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    • 4. 发明申请
    • APPARATUS FOR CONTROLLING DRUG INFUSION AND METHOD USING THE SAME
    • 用于控制药物输注的装置和使用该药物的方法
    • WO2008140182A1
    • 2008-11-20
    • PCT/KR2008/001334
    • 2008-03-10
    • KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGYKIM, Jin-SungSONG, Chang-WooHAN, Sang-Seop
    • KIM, Jin-SungSONG, Chang-WooHAN, Sang-Seop
    • A61M5/168
    • A61M5/172A61M5/16813A61M2205/52
    • A drug infusion control apparatus and method that can improve precision of experiments and thus improve reliability of data obtained from experiments on experimental animals by automatically calculating an infusion amount of a drug in accordance with weights of the experimental animals included in a variety of experimental groups and infusing the calculated amount of the drug into the experimental animals are provided. The drug infusion control method includes calculating and storing a drug infusion amount using weight data of experimental animals according to a preset formula, loading data on the drug infusion amount data that is stored, determining an operation time of an opening/ closing valve, receiving an operation signal from an infusion switch, opening the opening/closing valve for a predetermined time, and repeatedly infusing a drug in response to the loaded data by a preset value.
    • 一种药物输注控制装置和方法,其可以通过根据实验组中包含的实验动物的重量自动计算药物的输注量,从而提高实验精度,从而提高实验动物实验获得的数据的可靠性, 将计算量的药物注入实验动物中。 药物输注控制方法包括根据预先设定的公式计算并存储使用实验动物的重量数据的药物输注量,对存储的药物输注量数据加载数据,确定打开/关闭阀的操作时间,接收 来自输液开关的操作信号,打开/关闭阀预定时间,并且响应于所加载的数据反复地输入药物预设值。
    • 8. 发明申请
    • MICROFABRICATION PROCESS FOR ELECTROSPRAY IONIZATION MASS SPECTROMETRY EMITTERS
    • 用于电喷雾离子化大分子光谱发射体的微生物过程
    • WO02055990A8
    • 2003-02-27
    • PCT/US0200705
    • 2002-01-09
    • MUSC FOUND FOR RES DEVKNAPP DANIEL RKIM JIN-SUNG
    • KNAPP DANIEL RKIM JIN-SUNG
    • G01N30/60G01N30/72H01J49/04H01L21/00
    • G01N30/7266G01N30/6095G01N2030/6013H01J49/0018H01J49/167G01N30/466
    • Microfabricated emitters for electrospray ionization mass spectrometry (ESI-MS) are produced using a soft lithography process. A substrate (6) is coated with a photo resist material (8). A photo mask (20) is positioned over the photo resist material (8) to selectively permit or prevent exposure of the photo resist material (8) to radiation, such as UV radiation. The resulting wafer is developed so that the portion of the photo resist that was not exposed to radiation is removed and the wafer forms a mold. Using a barrier or dam (10) on the photo resist patterned wafer, a suitable material such as polydimethylsiloxane (PDMS) is then prepared as a two-part material which is then poured over the wafer thus forming one layer of the emitter (18). The adjoining layer may be similarly formed with the top layer and bottom layer joined, such as by the application of oxygen plasma. The substrate may be coated with a second layer of photo resist material after radiation exposure of the first layer, but prior to development of the first layer, so as to provide more complex shapes.
    • 使用软光刻工艺制造用于电喷雾离子化质谱(ESI-MS)的微型发射体。 基板(6)涂覆有光致抗蚀剂材料(8)。 光掩模(20)位于光致抗蚀剂材料(8)的上方,以选择性地允许或防止光致抗蚀剂材料(8)暴露于诸如UV辐射的辐射。 显影所得的晶片使得不暴露于辐射的光致抗蚀剂的部分被去除并且晶片形成模具。 在光致抗蚀剂图案化晶片上使用屏障或阻挡层(10),然后制备诸如聚二甲基硅氧烷(PDMS)的合适材料作为两部分材料,然后将其倒在晶片上,从而形成一层发射体(18) 。 相邻的层可以类似地形成有顶层和底层连接,例如通过施加氧等离子体。 在第一层的辐射暴露之后,但是在第一层的显影之前,可以用第二层光致抗蚀剂材料涂覆基底,从而提供更复杂的形状。
    • 9. 发明申请
    • MICROFABRICATION PROCESS FOR ELECTROSPRAY IONIZATION MASS SPECTROMETRY EMITTERS
    • 电喷雾电离质谱发射体的微成型工艺
    • WO02055990A3
    • 2002-11-07
    • PCT/US0200705
    • 2002-01-09
    • MUSIC FOUNDATION FOR RES DEVKNAPP DANIEL RKIM JIN-SUNG
    • KNAPP DANIEL RKIM JIN-SUNG
    • G01N30/60G01N30/72H01J49/04H01L21/00
    • G01N30/7266G01N30/6095G01N2030/6013H01J49/0018H01J49/167G01N30/466
    • Microfabricated emitters for electrospray ionization mass spectrometry (ESI-MS) are produced using a soft lithography process. A substrate (6) is coated with a photo resist material (8). A photo mask (20) is positioned over the photo resist material (8) to selectively permit or prevent exposure of the photo resist material (8) to radiation, such as UV radiation. The resulting wafer is developed so that the portion of the photo resist that was not exposed to radiation is removed and the wafer forms a mold. Using a barrier or dam (10) on the photo resist patterned wafer, a suitable material such as polydimethylsiloxane (PDMS) is then prepared as a two-part material which is then poured over the wafer thus forming one layer of the emitter (18). The adjoining layer may be similarly formed with the top layer and bottom layer joined, such as by the application of oxygen plasma. The substrate may be coated with a second layer of photo resist material after radiation exposure of the first layer, but prior to development of the first layer, so as to provide more complex shapes.
    • 使用软光刻工艺生产用于电喷雾电离质谱(ESI-MS)的微制造发射体。 衬底(6)涂覆有光刻胶材料(8)。 将光掩模(20)定位在光致抗蚀剂材料(8)上以选择性地允许或防止光致抗蚀剂材料(8)暴露于诸如UV辐射之类的辐射。 将所得晶片显影,以便除去未暴露于辐射的光致抗蚀剂部分并且晶片形成模具。 在光致抗蚀剂图案化的晶片上使用阻挡物或挡板(10),然后将合适的材料(例如聚二甲基硅氧烷(PDMS))制备为两部分材料,然后将其倾倒在晶片上,从而形成一层发射器(18) 。 邻接层可以类似地形成,例如通过施加氧等离子体来连接顶层和底层。 在辐射暴露第一层之后,但在第一层显影之前,可以用第二层光致抗蚀剂材料涂覆衬底,以提供更复杂的形状。