专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2003001556A1 X-RAY SOURCE PROVIDED WITH A LIQUID METAL TARGET 审中-公开
标题翻译： X射线源由液体金属靶提供
公开(公告)号：WO2003001556A1
公开(公告)日：2003-01-03
申请号：PCT/IB2002/002374
申请日：2002-06-20
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , PHILIPS CORPORATE INTELLECTUAL PROPERTY GMBH , HARDING, Geoffrey , DAVID, Bernd , ECKART, Rainer, W. , SCHLOMKA, Jens, P.
发明人： HARDING, Geoffrey , DAVID, Bernd , ECKART, Rainer, W. , SCHLOMKA, Jens, P.
IPC分类号： H01J35/08
CPC分类号： H01J35/08 , H01J2235/082
摘要： The invention relates to an X-ray source which is provided with a liquid metal target (3) which flows through a system of ducts (6) and is conducted through a duct section (8) whose flow cross-section is reduced relative to that of the system of ducts. The X-ray source is characterized notably in that there is provided a pressure source (12, 13; 14; 16) for acting on the liquid metal target (3) in such a manner that in the operating condition of the X-ray source the pressure in the liquid metal target (3) at the area of the reduced flow cross-section equals essentially a selectable reference value (Ps) or remains essentially in a pressure range between selectable limit values (Ps1, Ps2) of the pressure. A comparatively small thickness of a window which is transparent to an electron beam can thus be realized in conjunction with a comparatively high flow speed, that is, without having to accept the risk of cavitations. The invention also relates to an X-ray apparatus provided with an X-ray source of this kind.
摘要翻译：本发明涉及一种具有液体金属靶（3）的X射线源，该液体金属靶（3）流过管道（6）的系统，并通过导管部分（8）传导，该管道部分（8）的流动横截面相对于的管道系统。 X射线源的特征在于，提供了一个用于作用在液态金属靶（3）上的压力源（12,13; 14; 16），使得在X射线源的运行状态在流动截面减小的区域中的液态金属靶（3）中的压力基本上等于可选择的参考值（Ps），或者基本上保持在压力的可选极限值（Ps1，Ps2）之间的压力范围内。因此，与电子束透明的窗口相对较小的厚度可以结合较高的流速来实现，即不必接受空化的风险。本发明还涉及具备这种X射线源的X射线装置。

IPRDB

热门服务

关于我们

友情链接

联系方式