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1. 发明申请

WO2008053139A2 SHAPED APERTURES IN AN ION IMPLANTER 审中-公开
标题翻译：在离子植入物中形成的形状
公开(公告)号：WO2008053139A2
公开(公告)日：2008-05-08
申请号：PCT/GB2007/003672
申请日：2007-09-26
申请人： APPLIED MATERIALS, INC. , RYDING, Geoffrey , SAKASE, Takao , FARLEY, Marvin , HAYS, Stephen
发明人： RYDING, Geoffrey , SAKASE, Takao , FARLEY, Marvin , HAYS, Stephen
IPC分类号： H01J37/09 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/09 , H01J2237/0451
摘要： This invention relates to shaped apertures in an ion implanter that may act to clip an ion beam and so adversely affect uniformity of an implant. In particular, the present invention finds application in ion implanters that employ scanning of a substrate to be implanted relative to the ion beam such that the ion beam traces a raster pattern over the substrate. An ion implanter is provided comprising: a substrate scanner arranged to scan a substrate repeatedly through an ion beam in a scanning direction substantially transverse to the ion beam path, thereby forming a series of scan lines across the substrate; and an aperture plate having provided therein an aperture positioned on the ion beam path upstream of the substrate scanner, and wherein the aperture is defined in part by an inwardly-facing projection.
摘要翻译：本发明涉及离子注入机中的成形孔，其可以用于夹住离子束并且对输入物的均匀性产生不利影响。特别地，本发明应用于使用相对于离子束进行植入的衬底的扫描的离子注入器，使得离子束在衬底上追踪光栅图案。提供了一种离子注入机，包括：衬底扫描器，其布置成在基本上横向于离子束路径的扫描方向上反复扫描基板通过离子束，从而在衬底上形成一系列扫描线; 以及孔板，其中设置有位于所述基板扫描器上游的离子束路径上的孔，并且其中所述孔部分地由向内的突起限定。

2. 发明申请

WO2008053139A3 SHAPED APERTURES IN AN ION IMPLANTER 审中-公开
标题翻译：在离子植入物中形成的形状
公开(公告)号：WO2008053139A3
公开(公告)日：2008-10-02
申请号：PCT/GB2007003672
申请日：2007-09-26
申请人： APPLIED MATERIALS INC , RYDING GEOFFREY , SAKASE TAKAO , FARLEY MARVIN , HAYS STEPHEN
发明人： RYDING GEOFFREY , SAKASE TAKAO , FARLEY MARVIN , HAYS STEPHEN
IPC分类号： H01J37/09 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/09 , H01J2237/0451
摘要： This invention relates to shaped apertures (54a-h) in an ion implanter that may act to clip an ion beam (34,34) and so adversely affect uniformity of an implant. In particular, the present invention finds application in ion implanters that employ scanning of a substrate to be implanted relative to the ion beam such that the ion beam traces a raster pattern over the substrate. An ion implanter is provided comprising: a substrate scanner arranged to scan a substrate repeatedly through an ion beam in a scanning direction substantially transverse to the ion beam path, thereby forming a series of scan lines across the substrate; and an aperture pl-ate (52a-h)] having provided therein an aperture positioned on the ion beam path upstream of the substrate scanner, and wherein the aperture is defined in part by an inwardly- facing projection (57a, 57b, 59a, 59b).
摘要翻译：本发明涉及离子注入机中的成形孔（54a-h），其可以用于夹住离子束（34,34），并且因此不利地影响植入物的均匀性。特别地，本发明应用于使用相对于离子束进行植入的衬底的扫描的离子注入器，使得离子束在衬底上追踪光栅图案。提供了一种离子注入机，包括：衬底扫描器，其布置成在基本上横向于离子束路径的扫描方向上反复扫描基板通过离子束，从而在衬底上形成一系列扫描线; 和一个开口（52a-h）]，其中设置有位于基板扫描器上游的离子束路径上的孔，并且其中孔径部分地由向内的突起（57a，57b，59a， 59B）。

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