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    • 1. 发明申请
    • GRAPHENE PROCESSING FOR DEVICE AND SENSOR APPLICATIONS
    • 用于设备和传感器应用的石墨加工
    • WO2010096646A3
    • 2010-11-04
    • PCT/US2010024723
    • 2010-02-19
    • UNIV FLORIDAAPPLETON BILL RGILA BRENT P
    • APPLETON BILL RGILA BRENT P
    • H01L21/265
    • H01L29/78684H01L21/26506H01L29/16H01L29/1606H01L29/7781H01L29/78603Y10T428/24802
    • A supported graphene device comprises at least one graphene feature of 1 to about 10 graphene layers having a predetermined shape and pattern, with at least a portion of each graphene feature being supported on a substrate. In some embodiments the device comprises graphene features supported on crystalline semiconductor substrate, such as silicon or germanium. The graphene features on a crystalline semiconductor substrate can be fabricated by forming an amorphous carbon doped semiconductor on the crystalline semiconductor substrate and then epitaxially crystallizing the amorphous semiconductor with carbon migration to the surface to form a graphene feature of one or more graphene layers. The epitaxy can be promoted by heating the device or by irradiation with a laser. Methods for fabricating graphene on a variety of substrates, over large areas with controlled thicknesses employ ion implantation or other doping techniques followed by pulsed laser annealing or other annealing techniques that result in solid phase regrowth are presented.
    • 支撑石墨烯装置包括具有预定形状和图案的1至约10个石墨烯层的至少一个石墨烯特征,每个石墨烯特征的至少一部分被支撑在基底上。 在一些实施例中,该器件包括支撑在晶体半导体衬底(例如硅或锗)上的石墨烯特征。 晶体半导体衬底上的石墨烯特征可以通过在晶体半导体衬底上形成无定形碳掺杂半导体,然后通过碳迁移到表面来外延结晶非晶半导体来形成一个或多个石墨烯层的石墨烯特征来制造。 可以通过加热装置或通过用激光照射来促进外延。 提出了在各种基板上制造石墨烯的方法,在具有受控厚度的大面积上采用离子注入或其它掺杂技术,随后进行脉冲激光退火或导致固相再生的其它退火技术。
    • 3. 发明申请
    • GRAPHENE PROCESSING FOR DEVICE AND SENSOR APPLICATIONS
    • GRAPHENE处理设备和传感器应用
    • WO2010096646A2
    • 2010-08-26
    • PCT/US2010/024723
    • 2010-02-19
    • UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.APPLETON, Bill, R.GILA, Brent, P.
    • APPLETON, Bill, R.GILA, Brent, P.
    • H01L21/265
    • H01L29/78684H01L21/26506H01L29/16H01L29/1606H01L29/7781H01L29/78603Y10T428/24802
    • A supported graphene device comprises at least one graphene feature of 1 to about 10 graphene layers having a predetermined shape and pattern, with at least a portion of each graphene feature being supported on a substrate. In some embodiments the device comprises graphene features supported on crystalline semiconductor substrate, such as silicon or germanium. The graphene features on a crystalline semiconductor substrate can be fabricated by forming an amorphous carbon doped semiconductor on the crystalline semiconductor substrate and then epitaxially crystallizing the amorphous semiconductor with carbon migration to the surface to form a graphene feature of one or more graphene layers. The epitaxy can be promoted by heating the device or by irradiation with a laser. Methods for fabricating graphene on a variety of substrates, over large areas with controlled thicknesses employ ion implantation or other doping techniques followed by pulsed laser annealing or other annealing techniques that result in solid phase regrowth are presented.
    • 被支撑的石墨烯器件包括具有预定形状和图案的1到大约10个石墨烯层的至少一个石墨烯特征,每个石墨烯特征的至少一部分被支撑在衬底上。 在一些实施例中,该器件包括支撑在晶体半导体衬底上的石墨烯部件,例如硅或锗。 在晶体半导体衬底上的石墨烯特征可以通过在晶体半导体衬底上形成无定形碳掺杂半导体,然后用碳向表面外延结晶非晶半导体以形成一个或多个石墨烯层的石墨烯特征。 通过加热器件或通过激光照射可以促进外延。 在各种衬底上,在具有可控厚度的大面积上制造石墨烯的方法采用离子注入或其他掺杂技术,随后进行脉冲激光退火或其他导致固相再生长的退火技术。