • MSP CORP
    • MARPLE VIRGIL ALUI BENJAMIN Y H
    • G01N1/22G01N15/02
    • G01N15/0255G01N1/2208G01N2015/0261
    • A cascade impactor (10) has a series of vertically stacked impactor housing sections (12,14,16). Each of the impactor housing sections (12,14,16) has an upper portion that supports a motor (50) for driving an impactor plate (58) that is positioned below a nozzle plate (38B,40B,42B) through which flow passes. Each housing section (12,14,16) also has an outlet passageway (30) leading to a lower impactor chamber (24) for the next in a series of impactor chambers (24), except the last outlet passageway opens through a filter (68) to exhaust. The impactor chambers (24) are defined by a skirt (22) that seals on the neck (18) of the next downstream housing section (12, 14, 16) The impactor plates (58) are each driven by a separate motor (50), and held onto a hub (52) on the motor output shaft with a magnetic coupling (54,56) so the impactor plates (58) can be removed when the housing sections (12,14,16) are separated.
    • 级联冲击器(10)具有一系列垂直堆叠的冲击器外壳部分(12,14,16)。 每个冲击器壳体部分(12,14,16)具有支撑用于驱动冲击板(58)的马达(50)的上部,该冲击板位于流动通过的喷嘴板(38B,40B,42B)的下方 。 除最后的出口通道通过过滤器(24)外,每个壳体部分(12,14,16)还具有通向下部冲击器腔室(24)的出口通道(30),用于下一个冲击器腔室(24) 68)排气。 冲击器腔室(24)由密封在下一个下游壳体部分(12,14,16)的颈部(18)上的裙部(22)限定。冲击器板(58)每个都由单独的电动机(50 ),并通过磁性联轴器(54,56)保持在马达输出轴上的轮毂(52)上,从而当壳体部分(12,14,16)分离时,冲击板(58)可被移除。
    • 6. 发明申请
    • INTEGRATED SYSTEM FOR VAPOR GENERATION AND THIN FILM DEPOSITION
    • 用于蒸汽发生和薄膜沉积的集成系统
    • WO2011119952A3
    • 2012-01-26
    • PCT/US2011029987
    • 2011-03-25
    • MSP CORPLIU BENJAMIN Y HMA YAMINDINH THUC
    • LIU BENJAMIN Y HMA YAMINDINH THUC
    • H01L21/205
    • F01K17/04Y10T137/0318Y10T137/0379Y10T137/7761Y10T137/8593
    • An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet 130 section in fluid communication with a downstream vaporization chamber 120 section. The inlet 130 section comprises a gas inlet for receiving gas from a gas source 180 through a gas flow sensor 202 and a gas flow control valve 230 and a liquid inlet 150 for receiving liquid from a liquid source 220 through a liquid flow sensor 210 and a liquid flow control valve 230. An electronic controller 600 controls the gas and liquid flow control valves 230 thereby controlling the rates of gas and liquid flow into the inlet 130 section to generate vapor in the downstream vaporization chamber 120 section for thin film deposition on the substrate.
    • 用于从液体前体产生蒸气的设备和方法用于薄膜沉积在基底上,包括与下游蒸发室120部分流体连通的入口130部分。 入口130部分包括气体入口,用于通过气体流量传感器202和气体流量控制阀230从气体源180接收气体,以及用于通过液体流量传感器210从液体源220接收液体的液体入口150和 液体流量控制阀230.电子控制器600控制气体和液体流量控制阀230,从而控制进入入口130部分的气体和液体流量的速率,以在下游蒸发室120部分中产生蒸汽,用于在基板上进行薄膜沉积 。
    • 9. 发明申请
    • METHOD AND APPARATUS FOR GENERATING CHARGED PARTICLES
    • 用于产生充电颗粒的方法和装置
    • WO2006044725A3
    • 2006-11-09
    • PCT/US2005037132
    • 2005-10-18
    • MSP CORPDICK WILLIAMLIU BENJAMIN Y H
    • DICK WILLIAMLIU BENJAMIN Y H
    • B05D1/06B05B5/025
    • H01L21/67028B05D1/06
    • A method for establishing a calibrating standard for wafer inspection includes depositing solid ionized particles of a known size range with an aerosol onto a wafer. The method also includes depositing particles onto a wafer in a deposition chamber by using an aerosol stream and the solid particles suspended in a gas; ionizing the aerosol stream with a negative or positive charge polarity or both by passing the aerosol stream through a non-radioactive ionizer 40 to produce charged particles and supplying such aerosol stream to the deposition chamber. An apparatus 110 for producing charged particles includes an atomizer 10 and a non-radioactive ionizer 40 in fluid communication with each other. The apparatus 110 may also include an electrospray droplet generator for producing an aerosol with dry-solid particles and an ionizer that ionizes the molecules of the gas. The apparatus may also include a generator for generating an aerosol with particles suspended in the gas with a non-radioactive ionizer 40 that ionizes the gas in the aerosol causing the aerosol particles to be charged. The apparatus 110 may further include an electrostatic classifier for classifying the charged particles to a selected size range.
