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    • 5. 发明申请
    • LENS ARRAY PHOTOLITHOGRAPHY
    • 镜头阵列光刻技术
    • WO1994011781A1
    • 1994-05-26
    • PCT/US1993010945
    • 1993-11-15
    • BROOK, JohnPAGE, JosephHUGLE, William, BellDANDLIKER, RenéHERZIG, Hans, Peter
    • BROOK, JohnPAGE, Joseph
    • G03B27/44
    • G03F7/70791G02B3/0018G02B3/0056G02B3/0062G02B5/1876G02B5/1885G03F7/0005G03F7/2002G03F7/70275G03F7/70316G03F7/70475
    • Microlithography techniques have provided a means for the development of many useful devices from microcircuits, which made the computer era possible, to micromechanical devices such as motors that are only a few tens of microns across. A new use of a microdevice is presented here which serves to "payback" the art of microlithography as it is a significant contribution thereto. The device of the invention is a unique microdevice made with advanced microlithography techniques which when completed can be used as a new exposure tool for microlithography. A lens array can be as thin as 1/40 of the thickness of the page that this text is printed on, yet have thereon an arrangement of optical lenses powerful enough to replace very sophisticated and bulky, million dollar precision optics. An array of lenses can be fabricated with binary optical device and other techniques. The array having unlimited area and field of regard can be used as an exposure tool for very large area microdevices such as flat panel displays without the requirement of step and repeat operations which severely limit the throughput and yield in modern manufacturing methods.
    • 微光刻技术提供了一种从微电路开发许多有用的器件的方法,这使得计算机时代成为可能,而微机械器​​件例如只有几十微米的电机。 这里介绍了微型设备的新用途,其用于“回报”微光刻技术,因为它对其有重要贡献。 本发明的装置是采用先进的微光刻技术制造的独特的微型装置,当完成时可用作微光刻的新型曝光工具。 透镜阵列可以薄到打印文本的页面的厚度的1/40,而在其上具有足够强大的光学透镜的布置,以代替非常复杂和庞大的百万美元的精密光学元件。 可以用二元光学装置和其他技术制造透镜阵列。 具有无限区域和视场的阵列可以用作非常大面积微型设备(例如平板显示器)的曝光工具,而不需要在现代制造方法中严格限制生产量和产量的步骤和重复操作。