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1. 发明申请

WO2004034752A1 MULTI-COIL INDUCTION PLASMA TORCH FOR SOLID STATE POWER SUPPLY 审中-公开
标题翻译：用于固态电源的多线圈感应等离子体转子
公开(公告)号：WO2004034752A1
公开(公告)日：2004-04-22
申请号：PCT/CA2003/001537
申请日：2003-10-06
申请人： UNIVERSITE DE SHERBROOKE , BOULOS, Maher, I. , JUREWICZ, Jerzy, W.
发明人： BOULOS, Maher, I. , JUREWICZ, Jerzy, W.
IPC分类号： H05H1/30
CPC分类号： H05H1/30
摘要： An induction plasma torch comprises a tubular torch body, a gas distributor head located at the proximal end of the torch body for supplying at least one gaseous substance into the chamber within the torch body, a higher frequency power supply connected to a first induction coil mounted coaxial to the tubular torch body, a lower frequency solid state power supply connected to a plurality of second induction coils mounted coaxial to the tubular torch body between the first induction coil and the distal end of this torch body. The first induction coil provides the inductive energy necessary to ignite the gaseous substance to form a plasma. The second induction coils provide the working energy necessary to operate the plasma torch. The second induction coils can be connected to the solid state power supply in series and/or in parallel to match the impedance of this solid state power supply.
摘要翻译：感应等离子体焰炬包括管状炬体，位于炬体本体的近端处的气体分配器头，用于将至少一种气态物质供应到炬体内的腔室中;更高频率的电源，连接到第一感应线圈安装与管状割炬本体同轴的低频固态电源，连接到与第一感应线圈和该割炬本体的远端之间的管状割炬本体同轴安装的多个第二感应线圈。第一感应线圈提供点燃气态物质形成等离子体所需的感应能量。第二感应线圈提供操作等离子体焰炬所需的工作能量。第二感应线圈可以串联和/或并联连接到固态电源以匹配该固态电源的阻抗。

2. 发明申请

WO02086179A3 PLASMA SYNTHESIS OF TITANIUM DIOXIDE NANOPOWDER AND POWDER DOPING AND SURFACE MODIFICATION PROCESS 审中-公开
标题翻译：二氧化钛纳米粒子和粉末掺杂和表面改性过程的等离子体合成
公开(公告)号：WO02086179A3
公开(公告)日：2003-08-21
申请号：PCT/CA0200470
申请日：2002-04-03
申请人： TEKNA PLASMA SYSTEMS INC , BOULOS MAHER I , JUREWICZ JERZY W , NESSIM CHRISTINE A ABDEL MESSI
发明人： BOULOS MAHER I , JUREWICZ JERZY W , NESSIM CHRISTINE A ABDEL MESSI
IPC分类号： C01B13/14 , B01J19/08 , B01J19/12 , C01B13/20 , C01B13/22 , C01B13/28 , C01B13/30 , C01G23/07 , C09C1/36
CPC分类号： B82Y30/00 , B01J19/088 , B01J19/129 , B01J2219/0871 , B01J2219/0875 , B01J2219/0879 , B01J2219/0894 , C01B13/30 , C01G23/07 , C01G23/075 , C01P2002/50 , C01P2002/52 , C01P2002/72 , C01P2004/64 , C01P2006/12 , C09C1/36 , C09C1/3607 , C09C1/3669
摘要： A process and apparatus for the synthesis of metal oxide nanopowder from a metal compound vapour is presented. In particular a process and apparatus for the synthesis of TIO2 nanopowder from TICI4 is disclosed. The metal compound vapour is reacted with an oxidising gas in an electrically induced RF frequency plasma thus forming a metal oxide vapour. The metal oxide vapour is rapidly cooled using a highly turbulent gas quench zone which quickly halts the particle growth process, yielding a substantial reduction in the size of metal oxide particles formed. The metal compound vapour can also be reacted with a doping agent to create a doped metal oxide nanopowder. Additionally, a process and apparatus for the inline synthesis of a coated metal oxide is disclosed wherein the metal oxide particles are coated with a surface agent after being cooled in a highly turbulent gas quench zone.
摘要翻译：提出了一种从金属化合物蒸气合成金属氧化物纳米粉末的方法和装置。特别地公开了一种用于从TICI4合成TIO2纳米粉末的方法和装置。金属化合物蒸汽与电感应RF频率等离子体中的氧化气体反应，从而形成金属氧化物蒸气。使用快速停止颗粒生长过程的高度湍流的气体骤冷区，快速冷却金属氧化物蒸汽，从而显着减少形成的金属氧化物颗粒的尺寸。金属化合物蒸气也可以与掺杂剂反应以产生掺杂的金属氧化物纳米粉末。此外，公开了一种用于在线合成涂覆的金属氧化物的方法和装置，其中在高度湍流的气体骤冷区域中冷却后，金属氧化物颗粒被表面剂涂覆。