    • 用于建立晶片检查的校准标准的方法包括将已知尺寸范围的固体离子化颗粒与气溶胶沉积在晶片上。 该方法还包括通过使用气溶胶流和悬浮在气体中的固体颗粒将颗粒沉积在沉积室中的晶片上; 通过使气溶胶流通过非放射性电离器40以产生带电粒子并将这种气溶胶流供应到沉积室,使负极或正电荷极性或二者电离气溶胶流。 用于产生带电粒子的装置110包括彼此流体连通的雾化器10和非放射性离子发生器40。 装置110还可以包括用于产生具有干固体颗粒的气雾剂的电喷雾液滴发生器和使气体分子电离的离子发生器。 该装置还可以包括用于产生具有悬浮在气体中的颗粒的气溶胶的发生器,该非放射性离子发生器40使气溶胶中的气体电离,导致气溶胶颗粒被带电。 装置110还可以包括用于将带电粒子分类到选定尺寸范围的静电分选机。
    • 10. 发明申请
    • HIGH-PERFORMANCE VAPORIZER FOR LIQUID-PRECURSOR AND MULTI-LIQUID-PRECURSOR VAPORIZATION IN SEMICONDUCTOR THIN FILM DEPOSITION
    • 用于液体前体的高性能蒸发器和半导体薄膜沉积中的多液体前驱体蒸发
    • WO2005068682A3
    • 2006-02-23
    • PCT/US2004041944
    • 2004-12-15
    • MSP CORPLIU BENJAMIN Y HMA YAMIN
    • LIU BENJAMIN Y HMA YAMIN
    • B01B1/00B05B7/00B05B12/14C23C16/448
    • C23C16/4486B01B1/005
    • A vaporization system (50, 92, 92a, 92b, 180) for thin film formation and for introducing vapors into a deposition chamber (26, 84, 130) for depositing films onto a semi-conductor surface has a vaporization chamber (52, 116, 192) that is selectively provided with at least two different, that is selectively provided with at least two different, separate, precursor liquids (54A, 54B, 54C, 110A, 110B, 186) carried in a gas stream that may be a single carrier gas, or a selected one of a plurality of carrier gases from gas sources (12, 62A, 62B, 62C, 98A, 98B, 184). When the liquids being introduced are likely to be subject to thermal decomposition from contact with high temperature surfaces, an atomizer (94, 142A, 142B, 154A, 154B, 182) is used at the inlet of the vaporization chamber (52, 116, 192) to provide an aerosol to the vaporization chamber (52, 116, 192) from one or more individual carrier gases from gas sources 12, 62A, 62B, 62C, 98A, 98B for simultaneous or sequential introduction into the vaporization chamber (52, 116, 192). The vaporization chamber (52, 116, 192) may be designed to insure complete vaporization by incorporating a recirculating gas flow through heated passageways (198, 124, 202, 212) before the vaporized gas/vapor mixture exits the vaporization chamber (52, 116, 192).
    • 用于薄膜形成和用于将蒸气引入用于将膜沉积到半导体表面上的沉积室(26,84,130)中的蒸发系统(50,92,92a,92b,180)具有蒸发室(52,116 ,192),其被选择性地设置有至少两个不同的,其被选择性地设置有携带在气流中的至少两种不同的分离的前体液体(54A,54B,54C,110A,110B,186) 载气或来自气体源(12,62A,62B,62C,98A,98B,184)的多种载气中的选定的一种。 当引入的液体可能经受与高温表面接触的热分解时,在蒸发室(52,116,192)的入口处使用雾化器(94,142A,142B,154A,154B,182) )以从气源12,62A,62B,62C,98A,98B的一种或多种单独的载气提供气化至气化室(52,116,192),以同时或顺序地引入蒸发室(52,116) ,192)。 蒸发室(52,116,192)可以被设计成通过在蒸发的气体/蒸汽混合物离开蒸发室(52,116)之前通过加热通道(198,124,202,212)并入再循环气体流来确保完全蒸发 ,192)。