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1. 发明申请

WO2004086466A3 SYSTEM AND METHOD FOR MONITORING CONTAMINATION 审中-公开
标题翻译：用于监测污染的系统和方法
公开(公告)号：WO2004086466A3
公开(公告)日：2004-12-23
申请号：PCT/US2004008944
申请日：2004-03-24
申请人： EXTRACTION SYSTEMS INC , KISHKOVICH OLEG P , KINKEAD DEVON , PHELPS MARK C , GOODWIN WILLIAM M , RUEDE DAVID J , GRAYFER ANATOLY , PETERSEN ROBERT
发明人： KISHKOVICH OLEG P , KINKEAD DEVON , PHELPS MARK C , GOODWIN WILLIAM M , RUEDE DAVID J , GRAYFER ANATOLY , PETERSEN ROBERT
IPC分类号： B01D53/22 , G01N1/22 , G01N1/40 , H01L21/00
CPC分类号： B01D53/22 , G01N1/2214 , G01N1/2247 , G01N1/405 , H01L21/67253
摘要： The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.
摘要翻译：本发明提供了一种用于监测半导体处理系统中的污染物的无源采样系统和方法。在一个实施例中，该无源采样系统包括与提供来自半导体处理系统的气体流的采样管线流体连通的收集装置。收集装置构造成通过在气流中扩散一种或多种污染物进行采样。

2. 发明申请

WO2005021134A1 REACTIVE GAS FILTER 审中-公开
标题翻译：反应性气体过滤器
公开(公告)号：WO2005021134A1
公开(公告)日：2005-03-10
申请号：PCT/US2004/028708
申请日：2004-09-02
申请人： EXTRACTION SYSTEMS, INC. , SHELLHAMMER, Carly , RUEDE, David, J. , HALPERIN, Jeff , GAUDREAU, John , GOODWIN, William, M. , KINKEAD, Devon , GRAYFER, Anatoly , LOBERT, Jürgen, Michael
发明人： SHELLHAMMER, Carly , RUEDE, David, J. , HALPERIN, Jeff , GAUDREAU, John , GOODWIN, William, M. , KINKEAD, Devon , GRAYFER, Anatoly , LOBERT, Jürgen, Michael
IPC分类号： B01D46/30
CPC分类号： B01D46/30 , B01D53/02 , B01D2253/102
摘要： In preferred embodiments, the invention provides a gas filter for a reactive gas used in semiconductor processing tools and processes that are sensitive to molecular contamination. The reactive gas filters of the invention have improved pressure drop and can supply an output gas stream having concentrations of less than about 1 ppbv for both ammonia and sulfur dioxide for an input gas stream with ammonia and sulfur dioxide concentrations, respectively, of no greater than about 10 ppbv and 5 ppbv. In one aspect the invention provides a reactive gas filter with an improved pressure drop that can supply an output gas stream having concentrations of less than about 1 ppbv for both ammonia and sulfur dioxide for an input gas stream with ammonia and sulfur dioxide concentrations, respectively, of no greater than about 10 ppbv and 5 ppbv, using a filter media volume of no greater than about 0.5 liters.
摘要翻译：在优选的实施方案中，本发明提供了用于半导体加工工具和对分子污染敏感的方法的反应气体的气体过滤器。本发明的反应性气体过滤器具有改善的压降，并且可以为氨和二氧化硫的氨和二氧化硫浓度的输入气流分别提供浓度小于约1ppbv的输出气流，分别为氨和二氧化硫浓度不大于约10 ppbv和5 ppbv 在一个方面，本发明提供了具有改进的压降的反应性气体过滤器，其可以分别为具有氨和二氧化硫浓度的输入气流提供氨和二氧化硫的浓度小于约1ppbv的输出气流，不大于约10ppbv和5ppbv，使用不大于约0.5升的过滤介质体积。