3. 发明申请

WO2004052778A3 PLASMA SYNTHESIS OF METAL OXIDE NANOPOWDER AND APPARATUS THEREFOR 审中-公开
标题翻译：金属氧化物纳米粒子的等离子体合成及其设备
公开(公告)号：WO2004052778A3
公开(公告)日：2004-11-18
申请号：PCT/CA0301881
申请日：2003-12-01
申请人： TEKNA PLASMA SYSTEMS INC , BOULOS MAHER I , JUREWICZ JERZY W , NESSIM CHRISTINE A ABDEL MESSI
发明人： BOULOS MAHER I , JUREWICZ JERZY W , NESSIM CHRISTINE A ABDEL MESSI
IPC分类号： C01B13/14 , B01J19/08 , B01J19/12 , C01B13/20 , C01B13/22 , C01B13/28 , C01B13/30 , C01G23/07 , C09C1/36 , C22B4/00 , C22B4/08 , C22B34/12
CPC分类号： B82Y30/00 , B01J19/088 , B01J19/129 , B01J2219/0871 , B01J2219/0875 , B01J2219/0879 , B01J2219/0894 , C01B13/30 , C01G23/07 , C01G23/075 , C01P2002/50 , C01P2002/52 , C01P2002/72 , C01P2004/64 , C01P2006/12 , C09C1/36 , C09C1/3607 , C09C1/3669 , C22B4/005 , C22B4/08 , C22B34/129
摘要： A process and apparatus for the synthesis of metal oxide nanopowder from a metal compound vapour is presented. In particular a process and apparatus for the synthesis of Ti02 nanopowder from TiCl4 is disclosed. The metal compound vapour is reacted with an oxidizing gas in electrically induced RF frequency plasma thus forming a metal oxide vapour. The metal oxide vapour is rapidly cooled using a highly turbulent gas quench zone which quickly halts the particle growth process, yielding a substantial reduction in the size of metal oxide particles formed compared with known processes. The metal compound vapour can also react with a doping agent to create a doped metal oxide nanopowder. Additionally, a process and apparatus for the inline synthesis of a coated metal oxide is disclosed wherein the metal oxide particles are coated with a surface agent after being cooled in a highly turbulent gas quench zone.
摘要翻译：提出了一种从金属化合物蒸气合成金属氧化物纳米粉末的方法和装置。公开了一种用于从TiCl4合成TiO 2纳米粉末的方法和装置。金属化合物蒸汽与电感RF频率等离子体中的氧化气体反应，从而形成金属氧化物蒸气。使用快速停止颗粒生长过程的高度湍流气体骤冷区快速冷却金属氧化物蒸汽，与已知方法相比，形成金属氧化物颗粒的尺寸显着减小。金属化合物蒸汽也可以与掺杂剂反应以产生掺杂的金属氧化物纳米粉末。此外，公开了一种用于在线合成涂覆的金属氧化物的方法和装置，其中在高度湍流的气体骤冷区域中冷却之后，金属氧化物颗粒被表面剂涂覆。

