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1. 发明申请

WO2008038886A1 PLASMA ARC TORCH AND SCRUBBER USING THE SAME 审中-公开
标题翻译：等离子弧焊和使用它的橡胶
公开(公告)号：WO2008038886A1
公开(公告)日：2008-04-03
申请号：PCT/KR2007/002808
申请日：2007-06-11
申请人： KOREA PIONICS CO., LTD. , MOON, SUNG MIN , KIM, JAE KYU , KIM, DAE YONG , OH, HEE GEUN
发明人： MOON, SUNG MIN , KIM, JAE KYU , KIM, DAE YONG , OH, HEE GEUN
IPC分类号： H05H1/32 , H05H1/26 , B23K10/00
CPC分类号： H05H1/48 , H05H2001/3452
摘要： Provided are a plasma arc torch and a scrubber using the same. The plasma arc torch includes a cathode rod for discharging a thermal electron depending on an applied voltage, a first anode electrode spaced apart from the cathode rod by a predetermined distance and generating arc discharge when the voltage is applied, and a second anode electrode disposed under the first anode electrode, maintaining transfer arc discharge generated from the cathode rod and the first anode electrode to process waste gas, and having better thermal resistance than the first anode electrode. In addition, the scrubber using a plasma arc torch includes the plasma arc torch, a chamber for providing a closed space under the plasma arc torch to purify the waste gas and having a discharge port for discharging the purified waste gas, and a cooling part coupled with a lower side of the chamber and cooling the chamber.
摘要翻译：提供等离子弧焊炬和使用其的洗涤器。等离子弧焊炬包括用于根据施加的电压放电热电子的阴极棒，与阴极棒隔开预定距离的第一阳极电极，并且当施加电压时产生电弧放电，以及设置在第二阳极电极下方的第二阳极电极第一阳极电极，保持从阴极棒和第一阳极电极产生的转移电弧放电来处理废气，并且具有比第一阳极电极更好的热阻。此外，使用等离子弧焊炬的洗涤器包括等离子弧炬，用于在等离子体电弧炬之下提供封闭空间的室，以净化废气并具有用于排出净化废气的排出口，以及冷却部件与室的下侧并冷却室。

2. 发明申请

WO1994014795A1 QUINAZOLINE DERIVATIVES 审中-公开
标题翻译：喹诺酮衍生物
公开(公告)号：WO1994014795A1
公开(公告)日：1994-07-07
申请号：PCT/KR1993000096
申请日：1993-10-29
申请人： YUHAN CORPORATION , LEE, Jong, Wook , CHAE, Jeong, Seok , KIM, Chang, Seop , KIM, Jae, Kyu , LIM, Dae, Sung , LEE, Jeong, Won , SHON, Moon, Kyu , JO, Dae, Woong
发明人： YUHAN CORPORATION
IPC分类号： C07D401/04
CPC分类号： C07D401/04
摘要： The present invention relates to a quinazoline compound represented by formula (I) and their pharmaceutically acceptable salts, wherein: R1 and R2 are, independently of each other, hydrogen or a C1-C4 alkyl group; R3 is hydrogen or halogen; R4, R5, R6, R7, R8 and R9, which may be the same or different, are hydrogen or C1-C4 alkyl group, cycloproproyl, or R5 and R6 may form a cyclopenthyl or cyclohexyl ring together; R10 is hydrogen, a C1-C4 alkyl, C1-C4 alkoxy, hydroxy C1-C4 alkoxy or methylthiomethyloxy group.
摘要翻译：本发明涉及由式（I）表示的喹唑啉化合物及其药学上可接受的盐，其中：R 1和R 2彼此独立地为氢或C 1 -C 4烷基; R3是氢或卤素; R 4，R 5，R 6，R 7，R 8和R 9可以相同或不同，为氢或C 1 -C 4烷基，环丙基或R 5和R 6可以一起形成环戊基或环己基环; R 10是氢，C 1 -C 4烷基，C 1 -C 4烷氧基，羟基C 1 -C 4烷氧基或甲硫基甲氧基。