3. 发明申请

WO0185308A8 FILTERS EMPLOYING BOTH ACIDIC POLYMERS AND PHYSICAL-ABSORPTION MEDIA 审中-公开
标题翻译：使用双酸性聚合物和物理吸收介质的过滤器
公开(公告)号：WO0185308A8
公开(公告)日：2002-09-06
申请号：PCT/US0114655
申请日：2001-05-04
申请人： EXTRACTION SYSTEMS INC , KISHKOVICH OLEG P , KINKEAD DEVON , GRAYFER ANATOLY , GOODWIN WILLIAM M , RUEDE DAVID
发明人： KISHKOVICH OLEG P , KINKEAD DEVON , GRAYFER ANATOLY , GOODWIN WILLIAM M , RUEDE DAVID
IPC分类号： B01D53/04 , B01D53/06 , B01J20/26
CPC分类号： B01D53/0407 , B01D53/0454 , B01D2253/102 , B01D2253/202 , B01D2253/308 , B01D2257/406 , B01D2258/0216 , B01D2259/4009 , B01J20/20 , B01J20/261 , B33Y80/00 , Y10S95/901
摘要： A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalcohols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to absorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.
摘要翻译：过滤器包括至少两种不同的吸附介质。首先，使用多孔并包含酸性官能团的化学吸收介质用于从半导体制造中使用的气氛以及需要未受污染的高质量气态环境的其它工艺中除去分子碱，包括氨，有机胺，酰亚胺和氨基醇。第二，物理吸附介质能够吸收可冷凝的污染物，特别是沸点大于150摄氏度的污染物。物理吸附介质可以包括未处理的活性炭。

4. 发明申请

WO2001085308A3 FILTERS EMPLOYING BOTH ACIDIC POLYMERS AND PHYSICAL-ABSORPTION MEDIA 审中-公开
公开(公告)号：WO2001085308A3
公开(公告)日：2001-11-15
申请号：PCT/US2001/014655
申请日：2001-05-04
申请人： EXTRACTION SYSTEMS, INC. , KISHKOVICH, Oleg, P. , KINKEAD, Devon , GRAYFER, Anatoly , GOODWIN, William, M. , RUEDE, David
发明人： KISHKOVICH, Oleg, P. , KINKEAD, Devon , GRAYFER, Anatoly , GOODWIN, William, M. , RUEDE, David
IPC分类号： B01D53/04
摘要： A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalcohols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to absorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.

5. 发明申请

WO1995019828A1 AIR FILTERING 审中-公开
标题翻译：空气过滤
公开(公告)号：WO1995019828A1
公开(公告)日：1995-07-27
申请号：PCT/US1994000752
申请日：1994-01-25
申请人： EXTRACTION SYSTEMS, INC. , KINKEAD, Devon, A. , REZUKE, Robert, W. , HIGLEY, John, K.
发明人： EXTRACTION SYSTEMS, INC.
IPC分类号： B01D24/00
CPC分类号： B32B5/26 , B01D39/08 , B01D39/1623 , B01D46/0001 , B01D46/0036 , B01D46/4263 , B01D2239/0407 , B01D2239/0464 , B01D2239/065 , B01D2239/1241 , B01J20/28004 , B01J20/28011 , B01J20/28028 , B01J20/2803 , B01J20/28033 , B01J20/28052 , B32B5/022 , B32B2262/0276 , B32B2310/0825 , B32B2327/06 , D04H1/407 , D04H1/435 , D04H1/485 , D04H1/556 , D04H1/559 , D04H1/593 , D04H1/64 , D04H13/00 , F24F3/161
摘要： A method of forming a vapor-absorptive air filter comprising a non-woven carrier material and adsorbent particles wherein heating and calendering of the carrier material distributes adsorbent particles through a substantial depth. The chemical air filter (14) can be employed directly upstream of a clean room HEPA filter (24) in an air handling system (12, 22). The chemical filter includes a matrix formed of a large multiplicity of synthetic fibers and activated carbon is distributed throughout the web, bound in the interstices of the matrix, preventing loss to the air of particles in quantity substantially detrimental to the performance of the HEPA filter. The activated carbon being selected to remove a predetermined gas-phase contaminant from the air source. A non-off gassing filter casing may easily be installed into existing clean air handling systems.
摘要翻译：一种形成包含非织造载体材料和吸附剂颗粒的吸气空气过滤器的方法，其中载体材料的加热和压延将吸附剂颗粒分布在相当深度上。化学空气过滤器（14）可以直接在空气处理系统（12,22）中的洁净室HEPA过滤器（24）的上游。化学过滤器包括由大量合成纤维形成的基质，并且活性炭分布在整个幅材上，结合在基质的空隙中，防止颗粒空气的损失量基本上不利于HEPA过滤器的性能。选择活性炭以从空气源中除去预定的气相污染物。一个非关闭的放气过滤器外壳可以很容易地安装到现有的清洁空气处理系统中。