4. 发明申请

WO2004074540A1 PROCESS AND APPARATUS FOR THE MAUFACTURE OF A SPUTTERING TARGET 审中-公开
标题翻译：溅射目标的制作过程和装置
公开(公告)号：WO2004074540A1
公开(公告)日：2004-09-02
申请号：PCT/CA2004/000251
申请日：2004-02-23
申请人： TEKNA PLASMA SYSTEMS INC. , BOULOS, Maher, I. , JUREWICZ, Jerzy, W.
发明人： BOULOS, Maher, I. , JUREWICZ, Jerzy, W.
IPC分类号： C23C14/34
CPC分类号： C23C4/12 , C23C4/134 , C23C4/185 , C23C14/3414 , H01J37/3491
摘要： A process for the manufacture of sputtering target comprises the steps of i) providing a substrate; ii) plasma melting of a material selected to form the sputtering target, yielding droplets of molten material; and iii) deposition of the droplets onto the substrate, yielding a sputtering target comprised of the coated layer of the material on the substrate. In some application, it might be preferable that the substrate be a temporary substrate and iv) to join the coated temporary target via its coated layer to a permanent target backing material; and v) to remove the temporary substrate, yielding a sputtering target comprised of the coated layer of the material on the permanent target backing material. The plasma deposition step is carried out at atmospheric pressure or under soft vacuum conditions using, for example, d.c. plasma spraying, d.c. transferred arc deposition or induction plasma spraying. The process is simple and does not require subsequent operation on the resulting target.
摘要翻译：制造溅射靶的方法包括以下步骤：i）提供衬底; ii）选择用于形成溅射靶的材料的等离子体熔融，产生熔融材料的液滴; 以及iii）将液滴沉积到基底上，产生由在基底上的材料的涂层组成的溅射靶。在一些应用中，可能优选的是基材是临时基材，和iv）通过其涂层将涂覆的临时靶材连接到永久性靶材背衬材料; 以及v）去除所述临时衬底，在所述永久性靶材背衬材料上产生由所述材料的涂层组成的溅射靶。等离子体沉积步骤在大气压或软的真空条件下进行，例如使用直流等离子喷涂，直流转移电弧沉积或感应等离子体喷涂。该过程很简单，不需要对结果目标进行后续操作。

5. 发明申请

WO2002086179A2 PLASMA SYNTHESIS OF TITANIUM DIOXIDE NANOPOWDER AND POWDER DOPING AND SURFACE MODIFICATION PROCESS 审中-公开
标题翻译：二氧化钛纳米粒子和粉末掺杂和表面改性过程的等离子体合成
公开(公告)号：WO2002086179A2
公开(公告)日：2002-10-31
申请号：PCT/CA2002/000470
申请日：2002-04-03
申请人： TEKNA PLASMA SYSTEMS INC. , BOULOS, Maher, I. , JUREWICZ, Jerzy, W. , NESSIM, Christine, A., Abdel, Messih
发明人： BOULOS, Maher, I. , JUREWICZ, Jerzy, W. , NESSIM, Christine, A., Abdel, Messih
IPC分类号： C22F
CPC分类号： B82Y30/00 , B01J19/088 , B01J19/129 , B01J2219/0871 , B01J2219/0875 , B01J2219/0879 , B01J2219/0894 , C01B13/30 , C01G23/07 , C01G23/075 , C01P2002/50 , C01P2002/52 , C01P2002/72 , C01P2004/64 , C01P2006/12 , C09C1/36 , C09C1/3607 , C09C1/3669
摘要： A process and apparatus for the synthesis of metal oxide nanopowder from a metal compound vapour is presented. In particular a process and apparatus for the synthesis of TIO 2 nanopowder from TICI 4 is disclosed. The metal compound vapour is reacted with an oxidising gas in an electrically induced RF frequency plasma thus forming a metal oxide vapour. The metal oxide vapour is rapidly cooled using a highly turbulent gas quench zone which quickly halts the particle growth process, yielding a substantial reduction in the size of metal oxide particles formed. The metal compound vapour can also be reacted with a doping agent to create a doped metal oxide nanopowder. Additionally, a process and apparatus for the inline synthesis of a coated metal oxide is disclosed wherein the metal oxide particles are coated with a surface agent after being cooled in a highly turbulent gas quench zone.
摘要翻译：提出了一种从金属化合物蒸气合成金属氧化物纳米粉末的方法和装置。特别地公开了一种用于从TICI4合成TIO2纳米粉末的方法和装置。金属化合物蒸汽与电感应RF频率等离子体中的氧化气体反应，从而形成金属氧化物蒸气。使用快速停止颗粒生长过程的高度湍流的气体骤冷区，快速冷却金属氧化物蒸汽，从而显着减少形成的金属氧化物颗粒的尺寸。金属化合物蒸气也可以与掺杂剂反应以产生掺杂的金属氧化物纳米粉末。此外，公开了一种用于在线合成涂覆的金属氧化物的方法和装置，其中在高度湍流的气体骤冷区域中冷却后，金属氧化物颗粒被表面剂涂覆。