3. 发明申请

WO2007074993A1 DEGASSING APPARATUS HAVING DUPLEX VACUUM VESSEL 审中-公开
标题翻译：具有双重真空容器的脱水装置
公开(公告)号：WO2007074993A1
公开(公告)日：2007-07-05
申请号：PCT/KR2006/005592
申请日：2006-12-20
申请人： POSCO ENGINEERING & CONSTRUCTION CO., LTD. , JUNG, Byung-Kyu , KAL, Han-Yung , SON, Jin-Ho , SHIN, Young-Sik , JIN, Uel-Duk , JIN, Kyung-Bae , KIM, Jae-Kyu , LEE, Chai-Rok
发明人： JUNG, Byung-Kyu , KAL, Han-Yung , SON, Jin-Ho , SHIN, Young-Sik , JIN, Uel-Duk , JIN, Kyung-Bae , KIM, Jae-Kyu , LEE, Chai-Rok
IPC分类号： C21C7/10
CPC分类号： C21C7/10
摘要： A degassing apparatus having duplex vacuum vessels for removing impurity gases from molten steel by backflow of molten steel thereby homogenizing molten steel composition. The apparatus includes duplex vacuum vessels of first and second vacuum vessels fixedly arranged at a predetermined interval to a floor which is provided horizontally at a predetermined height from a bottom; first and second ladle carriages arranged to run on first and second rails, respectively, to reciprocate between a treatment position directly under the first and second vacuum vessels and a tapping position where refined molten steel is tapped, each of the first and second ladle carriage loaded with a corresponding one of first and second ladles; and first and second lifting cylinders each for raising and lowering each of the first and second ladles in the treatment position so that a bottom end of each of the first and second vacuum vessels is immersed by molten steel in each of the first and second ladles. The apparatus can remove limiting factors of suspending a continuous vacuum degassing refining process and thus prolong lifetime of the vacuum vessel and save manufacturing cost.
摘要翻译：具有双重真空容器的脱气装置，用于通过钢水回流从钢水中除去杂质，从而使钢水组合物均质化。该装置包括：第一和第二真空容器的双重真空容器，其以预定的间隔固定地布置在水平地从底部预定高度设置的地板上; 第一和第二钢包滑架被布置成分别在第一和第二轨道上运行以在直接位于第一和第二真空容器下方的处理位置与精炼钢水被攻丝的攻丝位置之间往复运动，第一和第二钢包托架中的每一个加载与第一和第二个水桶中的相应的一个; 以及第一和第二提升缸，每个用于在处理位置中升高和降低第一和第二堆的每个，使得第一和第二真空容器中的每一个的底端由钢水浸入第一和第二堆的每一个中。该装置可以消除悬浮连续真空脱气精炼过程的限制因素，从而延长真空容器的使用寿命并节省制造成本。

4. 发明申请

WO1996005177A1 NOVEL PYRIMIDINE DERIVATIVES AND PROCESSES FOR THE PREPARATION THEREOF 审中-公开
标题翻译：新型吡咯烷酮衍生物及其制备方法
公开(公告)号：WO1996005177A1
公开(公告)日：1996-02-22
申请号：PCT/KR1995000105
申请日：1995-08-10
申请人： YUHAN CORPORATION , LEE, Jong, Wook , CHAE, Jeong, Seok , KIM, Chang, Seop , KIM, Jae, Kyu , LIM, Dae, Sung , SHON, Moon, Kyu , CHOI, Yeon, Shik , LEE, Sang, Ho
发明人： YUHAN CORPORATION
IPC分类号： C07D239/42
CPC分类号： C07D401/04 , C07D495/04
摘要： The present invention relates to novel pyrimidine derivatives of formulae (I-1) and (I-2) and pharmaceutically acceptable salts thereof which possess an excellent anti-secretory activity, pharmaceutical compositions containing same as an active ingredient, their novel intermediates, and processes for the preparation thereof. In said formulae, R4 and R5, which may be the same or different, are independently hydrogen or a C1-C3 alkyl group, or jointly form a cyclopentyl or cyclohexyl ring; A is a group of formula (II) wherein R1 and R2 are, independently of each other, hydrogen or a C1-C3 alkyl group, and R3 is hydrogen, a C1-C3 alkyl group or a halogen; and B is 1-(substituted)-1,2,3,4-tetrahydroisoquinolin-2-yl of formula (III-1) or 7-(substituted)-4,5,6,7-tetrahydrothieno[2,3-c]pyridin-6-yl of formula (III-2) wherein R6 is hydrogen or a C1-C3 alkyl group.
摘要翻译：本发明涉及具有优异抗分泌活性的式（I-1）和（I-2）的新颖嘧啶衍生物及其药学上可接受的盐，其含有作为活性成分的药物组合物，它们的新中间体和方法用于制备。在所述式中，R 4和R 5可以相同或不同，独立地为氢或C 1 -C 3烷基，或共同形成环戊基或环己基环; A是式（II）的基团，其中R 1和R 2彼此独立地为氢或C 1 -C 3烷基，且R 3为氢，C 1 -C 3烷基或卤素; 和B是式（III-1）的1-（取代的）-1,2,3,4-四氢异喹啉-2-基或7-（取代的）-4,5,6,7-四氢噻吩并〔2,3- c]式（III-2）的吡啶-6-基，其中R 6是氢或C 1 -C 3烷基。

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