6. 发明申请

WO2004086466A2 SYSTEM AND METHOD FOR MONITORING CONTAMINATION 审中-公开
标题翻译：用于监测污染的系统和方法
公开(公告)号：WO2004086466A2
公开(公告)日：2004-10-07
申请号：PCT/US2004/008944
申请日：2004-03-24
申请人： EXTRACTION SYSTEMS, INC. , KISHKOVICH, Oleg, P. , KINKEAD, Devon , PHELPS, Mark, C. , GOODWIN, William, M. , RUEDE, David, J. , GRAYFER, Anatoly , PETERSEN, Robert
发明人： KISHKOVICH, Oleg, P. , KINKEAD, Devon , PHELPS, Mark, C. , GOODWIN, William, M. , RUEDE, David, J. , GRAYFER, Anatoly , PETERSEN, Robert
IPC分类号： H01L21/00
CPC分类号： B01D53/22 , G01N1/2214 , G01N1/2247 , G01N1/405 , H01L21/67253
摘要： The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.
摘要翻译：本发明提供了用于监测半导体处理系统中的污染物的被动采样系统和方法。在一个实施例中，该被动采样系统包括与提供来自半导体处理系统的气体流动的采样管线流体连通的收集装置。收集装置配置成通过扩散气体流中的一种或多种污染物来进行采样。

7. 发明申请

WO2003026774A1 SYSTEM AND METHOD FOR DETERMINING AND CONTROLLING CONTAMINATION 审中-公开
标题翻译：用于确定和控制污染的系统和方法
公开(公告)号：WO2003026774A1
公开(公告)日：2003-04-03
申请号：PCT/US2002/030232
申请日：2002-09-24
申请人： EXTRACTION SYSTEMS, INC. , KISHKOVICH, Oleg, P. , KINKEAD, Devon , PHELPS, Mark, C. , GOODWIN, William, M.
发明人： KISHKOVICH, Oleg, P. , KINKEAD, Devon , PHELPS, Mark, C. , GOODWIN, William, M.
IPC分类号： B01D53/00
CPC分类号： H01L21/67253 , B01D53/22 , Y10T29/41
摘要： A preferred embodiment includes a method for monitoring the performance of a filter positioned in an airstream in a semiconductor processing system. The method includes sampling the airstream at a location upstream of the filter to detect the molecular contaminants present in the airstream; identifying a target species of the contaminants upstream; selecting a non-polluting species of a contaminant having a concentration greater than a concentration of the target species; measuring the non-polluting species in the airstream at a plurality of locations; and determining the performance of the filter with respect to the target species from measurements of the non-polluting species. The plurality of locations includes a location downstream of the filter and at a location within the filter. Further, the method.for monitoring includes generating a numerical representation of a chromatogram of the airstream sampled at a location upstream of the filter. The method for monitoring includes the non-polluting species having a molecular weight that is lower than that of the target species. In addition, in the method for monitoring the step of sampling includes collecting refractory compounds, high molecular weight compounds and low molecular weight compounds. The filter comprises absorptive material.
摘要翻译：优选实施例包括用于监测位于半导体处理系统中的空气流中的过滤器的性能的方法。该方法包括在过滤器上游的位置取样气流，以检测气流中存在的分子污染物; 识别上游污染物的目标物种; 选择浓度大于目标物质浓度的污染物的无污染物种; 在多个位置测量气流中的无污染物种; 并且从非污染物种的测量确定相对于目标物种的过滤器的性能。多个位置包括过滤器下游的位置和过滤器内的位置。此外，用于监测的方法包括产生在过滤器上游的位置处采样的气流的色谱图的数字表示。监测方法包括分子量低于目标物种的分子量的无污染物种。此外，在采样步骤的监测方法中，包括收集耐火化合物，高分子量化合物和低分子量化合物。该过滤器包括吸收材料。