6. 发明申请

WO2004052778A2 PLASMA SYNTHESIS OF METAL OXIDE NANOPOWDER AND APPARATUS THEREFOR 审中-公开
标题翻译：金属氧化物纳米粉体的等离子体合成及其装置
公开(公告)号：WO2004052778A2
公开(公告)日：2004-06-24
申请号：PCT/CA2003/001881
申请日：2003-12-01
申请人： TEKNA PLASMA SYSTEMS INC. , BOULOS, Maher, I. , JUREWICZ, Jerzy, W. , NESSIM, Christine, A., Abdel, Messih
发明人： BOULOS, Maher, I. , JUREWICZ, Jerzy, W. , NESSIM, Christine, A., Abdel, Messih
IPC分类号： C01B13/28
CPC分类号： B82Y30/00 , B01J19/088 , B01J19/129 , B01J2219/0871 , B01J2219/0875 , B01J2219/0879 , B01J2219/0894 , C01B13/30 , C01G23/07 , C01G23/075 , C01P2002/50 , C01P2002/52 , C01P2002/72 , C01P2004/64 , C01P2006/12 , C09C1/36 , C09C1/3607 , C09C1/3669 , C22B4/005 , C22B4/08 , C22B34/129
摘要： A process and apparatus for the synthesis of metal oxide nanopowder from a metal compound vapour is presented. In particular a process and apparatus for the synthesis of Ti0 2 nanopowder from TiCl 4 is disclosed. The metal compound vapour is reacted with an oxidizing gas in electrically induced RF frequency plasma thus forming a metal oxide vapour. The metal oxide vapour is rapidly cooled using a highly turbulent gas quench zone which quickly halts the particle growth process, yielding a substantial reduction in the size of metal oxide particles formed compared with known processes. The metal compound vapour can also react with a doping agent to create a doped metal oxide nanopowder. Additionally, a process and apparatus for the inline synthesis of a coated metal oxide is disclosed wherein the metal oxide particles are coated with a surface agent after being cooled in a highly turbulent gas quench zone.
摘要翻译：介绍了由金属化合物蒸气合成金属氧化物纳米粉末的方法和设备。特别公开了用于从TiCl 4 4合成TiO 2纳米粉末的方法和设备。金属化合物蒸气与电诱导RF频率等离子体中的氧化气体反应，从而形成金属氧化物蒸气。使用高度湍流的气体骤冷区快速冷却金属氧化物蒸气，其迅速停止颗粒生长过程，与已知过程相比，所形成的金属氧化物颗粒的尺寸显着减小。金属化合物蒸气也可以与掺杂剂反应以形成掺杂的金属氧化物纳米粉末。另外，公开了用于在线合成涂覆金属氧化物的方法和设备，其中金属氧化物颗粒在高度湍流气体骤冷区中冷却后用表面剂涂覆。

7. 发明申请

WO2003032693A1 MULTI-COIL INDUCTION PLASMA TORCH FOR SOLID STATE POWER SUPPLY 审中-公开
标题翻译：用于固态电源的多线圈感应等离子体转子
公开(公告)号：WO2003032693A1
公开(公告)日：2003-04-17
申请号：PCT/CA2002/001506
申请日：2002-10-04
申请人： UNIVERSITE DE SHERBROOKE , BOULOS, Maher, I. , JUREWICZ, Jerzy, W.
发明人： BOULOS, Maher, I. , JUREWICZ, Jerzy, W.
IPC分类号： H05H1/30
CPC分类号： H05H1/30
摘要： An induction plasma torch comprises a tubular torch body, a gas distributor head located at the proximal end of the torch body for supplying at least one gaseous substance into the chamber within the torch body, a higher frequency power supply connected to a first induction coil mounted coaxial to the tubular torch body, a lower frequency solid state power supply connected to a plurality of second induction coils mounted coaxial to the tubular torch body between the first induction coil and the distal end of this torch body. The first induction coil provides the inductive energy necessary to ignite the gaseous substance to form a plasma. The second induction coils provide the working energy necessary to operate the plasma torch. The second induction coils can be connected to the solid state power supply in series and/or in parallel to match the impedance of this solid state power supply.
摘要翻译：感应等离子体焰炬包括管状炬体，位于炬体本体的近端处的气体分配器头，用于将至少一种气态物质供应到炬体内的腔室中;更高频率的电源，连接到第一感应线圈安装与管状割炬本体同轴的低频固态电源，连接到多个第二感应线圈，该多个第二感应线圈与第一感应线圈和该割炬本体的远端之间的管状割炬本体同轴安装。第一感应线圈提供点燃气态物质形成等离子体所需的感应能量。第二感应线圈提供操作等离子体焰炬所需的工作能量。第二感应线圈可以串联和/或并联连接到固态电源以匹配该固态电源的阻抗。

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