8. 发明申请

WO2006083290A3 SYSTEM AND METHOD FOR REMOVING CONTAMINANTS 审中-公开
标题翻译：去除污染物的系统和方法
公开(公告)号：WO2006083290A3
公开(公告)日：2007-04-19
申请号：PCT/US2005020090
申请日：2005-06-07
申请人： ENTEGRIS INC , SERGI JOHN E , GAUDREAU JOHN , GOODWIN WILLIAM , KISHKOVICH OLEG P , KINKEAD DEVON A
发明人： SERGI JOHN E , GAUDREAU JOHN , GOODWIN WILLIAM , KISHKOVICH OLEG P , KINKEAD DEVON A
IPC分类号： B01D53/04 , B01D46/12 , F24F3/16
CPC分类号： B01D46/10 , B01D46/0013 , B01D46/429 , B01D46/521 , B01D53/0446 , B01D53/0454 , B01D2258/0216 , B01D2259/402 , B01D2273/30 , B33Y80/00
摘要： The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.
摘要翻译：本发明提供了一种系统和方法，其包括用于从半导体处理装置中的气体中除去污染物的装置，其可以包括其中设置有至少两个平行的过滤器级的过滤器单元。过滤器级被设计成去除流过它们的气体中存在的至少一部分污染物。该装置还可以包括用于在过滤级之间分配气流的流量控制器。在一个实施例中，控制器可以由扩散板组成。本发明还提供了一种用于本发明的系统或方法中的气体流量控制的采样管孔。在另一个实施例中，用于从洁净室中的气体中去除污染物的装置包括具有至少两个平行的过滤器阶段的过滤器单元，其用于在气体通过设备时去除气体中的一部分污染物。

9. 发明申请

WO2006083290A2 SYSTEM AND METHOD FOR REMOVING CONTAMINANTS 审中-公开
标题翻译：去除污染物的系统和方法
公开(公告)号：WO2006083290A2
公开(公告)日：2006-08-10
申请号：PCT/US2005/020090
申请日：2005-06-07
申请人： ENTEGRIS, INC. , SERGI, John, E. , GAUDREAU, John , GOODWIN, William , KISHKOVICH, Oleg, P. , KINKEAD, Devon, A.
发明人： SERGI, John, E. , GAUDREAU, John , GOODWIN, William , KISHKOVICH, Oleg, P. , KINKEAD, Devon, A.
IPC分类号： B01D53/04 , B01D46/12 , F24F3/16
CPC分类号： B01D46/10 , B01D46/0013 , B01D46/429 , B01D46/521 , B01D53/0446 , B01D53/0454 , B01D2258/0216 , B01D2259/402 , B01D2273/30 , B33Y80/00
摘要： The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.
摘要翻译：本发明提供了一种系统和方法，其包括用于从半导体处理装置中的气体中除去污染物的装置，其可以包括其中设置有至少两个平行的过滤器级的过滤器单元。过滤器级被设计成去除流过它们的气体中存在的至少一部分污染物。该装置还可以包括用于在过滤级之间分配气流的流量控制器。在一个实施例中，控制器可以由扩散板组成。本发明还提供了一种用于本发明的系统或方法中的气体流量控制的采样管孔。在另一个实施例中，用于从洁净室中的气体中去除污染物的装置包括具有至少两个平行过滤器阶段的过滤器单元，用于在气体通过设备时去除气体中的一部分污染物。

10. 发明申请

WO0185308A2 FILTERS EMPLOYING BOTH ACIDIC POLYMERS AND PHYSICAL-ADSORPTION MEDIA 审中-公开
标题翻译：使用两性酸性聚合物和物理吸收介质的过滤器
公开(公告)号：WO0185308A2
公开(公告)日：2001-11-15
申请号：PCT/US0114655
申请日：2001-05-04
申请人： EXTRACTION SYSTEMS INC , KISHKOVICH OLEG P , KINKEAD DEVON , GRAYFER ANATOLY , GOODWIN WILLIAM M , RUEDE DAVID
发明人： KISHKOVICH OLEG P , KINKEAD DEVON , GRAYFER ANATOLY , GOODWIN WILLIAM M , RUEDE DAVID
IPC分类号： B01D53/04 , B01D53/06 , B01J20/26
CPC分类号： B01D53/0407 , B01D53/0454 , B01D2253/102 , B01D2253/202 , B01D2253/308 , B01D2257/406 , B01D2258/0216 , B01D2259/4009 , B01J20/20 , B01J20/261 , B33Y80/00 , Y10S95/901
摘要： A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalcohols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to absorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.
摘要翻译：过滤器包括至少两种不同的吸附介质。首先，使用多孔并包含酸性官能团的化学吸收介质用于从半导体制造中使用的气氛以及需要未受污染的高质量气态环境的其它工艺中除去分子碱，包括氨，有机胺，酰亚胺和氨基醇。第二，物理吸附介质能够吸收可冷凝的污染物，特别是沸点大于150摄氏度的污染物。物理吸附介质可以包括未处理的活性炭。

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